2-(7-氧杂双环[4.1.0]庚-3-基)螺[1,3-二恶烷-5,3'-[7]氧杂双环[4.1.0]庚烷] | 3388-03-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 氧杂环己烷
• 中文名称: 2-(7-氧杂双环[4.1.0]庚-3-基)螺[1,3-二恶烷-5,3'-[7]氧杂双环[4.1.0]庚烷]
• 中文别名: 2-[7-氧杂双环[4.1.0]庚-3-基]螺[1,3-二氧杂环己烷-5,3'-(7)氧杂双环[4.1.0.]庚烷]
• 英文名称: 2-(7-oxabicyclo[4.1.0]hept-3-yl)spiro[1,3-dioxane-5,3'-[7]oxabicyclo[4.1.0]heptane]
• 英文别名: 3-(3,4-epoxycyclohexyl)-8,9-epoxy-2,4-dioxaspiro(5,5) undecane；3-(3,4-Epoxycyclohexyl)-8,9-epoxy-2,4-dioxaspiro(5.5)undecane；2-(7-oxabicyclo[4.1.0]heptan-3-yl)spiro[1,3-dioxane-5,3'-7-oxabicyclo[4.1.0]heptane]
• CAS: 3388-03-2
• 化学式: C₁₅H₂₂O₄
• 分子量: 266.337
• InChiKey: QHOMCUUGNPEUCT-UHFFFAOYSA-N

物化性质

• 沸点：
  401.2±40.0 °C(Predicted)
• 密度：
  1.26±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  19
• 可旋转键数：
  1
• 环数：
  5.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  43.5
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  2-(7-氧杂双环[4.1.0]庚-3-基)螺[1,3-二恶烷-5,3'-[7]氧杂双环[4.1.0]庚烷] 、 丙烯酸 在 tertiary amine 、 对苯二酚 作用下， 生成 Acrylic acid 3-(3-acryloyloxy-4-hydroxy-cyclohexyl)-9-hydroxy-2,4-dioxa-spiro[5.5]undec-8-yl ester
  参考文献：
  名称：

  摘要：

  The degree of cross-linking of epoxy-acrylate polymers prepared by photopolymerization of epoxy-acrylate oligomers was evaluated from the swellability in trichloroethylene.

  DOI：

  10.1023/a:1025665120788
• 作为产物：
  描述：

  3-(3-环己烯-1-基)-2,4-二氧杂螺[5.5]十一碳-8-烯 在 双氧水 、 sodium acetate 、 乙酸酐 作用下， 以 氯仿 为溶剂， 反应 12.0h， 生成 2-(7-氧杂双环[4.1.0]庚-3-基)螺[1,3-二恶烷-5,3'-[7]氧杂双环[4.1.0]庚烷]
  参考文献：
  名称：

  一种安全环保可控的双环氧化物的合成工艺

  摘要：

  本发明涉及环氧化物合成领域，更具体地，本发明涉及一种安全环保可控的双环氧化物的合成工艺，所述双环氧化物的合成工艺至少包括：将二烯化合物、羧酸类物质、碱性盐、溶剂混合，冷却；滴加过氧化氢溶液1～12h；静置、分层，得到下层有机相‑1，洗涤液洗涤有机相‑1，静置、分层，得到下层有机相‑2；纯化。本发明反应体系简单，对环境比较友好，安全可控，生产成本低，能够满足技术经济的要求，得到的双环氧化物纯度高、收率高、溶剂含量低、色度低、卤素含量低，适合大规模工业生产。

  公开号：

  CN110183401B

文献信息

• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2016124493A1

  公开（公告）日：2016-08-11

  Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

  化合物的化学式（I）和（IA），其中X为-O(CO)-；R1为C1-C12卤代烷基或C6-C10卤代芳基；R2位于香豆素环的第7位，为OR8；R2a、R2b和R2C彼此独立地为氢；R3为C1-C8卤代烷基或C1-C8卤代烷基；R4为氢；R8为C1-C6烷基，适用于作为感光酸给体，用于制备光刻胶组合物，例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器（LCD）的制备。
• [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS À BASE DE SELS DE SULFONIUM
  申请人：CIBA HOLDING INC

