作者:Tadashi Suehiro、Seiichi Masuda、Takaaki Tashiro、Ryuichi Nakausa、Masamichi Taguchi、Akemi Koike、Anton Rieker
DOI:10.1246/bcsj.59.1877
日期:1986.6
Aryldiazenyl radicals were formed at −104–−116°C by photoirradiation of cyclopropane solutions of 1-aryl-2-(arylthio)diazenes and of l-aryl-3,3-dimethyltriazenes in the presence or absence of olefins, and also by irradiation of cyclopropane solutions of substituted 1,2,3-benzothiadiazoles in the presence of di-t-butyl peroxide. The ESR spectra were analyzed and the hfs constants were assigned by reference to the spectra of methyl, 2H, and 15N-labelled aryldiazenyl radicals and to the results of CINDO calculations. Aryldiazenyl radicals are relatively persistent and the –N=N group rotates about the C–N2 bond axis. The preferred conformations of the radicals were considered.
在-104--116°C 的温度下,通过光照射 1-芳基-2-(芳硫基)二氮烯和 l-芳基-3,3-二甲基三氮烯的环丙烷溶液(有无烯烃均可),以及通过照射取代的 1,2,3-苯并噻二唑的环丙烷溶液(有无二叔丁基过氧化物均可),形成了芳基二氮烯自由基。参照甲基、2H 和 15N 标记的芳基二苯乙烯基的光谱以及 CINDO 计算的结果,对 ESR 光谱进行了分析并确定了 hfs 常量。芳基二氮基是相对持久的,-N=N 基团围绕 C-N2 键轴旋转。研究考虑了自由基的优选构象。