1-Chlor-anthracen-9-carbonsaeure | 14378-76-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 1-Chlor-anthracen-9-carbonsaeure
• 英文别名: 1-Chloroanthracene-9-carboxylic acid
• CAS: 14378-76-8
• 化学式: C₁₅H₉ClO₂
• 分子量: 256.688
• InChiKey: PMNDIDVHVTWPKX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  18
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  1-氯蒽 在 五溴化磷 作用下， 生成 1-Chlor-anthracen-9-carbonsaeure
  参考文献：
  名称：

  Tret'yakova,G.S. et al., Soviet progress in chemistry, 1967, vol. 33, # 3, p. 55 - 56

  摘要：

  DOI：

文献信息

• Use of 2-phenylene diamine derivatives for the treatment of infections
  申请人：——

  公开号：US20030036532A1

  公开（公告）日：2003-02-20

  The invention relates to the use of compounds of formula (I), wherein n=0-3; R 1 , R 2 =H, alkyl, aryl, heteroaryl, acyl; R 3 =H, halogen, alkyl, aryl, heteroaryl, arylalkyl, acyl, CN, NO 2 , R 4 —X—; R 4 =H, alkyl, aryl, heteroaryl, aralkyl, acyl; X=NH, O, S, SO 2 , NHSO 2 , OSO 2 , and A, B, C=organic groups. The inventive compounds are used for the prophylaxis and the therapeutic treatment of infectious processes, especially of infectious processes caused by parasites. The invention further relates to medicaments that contain the inventive compounds.

  该发明涉及使用式(I)的化合物，其中n=0-3；R1、R2=H、烷基、芳基、杂环芳基、酰基；R3=H、卤素、烷基、芳基、杂环芳基、芳基烷基、酰基、CN、NO2、R4—X—；R4=H、烷基、芳基、杂环芳基、芳基烷基、酰基；X=NH、O、S、SO2、NHSO2、OSO2，以及A、B、C=有机基团。这些新颖化合物可用于预防和治疗感染过程，特别是由寄生虫引起的感染过程。该发明还涉及含有这些新颖化合物的药物。
• SULFONATE COMPOUND, PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
  申请人：SAN-APRO LIMITED

  公开号：US20170233336A1

  公开（公告）日：2017-08-17

  Provided are: a non-ionic photoacid generator containing a sulfonate compound having a high photosensitivity to i lines, exhibiting excellent heat-resistance stability, and exhibiting excellent solubility in a hydrophobic material; and a resin composition for photolithography containing the same. The present invention is a sulfonate compound characterized by being represented by general formula (1). [In formula (1), R1 represents an aryl group having 6 to 18 carbon atoms or a heterocyclic hydrocarbon group having 4 to 20 carbon atoms. R2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an alkynyl group having 2 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms. R3 represents a hydrocarbon group having 1 to 18 carbon atoms (in which some or all hydrogen atoms may be substituted with fluorine).]

  提供的是：一种非离子光酸发生剂，含有对i线具有高光敏度的磺酸化合物，表现出优异的耐热稳定性，并在疏水材料中表现出优异的溶解性；以及含有该化合物的光刻树脂组合物。本发明是一种磺酸化合物，其特征在于由通式（1）表示。[在式（1）中，R1表示具有6至18个碳原子的芳基基团或具有4至20个碳原子的杂环烃基团。R2表示氢原子，具有1至18个碳原子的烷基基团，具有2至18个碳原子的烯基基团，具有2至18个碳原子的炔基基团或具有6至18个碳原子的芳基基团。R3表示具有1至18个碳原子的烃基团（其中一些或全部氢原子可以被氟代替）。]
• SULFONATE COMPOUND, PHOTOACID GENERATOR, AND PHOTOLITHOGRAPHIC RESIN COMPOSITION
  申请人：San-Apro Ltd.

  公开号：EP3216783A1

  公开（公告）日：2017-09-13

  Provided are: a non-ionic photoacid generator containing a sulfonate compound having a high photosensitivity to i lines, exhibiting excellent heat-resistance stability, and exhibiting excellent solubility in a hydrophobic material; and a resin composition for photolithography containing the same. The present invention is a sulfonate compound characterized by being represented by general formula (1). [In formula (1), R1 represents an aryl group having 6 to 18 carbon atoms or a heterocyclic hydrocarbon group having 4 to 20 carbon atoms. R2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an alkynyl group having 2 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms. R3 represents a hydrocarbon group having 1 to 18 carbon atoms (in which some or all hydrogen atoms may be substituted with fluorine).]

  本发明提供了：一种非离子型光酸发生器，该发生器含有对 i 线具有高光敏感性的磺酸盐化合物，具有优异的耐热稳定性，并且在疏水性材料中具有优异的溶解性；以及一种含有该磺酸盐化合物的光刻用树脂组合物。本发明是一种磺酸盐化合物，其特征在于由通式（1）表示。 式（1）中，R1 代表具有 6 至 18 个碳原子的芳基或具有 4 至 20 个碳原子的杂环烃基。R2 代表氢原子、具有 1 至 18 个碳原子的烷基、具有 2 至 18 个碳原子的烯基、具有 2 至 18 个碳原子的炔基或具有 6 至 18 个碳原子的芳基。R3 代表具有 1 至 18 个碳原子的烃基（其中部分或全部氢原子可被氟取代）。
• Sulfonate compound, photoacid generator, and resin composition for photolithography
  申请人：SAN-APRO LIMITED

  公开号：US10450266B2

  公开（公告）日：2019-10-22

  Provided are: a non-ionic photoacid generator containing a sulfonate compound having a high photosensitivity to i lines, exhibiting excellent heat-resistance stability, and exhibiting excellent solubility in a hydrophobic material; and a resin composition for photolithography containing the same. The present invention is a sulfonate compound characterized by being represented by general formula (1). [In formula (1), R1 represents an aryl group having 6 to 18 carbon atoms or a heterocyclic hydrocarbon group having 4 to 20 carbon atoms. R2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an alkynyl group having 2 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms. R3 represents a hydrocarbon group having 1 to 18 carbon atoms (in which some or all hydrogen atoms may be substituted with fluorine).]

  本发明提供了：一种非离子型光酸发生器，该发生器含有对 i 线具有高光敏感性的磺酸盐化合物，具有优异的耐热稳定性，并且在疏水性材料中具有优异的溶解性；以及一种含有该磺酸盐化合物的光刻用树脂组合物。本发明是一种磺酸盐化合物，其特征在于由通式（1）表示。 式（1）中，R1 代表具有 6 至 18 个碳原子的芳基或具有 4 至 20 个碳原子的杂环烃基。R2 代表氢原子、具有 1 至 18 个碳原子的烷基、具有 2 至 18 个碳原子的烯基、具有 2 至 18 个碳原子的炔基或具有 6 至 18 个碳原子的芳基。R3 代表具有 1 至 18 个碳原子的烃基（其中部分或全部氢原子可被氟取代）。
• MANGANESE CHELATES WITH HIGH RELAXIVITY IN SERUM
  申请人：BRACCO S.p.A.

  公开号：EP1061956B1

  公开（公告）日：2002-12-11