  公开号：WO2009047151A1

  公开（公告）日：2009-04-16

  Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5- C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2- C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and inter- rupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1- C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6- C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6- C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

  化合物的式子（I），其中X是单键，CRaRb O，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如是氢，R1或COT; T表示T1或O-T2; T1和T2例如是氢，C1-C20烷基，C3-C12环烷基，C2-C20烯基，C5-C12环烯基，C6-C14芳基，C3-C12杂芳基，被一个或多个D取代的C1-C20烷基，被一个或多个E中断的C2-C20烷基，被一个或多个D取代并被一个或多个E或Q中断的C2-C20烷基; R1，R2，R3，R4，Ra，Rb和Rc是T1; D例如是R5，OR5，SR5或Q1; E例如是O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q例如是C6-C12双环烷基，C6-C12双环烯基或C6-C12三环烷基; Q1例如是C6-C14芳基或C3-C12杂芳基; Q2例如是C6-C14芳撑基或C3-C12杂芳撑基; Y是阴离子; M是阳离子; 前提是L，L1，L2，L3，L4，L5，L6，L7和L8中至少有一个不是氢; 并且前提是（i）至少有一个T1或T2是Q组; 或（ii）至少有一个D是Q1组; 或（iii）至少有一个E是Q2组; 适用于光潜催化剂。
• Latent acids and their use
  申请人：Yamato Hitoshi

  公开号：US20110217654A1

  公开（公告）日：2011-09-08

  The invention pertains to a compound generating an acid of the formula I or II, for instance corresponding sulfonium and iodonium salts, as well as corresponding sulfonyloximes wherein X is CH 2 or CO; Y is O, NR 4 , S, O(CO), O(CO)O, O(CO)NR 4 , OSO 2 , O(CS), or O(CS)NR 4 ; R 1 is for example C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl, C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, interrupted C 2 -C 18 alkyl, interrupted C 3 -C 30 cycloalkyl, interrupted C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, interrupted C 4 -C 30 cycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or heteroaryl, all unsubstituted or are substituted; or R 1 is NR 12 R 13 ; R 2 and R 3 are for example C 3 -C 30 cycloalkylene, C 3 -C 30 cycloalkyl-C 1 -C 18 alkylene, C 1 -C 18 alkylene, C 1 -C 10 haloalkylene, C 2 -C 12 alkenylene, C 4 -C 30 cycloalkenylene, phenylene, naphthylene, anthracylene, phenanthrylene, biphenylene or heteroarylene; all unsubstituted or substituted; R 4 is for example C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl; R 12 and R 13 are for example C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl, Ar, (CO)R 15 , (CO)OR 15 or SO 2 R 15 ; and Ar is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl or heteroaryl, all unsubstituted or substituted.

  本发明涉及一种生成公式I或II的酸的化合物，例如对应的磺鎓盐和碘鎓盐，以及对应的磺酰氧肟，其中X为CH2或CO；Y为O、NR4、S、O（CO）、O（CO）O、O（CO）NR4、OSO2、O（CS）或O（CS）NR4；R1例如为C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基、C3-C30环烷基、C3-C30环烷基-C1-C18烷基、中断的C2-C18烷基、中断的C3-C30环烷基、中断的C3-C30环烷基-C1-C18烷基、中断的C4-C30环烯基、苯基、萘基、蒽基、菲基、苯并二氢呋喃基或杂环基，全部未取代或被取代；或R1为NR12R13；R2和R3例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基、萘基、蒽基、菲基、苯并二氢呋喃基或杂环基，全部未取代或被取代；R4例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基；R12和R13例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基、Ar、（CO）R15、（CO）OR15或SO2R15；Ar为苯基、苯并二氢呋喃基、菲基、萘基、蒽基、苯并蒽基或杂环基，全部未取代或被取代。
• [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS DE SEL DE SULFONIUM
  申请人：CIBA HOLDING INC

