Provided is a method for forming an organic planarization layer. The method includes forming lithographically-patterned arrays atop a substrate; disposing a thiol-based photocurable resin on to the lithographically-patterned arrays to form a photocurable planarization layer; and curing the photocurable planarization layer to form a flat surface above the lithographically-patterned array.
本发明提供了一种形成有机平面化层的方法。该方法包括在基底上形成平版印刷图案阵列;在平版印刷图案阵列上涂敷
硫醇基光固化
树脂以形成光固化平面化层;以及固化光固化平面化层以在平版印刷图案阵列上方形成平面。