ACETYLENE COMPOUND, SALT THEREOF, CONDENSATE THEREOF, AND COMPOSITION THEREOF
申请人:Fujifilm Corporation
公开号:EP2202220A1
公开(公告)日:2010-06-30
[Problem to be Solved]
To provide an acetylene compound having a structure in which a unit having an amino group and a unit having an ethynyl group are bonded via a linking group, the acetylene compound being introducable to a polymer having thermal resistance.
[Means for Solving the Problem] An acetylene compound represented by the following Formula (1) and a salt thereof:
wherein in Formula (1), X represents a single bond or a divalent linking group; A represents a hydrocarbon group, a heteroaromatic ring or a heteroalicyclic compound; B represents a hydrocarbon group, a heteroaromatic ring, a heteroalicyclic compound or a single bond; R1 represents a hydrogen atom, a hydrocarbon group, a heteroaromatic ring, a heteroalicyclic compound or a silyl group; R4 represents a hydrogen atom or a group that can be a substituent of an amino group; and m, n and a each independently represent an integer of 1 or greater.
The invention provides an acetylene compound represented by the following Formula (1), which is useful as a raw material for a polymer achieving high thermal resistance;
wherein, in Formula (1), the encircled Ar represents an aryl group or a heteroaryl group; X represents a divalent linking group; R, R' and R1 each independently represent a hydrogen atom, a hydrocarbon group or a heterocyclic group; R2 represents a hydrogen atom or a substituent substitutable on a benzene ring; A represents a hydrocarbon group or a heterocyclic group; Q represents a hydrogen atom, a hydrocarbon group, or a metal element capable of forming a monovalent metal salt; a represents an integer from 0 or more; b, m and n each independently represent an integer of 1 or more; when n, m and b are 1 at the same time, X is not -(C=O)O-; and when n is 2, and both m and b are 1, X is not -O-.
本发明提供了一种由下式(1)表示的乙炔化合物,它可用作具有高耐热性的聚合物的原料;
其中,在式(1)中,环绕的 Ar 代表芳基或杂芳基;X 代表二价连接基团;R、R'和 R1 各自独立地代表氢原子、烃基或杂环基团;R2 代表氢原子或可取代苯环的取代基;A 代表烃基或杂环基团;Q代表氢原子、烃基或能形成一价金属盐的金属元素;a代表0或0以上的整数;b、m和n各自独立地代表1或1以上的整数;当n、m和b同时为1时,X不是-(C=O)O-;当n为2且m和b均为1时,X不是-O-。
Developing solution and method of forming polyimide pattern by using the developing solution
申请人:Yoshiaki Kawamonzen
公开号:US20010006767A1
公开(公告)日:2001-07-05
Disclosed is a developing solution for a photosensitive polyimide, which consists of an aqueous solution of an amine compound having a base dissociation index pKb [=−log (Kb)=−log (Kw/Ka)=14−pKa, where Kb is a base dissociation constant, Ka is acid dissociation constant of a proton complex, pKa is an acid dissociation index of a proton complex=−log (Ka), and Kw is an ion product of water=1×10
−14
] of 5 to 8 within an aqueous solution of 25° C.
A composite material obtained by laminating (A) a layer formed of an epoxy resin curing composition including a polyamide compound having a structure containing a phenolic hydroxyl group represented by the following formula (I) or (II) in its repeating unit and (B) a layer of a polyimide to each other. The composite material is preferably obtained by applying the epoxy resin curing composition to at least one side of a polyimide film or sheet. In formula (I), ring A and R each represent an arylene group having 6 to 18 carbon atoms, an alkylidenediarylene group having 13 to 25 carbon atoms, etc. In formula (II), ring B is an arylene group having 6 to 18 carbon atoms or an alkylidenediaryl group having 13 to 25 carbon atoms.