  公开号：WO2009047105A1

  公开（公告）日：2009-04-16

  Compounds of the Formula (I), wherein L1, L'1, L'1, L2, L'2, L'2, L3, L'3, L'3, L4, L'4 and L'4 for example are hydrogen or COT; R, R' and R' for example are hydrogen,C6-C12aryl or C3-C20heteroaryl; X, X' and X' for exampleare O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2- C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6- C14aryl, providedthat at least one of R, R' or R' is unsubstitutedor substituted C3- C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

  式(I)的化合物，其中L1，L'1，L'1，L2，L'2，L'2，L3，L'3，L'3，L4，L'4和L'4例如是氢或COT；R，R'和R'例如是氢，C6-C12芳基或C3-C20杂环芳基；X，X'和X'例如是O，S，单键，NRa或NCORa，T例如是氢，C1-C20烷基，C3-C12环烷基，C2-C20烯基，C5-C12环烯基，C7-C18环烷基芳基，C5-C18环烷基杂环芳基，C6-C14芳基，前提是至少有一个R，R'或R'是未取代或取代的C3-C20杂环芳基；而Y是无机或有机阴离子；适用于光酸发生剂。
• Iodonium salts as latent acid donors
  申请人：——

  公开号：US20010036591A1

  公开（公告）日：2001-11-01

  Radiation-sensitive compositions comprising (a1) a cationically or acid-catalytically polymerizable or crosslinkable compound or (a2) a compound that increases its solubility in a developer under the action of acid; and (b) at least one diaryliodonium salt of formula I 1 wherein X is branched C 3 -C 20 alkyl or C 3 -C 8 cycloalkyl; X 1 is hydrogen, linear C 1 -C 20 alkyl, branched C 3 -C 20 alkyl or C 3 -C 8 cycloalkyl; with the proviso that the sum of the carbon atoms in X and X 1 is at least 4; Y is linear C 1 -C 10 alkyl, branched C 3 -C 10 alkyl or C 3 -C 8 cycloalkyl; A − is a non-nucleophilic anion, selected from the group (BF 4 ) − , (SbF 6 ) − , (PF 6 ) − , (B(C 6 F 5 )) 4 − , C 1 -C 20 alkylsulfonate, C 2 -C 20 haloalkylsulfonate, unsubstituted C 6 -C 10 arylsulfonate, camphorsulfonate, and C 6 -C 10 arylsulfonate substituted by halogen, NO 2 , C 1 -C 12 alkyl, C 1 -C 12 halo-alkyl, C 1 -C 12 alkoxy or by COOR 1 ; and R 1 is C 1 -C 20 alkyl, phenyl, benzyl; or phenyl mono- or poly-substituted by C 1 -C 12 alkyl, C 1 -C 12 alkoxy or by halogen; with the proviso that the two phenyl rings on the iodine atom are not identically substituted, have high sensitivity, high storage stability, good solubility and a low tendency to crystallize.

  辐射敏感组合物包括（a1）阳离子或酸催化聚合或交联化合物或（a2）在酸作用下增加其在显影剂中的溶解度的化合物；和（b）至少一种化学式I1的二芳基碘鎓盐，其中X为支链C3-C20烷基或C3-C8环烷基；X1为氢，线性C1-C20烷基，支链C3-C20烷基或C3-C8环烷基；但X和X1中碳原子的总数至少为4；Y为线性C1-C10烷基，支链C3-C10烷基或C3-C8环烷基；A-为非亲核阴离子，从（BF4）-，（SbF6）-，（PF6）-，（B（C6F5））4-，C1-C20烷基磺酸盐，C2-C20卤代烷基磺酸盐，未取代的C6-C10芳基磺酸盐，樟脑磺酸盐和由卤，NO2，C1-C12烷基，C1-C12卤代烷基，C1-C12烷氧基或COOR1取代的C6-C10芳基磺酸盐中选择；R1为C1-C20烷基，苯基，苯甲基；或经C1-C12烷基，C1-C12烷氧基或卤素取代的苯基单取代或多取代；但碘原子上的两个苯环不相同取代，具有高灵敏度，高储存稳定性，良好的溶解度和低结晶倾向。