A chemically amplified radiation sensitive composition is provided which comprises a film forming hydroxystyrene based resin in combination with an onium salt precursor which generates a fluorinated alkanesulfonic acid as a photoacid generator. This composition can realize neither corrosion of apparatuses by outgas, nor T-shaped pattern profiles, nor change in linewidth attributable to process time delay, on the other side, high sensitivity and resolution, and good pattern profiles and stability thereof.
本发明提供了一种
化学放大辐射敏感组合物,该组合物由成膜的羟基
苯乙烯基
树脂与鎓盐前体结合而成,鎓盐前体生成
氟化烷
磺酸作为光酸发生器。这种组合物既不会因放出气体而腐蚀设备,也不会产生 T 型图案轮廓,也不会因加工时间延迟而改变线宽,同时还具有高灵敏度和高分辨率,以及良好的图案轮廓和稳定性。