申请人:——
公开号:US20030096993A1
公开(公告)日:2003-05-22
Mixtures of compounds comprising a compound G
2
and at least one further compound from the group G
0
, G
1
, G
3
, G
4
, G
5
, G
6
, the compounds G
0
-G
6
each corresponding to formula (I) in which, in the compound G
0
, the radicals R
1
, R
2
, R
3
, R
4
, R
5
and R
6
are each hydrogen; G
1
, the radical R
1
is Q and R
2
, R
3
, R
4
, R
5
and R
6
are each hydrogen; G
2
, the radicals R
1
and R
2
independently of one another are each Q and R
3
, R
4
, R
5
and R
6
are each hydrogen; G
3
the radicals R
1
, R
2
and R
3
independently of one another are each Q and R
4
, R
5
and R
6
are each hydrogen; G
4
, the radicals R
1
, R
2
, R
3
and R
4
independently of one another are each Q and R
5
and R
6
are each hydrogen; G
5
, the radicals R
1
, R
2
, R
3
, R
4
and R
5
independently of one another are each Q and R
6
is hydrogen; G
6
, the radicals R
1
, R
2
, R
3
, R
4
, R
5
and R
6
independently of one another are each Q; and Q and the other symbols are as defined in claim
1,
are effective as stabilizers for organic material with respect to damaging exposure to light, oxygen and/or heat.
由化合物G2和来自G0、G1、G3、G4、G5、G6组的至少一种进一步化合物组成的混合物,其中化合物G0-G6分别对应于公式(I),其中,在化合物G0中,基团R1、R2、R3、R4、R5和R6均为氢;在化合物G1中,基团R1为Q,基团R2、R3、R4、R5和R6均为氢;在化合物G2中,基团R1和R2相互独立地为Q,基团R3、R4、R5和R6均为氢;在化合物G3中,基团R1、R2和R3相互独立地为Q,基团R4、R5和R6均为氢;在化合物G4中,基团R1、R2、R3和R4相互独立地为Q,基团R5和R6均为氢;在化合物G5中,基团R1、R2、R3、R4和R5相互独立地为Q,基团R6为氢;在化合物G6中,基团R1、R2、R3、R4、R5和R6相互独立地为Q;其中Q和其他符号如权利要求1中所定义,对于有机材料具有抗光、氧和/或热损伤的稳定剂效果。