2,2',4,4'-tetrahydroxydiphenylmethane | 7583-20-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,2',4,4'-tetrahydroxydiphenylmethane
• 英文别名: bis(2,4-dihydroxyphenyl)methane；4,4'-methanediyl-di-resorcinol；Bis-(2.4-dihydroxy-phenyl)-methan；4,4'-Methandiyl-di-resorcin；2.4.2'.4'-Tetraoxy-diphenylmethan；2.4.2'.4'-Tetraoxy-ditan；4,4'-Methylenediresorcinol；4-[(2,4-dihydroxyphenyl)methyl]benzene-1,3-diol
• CAS: 7583-20-2
• 化学式: C₁₃H₁₂O₄
• 分子量: 232.236
• InChiKey: FNFYXIMJKWENNK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  17
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.08
• 拓扑面积：
  80.9
• 氢给体数：
  4
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  2,2',4,4'-tetrahydroxydiphenylmethane 在 硫酸 作用下， 生成 6-羟基-3-氧杂蒽-3-酮
  参考文献：
  名称：

  Moehlau; Koch, Chemische Berichte, 1894, vol. 27, p. 2888

  摘要：

  DOI：
• 作为产物：
  描述：

  3-Hydroxy-4-methylidenecyclohexa-2,5-dien-1-one 、 邻苯二酚 生成 2,2',4,4'-tetrahydroxydiphenylmethane
  参考文献：
  名称：

  MCGRAW, GERALD W.;LAKS, PETER E.;HEMINGWAY, RICHARD W., J. WOOD CHEM. AND TECHNOL., 8,(1988) N 1, 91-109

  摘要：

  DOI：

文献信息

• NOVOLAC RESIN AND RESIST FILM
  申请人：DIC Corporation

  公开号：US20180334523A1

  公开（公告）日：2018-11-22

  Provided are a novolac resin having developability, heat resistance, and dry etching resistance, and a photosensitive composition, a curable composition, and a resist film. A novolac resin including, as a repeating unit, a structural moiety represented by Structural Formula (1) or (2): (in the formula, Ar represents an arylene group, R 1 's each independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, m's each independently represent an integer of 1 to 3, and X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group) in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

  提供一种具有可开发性、耐热性和干法蚀刻抗性的新戊醛树脂，以及一种光敏组合物、可固化组合物和抗蚀膜。一种新戊醛树脂包括以下结构单元： （在公式中，Ar代表芳基，R 1 分别独立地代表氢原子、烷基、烷氧基和卤素原子中的任意一种，m分别独立地代表1至3的整数，X代表氢原子、三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种），树脂中至少有一个X是三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种。
• Coating compound for forming titanium oxide film, method for forming titanium oxide film and metal substrate coated with titanium oxide film
  申请人：——

  公开号：US20040244648A1

  公开（公告）日：2004-12-09

  The present invention provides a coating composition for forming a titanium oxide film, comprising (A) a specific titanium-containing aqueous liquid and (B) at least one compound selected from the group consisting of organic acids and their salts. The present invention also provides a process for forming a titanium oxide film using the coating composition, and a metal substrate coated therewith.

  本发明提供了一种用于形成钛氧化物膜的涂层组合物，包括（A）特定的含钛水性液体和（B）选择自有机酸及其盐组成的群体中的至少一种化合物。本发明还提供了使用该涂层组合物形成钛氧化物膜的方法，以及涂有该膜的金属基板。
• Method for producing 1,2-naphthoquinonediazide photosensitive agent
  申请人：——

  公开号：US20010049433A1

  公开（公告）日：2001-12-06

  A method for producing a high-purity 1,2-naphthoquinonediazide photosensitive agent containing a low level of impurities, by condensing, in an organic solvent other than amide, polyhydric phenolic compound and 1,2-naphthoquinonediazide-sulfonic acid halide in the presence of organic amine; subsequently adding amide solvent to the resultant reaction mixture; and separating the resulting organic amine acid salt through filtration.

  一种生产高纯度的1,2-萘醌二氮化酯感光剂的方法，其中含有低水平的杂质，通过在除酰胺以外的有机溶剂中，将多羟基酚类化合物和1,2-萘醌二氮化酯磺酸氯化物在有机胺的存在下缩合；随后向所得反应混合物中加入酰胺溶剂；并通过过滤分离产生的有机胺酸盐。
• COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20190010108A1

  公开（公告）日：2019-01-10

  The present invention employs a compound represented by the following formula (0): wherein R Y is a linear, branched, or cyclic alkyl group of 1 to 30 carbon atoms or an aryl group of 6 to 30 carbon atoms; R Z is an N-valent group of 1 to 60 carbon atoms or a single bond; each R T is independently an alkyl group of 1 to 30 carbon atoms optionally having a substituent, an aryl group of 6 to 40 carbon atoms optionally having a substituent, an alkenyl group of 2 to 30 carbon atoms optionally having a substituent, an alkoxy group of 1 to 30 carbon atoms optionally having a substituent, a halogen atom, a nitro group, an amino group, a cyano group, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group, wherein the alkyl group, the alkenyl group, and the aryl group each optionally contain an ether bond, a ketone bond, or an ester bond, wherein at least one R T is a hydroxy group or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group; X is an oxygen atom, a sulfur atom, or not a crosslink; each m is independently an integer of 0 to 9, wherein at least one m is an integer of 1 to 9; N is an integer of 1 to 4, wherein when N is an integer of 2 or larger, N structural formulas within the parentheses [ ] are the same or different; and each r is independently an integer of 0 to 2.

  本发明采用以下式（0）所代表的化合物：其中RY是1到30个碳原子的直链、支链或环烷基基团，或者是6到30个碳原子的芳基基团；RZ是1到60个碳原子的N价基团或者是一个单键；每个RT独立地是1到30个碳原子的烷基基团，可选地带有取代基，是6到40个碳原子的芳基基团，可选地带有取代基，是2到30个碳原子的烯基基团，可选地带有取代基，是1到30个碳原子的烷氧基基团，可选地带有取代基，是卤素原子、硝基基团、氨基基团、氰基基团、硫醇基团、羟基或者羟基的氢原子被酸解离基团取代的基团，其中烷基基团、烯基基团和芳基基团每个可选地包含醚键、酮键或酯键，其中至少一个RT是羟基或者羟基的氢原子被酸解离基团取代的基团；X是氧原子、硫原子或者不是交联；每个m独立地是0到9的整数，其中至少一个m是1到9的整数；N是1到4的整数，当N是2或更大的整数时，括号中的N个结构式是相同或不同的；每个r独立地是0到2的整数。
• COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210070727A1

  公开（公告）日：2021-03-11

  The present invention provides a compound represented by following formula (0):

  本发明提供了以下式（0）表示的化合物。