2-(二丙基氨基)乙硫醇 | 5842-06-8

• 分子结构分类: 有机化合物 - 有机氮化合物
• 中文名称: 2-(二丙基氨基)乙硫醇
• 英文名称: 2-(dipropylamino)ethane-1-thiol
• 英文别名: 2-(Dipropylamino)ethanethiol
• CAS: 5842-06-8
• 化学式: C₈H₁₉NS
• 分子量: 161.312
• InChiKey: YYXYWIASFOLDSO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  10
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  4.2
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  N-hydroxy-2-oxo-2-phenylethanimidoyl chloride 、 2-(二丙基氨基)乙硫醇 以 甲醇 、 乙醚 、 Petroleum ether 为溶剂， 以58%的产率得到N-Hydroxy-2-oxo-2-phenyl-thioacetimidic acid 2-dipropylamino-ethyl ester; hydrochloride
  参考文献：
  名称：

  α-Oxothiohydroximate s-esters. preparation and physiological activity

  摘要：

  DOI：

  10.1007/bf00758421
• 作为产物：
  描述：

  环硫乙烷 、 二正丙胺 以 二氯甲烷 为溶剂， 以32.6%的产率得到2-(二丙基氨基)乙硫醇
  参考文献：
  名称：

  [EN] FUNCTIONALIZED DIBLOCK COPOLYMER, AND PREPARATION METHOD THEREFOR AND USE THEREOF
  [FR] COPOLYMÈRE BISÉQUENCÉ FONCTIONNALISÉ, SON PROCÉDÉ DE PRÉPARATION ET SON UTILISATION
  [ZH] 一种官能化双嵌段共聚物及其制备方法和用途

  摘要：

  本申请涉及有机化学和高分子化学领域，特别是涉及一种官能化双嵌段共聚物及其制备方法和用途。本申请提供一种官能化双嵌段共聚物，所述官能化双嵌段共聚物的化学结构式如式II所示。本申请所提供的官能化双嵌段共聚物、或聚合物颗粒，可以广泛的应用肿瘤影像、肿瘤治疗等等领域，其不仅具有良好的安全性，实现酸性条件下高分子更快的且可调节(通过改变官能基团的结构和数量)的降解和清除，还在靶向部位具有优良的特异性的优质影像成像效果，具有高信噪比、边界清晰、长半衰期等特点，解决了荧光成像技术在实时术中导航的难题，从而具有良好的产业化前景。

  公开号：

  WO2022063208A1

文献信息

• [EN] LIPOCATIONIC POLYMERS AND USES THEREOF<br/>[FR] POLYMÈRES LIPOCATIONIQUES ET LEURS UTILISATIONS
  申请人：UNIV TEXAS

  公开号：WO2016094342A1

  公开（公告）日：2016-06-16

  Polymers produced by ring opening polymerization which comprises an amino group that can be used in compositions to deliver a nucleic acid such as a miRNA or a siRNA. In some embodiments, compositions which comprise the polymers described herein and a nucleic acid are also provided herein. In some embodiments, these compositions are used to silence one or more genes in vivo or treat a disease or disorder.

  通过环氧聚合产生的聚合物，其中包含可以用于将核酸如miRNA或siRNA传递到组合物中的氨基团。在某些实施例中，还提供了包括所述聚合物和核酸的组合物。在某些实施例中，这些组合物被用于在体内沉默一个或多个基因或治疗疾病或紊乱。
• Omega-quaternary ammonium alkyl esters and thioesters of acidic nonsteroidal antiinflammatory drugs
  申请人：SYNTEX PHARMACEUTICALS INTERNATIONAL LIMITED

  公开号：EP0289262A2

  公开（公告）日：1988-11-02

  Quaternary ammonium alkyl esters and thioesters of acidic nonsteroidal anti-inflammatory drugs (NSAIDs) are disclosed. These esters and thioesters display the anti-­inflammatory profile of the parent NSAIDs with greatly reduced gastrointestinal irritancy, providing a more favorable separation of therapeutic activity and toxicological side effects than the parent NSAIDs.

