COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD, AND METHOD FOR PURIFYING RESIN
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:US20220144738A1
公开(公告)日:2022-05-12
The present invention has an object to provide a new compound that is useful as a film forming material for lithography or an optical component forming material, a resin containing a constituent unit derived from said compound, a composition, a resist pattern formation method, a circuit pattern formation method, and a purification method.
A compound represented by formula (1), a resin containing a constituent unit derived from said compound, a composition containing one or more selected from the group consisting of said compound and said resin, a resist pattern formation method using said composition, a circuit pattern formation method, and a purification method thereof.
本发明的目的是提供一种新的化合物,该化合物可用作光刻膜形成材料或光学元件形成材料,以及含有源自该化合物的组成单元的树脂、组合物、利用该组合物进行的抗蚀图案形成方法、电路图案形成方法和纯化方法。该化合物由式(1)表示,含有源自该化合物的组成单元的树脂,含有来自该化合物和/或该树脂的一种或多种的组合物,利用该组合物进行的抗蚀图案形成方法、电路图案形成方法和纯化方法。