Kulkarni, Y. D.; Srivastava, Surendra, Indian Journal of Chemistry, Section A: Inorganic, Physical, Theoretical and Analytical, 1985, vol. 24, # 8, p. 710 - 712
Electrochemical synthesis of organochalcogenides in aqueous medium
作者:Pedro B. Ribeiro Neto、Sonydelane O. Santana、Guillaume Levitre、Danilo Galdino、Jadson L. Oliveira、Rogério T. Ribeiro、Maria E. S. B. Barros、Lothar W. Bieber、Paulo H. Menezes、Marcelo Navarro
DOI:10.1039/c5gc01869b
日期:——
The electrochemical preparation of telluride, selenide and sulfide ions was carried out in NaOH aqueous solution, using a two compartment cell. Organochalcogenides were prepared from halogenated compounds in a two...
Synthese des dianions du titre et addition de chlorures benzyliques. Obtention de seleniure, diseleniure, tellurure et ditellurure benzyliques
Synthese des dianions du titre et added de chlorures benzyliques。Obtention de seleniure, diseleniure, Tellurure et ditellurure benzyliques
Lewis Base Sequestered Chalcogen Dihalides: Synthetic Sources of ChX<sub>2</sub>(Ch=Se, Te; X=Cl, Br)
作者:Jason L. Dutton、Gregory J. Farrar、Michael J. Sgro、Taylor L. Battista、Paul J. Ragogna
DOI:10.1002/chem.200901000
日期:2009.10.5
The synthesis and comprehensive characterization of a series of base‐stabilized ChX2 (Ch=Se, Te; X=Cl, Br) is reported using aryl‐substituted diazabutadiene and 2,2′‐bipyridine (bipy) as the ligands. In stark contrast to free ChX2 the complexes display excellent thermal stability. Their use as viable ChX2 reagents that may be stored for later use is demonstrated in principle. The syntheses are simple
使用芳基取代的二氮杂丁二烯和2,2'-联吡啶(bipy)作为配体,报道了一系列碱稳定的ChX 2(Ch = Se,Te; X = Cl,Br)的合成和全面表征。与游离ChX 2形成鲜明对比的是,该配合物显示出出色的热稳定性。原则上证明了它们作为有活力的ChX 2试剂的用途,可以储存起来以备后用。合成方法简单易行,可从市售或易于合成的试剂中获得高产。Bipy配合物是在第16组化学中使用的这种普遍存在的配体的极为罕见的实例;Se的例子是第一个通过X射线晶体学表征的,而Te的例子仅次于X射线晶体学。
Organometallic tellurium compounds useful in chemical vapor deposition
申请人:Advanced Technology Materials, Inc.
公开号:US05312983A1
公开(公告)日:1994-05-17
Novel tellurium compounds of the present invention have the formula: TeR.sup.1 R.sup.2 wherein R.sup.1 is a fluorinated alkyl having the formula C.sub.n F.sub.(2n+1)-x H.sub.x where n may range from 1 to 6 and x may range from 0 to 2n, and R.sup.2 is selected from the group consisting of alkyls having 2 to 6 carbon atoms, cycloalkyls having 3 to 6 carbon atoms, allyl, alkyl-substituted allyl having 4 to 6 carbon atoms, cyclopentadienyl, benzyl, alpha-methylbenzyl, and bis(alpha-methyl)benzyl. The novel tellurium reagents are useful as sources for organometallic vapor deposition processes, particularly the MOCVD fabrication of II-VI semiconductor materials such as Hg.sub.x Cd.sub.1-x Te. The compounds are synthesized by high yield ligand exchange reactions between Te(R.sup.1).sub.2 and Te(R.sup.2).sub.2.