  本发明公开了酸性非甾体抗炎药（NSAIDs）的季铵烷基酯和硫代酯。这些酯类和硫代酯类具有母体非甾体抗炎药的抗炎特性，但胃肠道刺激性大大降低，与母体非甾体抗炎药相比，能更有效地将治疗活性和毒副作用分开。
• Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films
  申请人：BASF SE

  公开号：EP2428541A1

  公开（公告）日：2012-03-14

  An aqueous polishing composition has been found, the said aqueous polishing composition comprising (A) at least one type of abrasive particles which are positively charged when dispersed in an aqueous medium free from component (B) and having a pH in the range of from 3 to 9 as evidenced by the electrophoretic mobility; (B) at least one water-soluble polymer selected from the group consisting of linear and branched alkylene oxide homopolymers and copolymers; and (C) at least one anionic phosphate dispersing agent; and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.

  发现了一种水性抛光组合物，所述水性抛光组合物包括 (A) 至少一种磨料颗粒，分散在不含组分（B）的水介质中时带正电，从电泳迁移率看，其 pH 值在 3 至 9 之间； (B) 至少一种水溶性聚合物，选自由线性和支链环氧亚烷基均聚物和共聚物组成的 组；以及 (C) 至少一种阴离子磷酸盐分散剂； 以及一种利用该水性抛光组合物对电气、机械和光学设备的基底材料进行抛光的工艺。
• Method of polishing a silicon-containing dielectric
  申请人：Cabot Microelectronics Corporation

  公开号：US20040152309A1

  公开（公告）日：2004-08-05

  The invention is directed to a method of polishing a silicon-containing dielectric layer involving the use of a chemical-mechanical polishing system comprising (a) an inorganic abrasive, (b) a polishing additive, and (c) a liquid carrier, wherein the polishing composition has a pH of about 4 to about 6. The polishing additive comprises a functional group having a pK a of about 4 to about 9 and is selected from the group consisting of arylamines, aminoalcohols, aliphatic amines, heterocyclic amines, hydroxamic acids, aminocarboxylic acids, cyclic monocarboxylic acids, unsaturated monocarboxylic acids, substituted phenols, sulfonamides, thiols, salts thereof, and combinations thereof. The invention is further directed to the chemical-mechanical polishing system, wherein the inorganic abrasive is ceria.

  本发明涉及一种对含硅介电层进行抛光的方法，该方法涉及使用一种化学机械抛光系统，该系统包括(a)一种无机磨料、(b)一种抛光添加剂和(c)一种液体载体，其中抛光组合物的 pH 值约为 4 至 6。 a 为约 4 至约 9 的官能团，该官能团选自由芳胺、氨基醇、脂肪胺、杂环胺、羟肟酸、氨基羧酸、环状单羧酸、不饱和单羧酸、取代酚、磺酰胺、硫醇、其盐及其组合组成的组。本发明还涉及化学机械抛光系统，其中无机磨料为铈。
• Readily deinkable toners
  申请人：Carter W. Phillip

  公开号：US20060196848A1

  公开（公告）日：2006-09-07

  The invention is directed to a method of polishing a silicon-containing dielectric layer involving the use of a chemical-mechanical polishing system comprising (a) an inorganic abrasive, (b) a polishing additive, and (c) a liquid carrier, wherein the polishing composition has a pH of about 4 to about 6. The polishing additive comprises a functional group having a pK a of about 3 to about 9 and is selected from the group consisting of arylamines, aminoalcohols, aliphatic amines, heterocyclic amines, hydroxamic acids, aminocarboxylic acids, cyclic monocarboxylic acids, unsaturated monocarboxylic acids, substituted phenols, sulfonamides, thiols, salts thereof, and combinations thereof. The invention is further directed to the chemical-mechanical polishing system, wherein the inorganic abrasive is ceria.

  本发明涉及一种对含硅介电层进行抛光的方法，该方法涉及使用一种化学机械抛光系统，该系统包括(a)一种无机磨料、(b)一种抛光添加剂和(c)一种液体载体，其中抛光组合物的 pH 值约为 4 至 6。 a 为约 3 至约 9 的官能团，该官能团选自由芳胺、氨基醇、脂肪胺、杂环胺、羟肟酸、氨基羧酸、环状单羧酸、不饱和单羧酸、取代酚、磺酰胺、硫醇、其盐及其组合组成的组。本发明还涉及化学机械抛光系统，其中无机磨料为铈。