(4-Nitrophenyl)methyl 9,10-dipropoxyanthracene-2-sulfonate | 144146-37-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: (4-Nitrophenyl)methyl 9,10-dipropoxyanthracene-2-sulfonate
• CAS: 144146-37-2
• 化学式: C27H27NO7S
• 分子量: 509.6
• InChiKey: AMCKJQODFJACGA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.8
• 重原子数：
  36
• 可旋转键数：
  10
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.26
• 拓扑面积：
  116
• 氢给体数：
  0
• 氢受体数：
  7

文献信息

• Radiation-sensitive resin composition
  申请人：JAPAN SYNTHETIC RUBBER CO., LTD.

  公开号：EP0330406A2

  公开（公告）日：1989-08-30

  A radiation-sensitive resin composition comprising a quinonediazide-type radiation-sensitive resin and a compound generating an acid upon irradiation. Said radiation-sensitive resin composition can be used as a resist suitable for dry development by plasma etching and enables one to obtain an etching image having high precision with high reproducibility at a high degree of resolution and selectivity.

  一种辐射敏感树脂组合物，由一种醌噻嗪类辐射敏感树脂和一种在辐照时产生酸的化合物组成。所述辐射敏感树脂组合物可用作适用于等离子体蚀刻干显影的抗蚀剂，能以高分辨率和高选择性获得高精度、高重现性的蚀刻图像。
• Inkjet ink
  申请人：Akiyama Ryozo

  公开号：US20070101898A1

  公开（公告）日：2007-05-10

  There is provided an inkjet ink comprising a photo-acid generating agent which is capable of generating an acid as it is irradiated with light, a color component, and an acid-polymerizable compound which can be polymerized in the presence of an acid, wherein at least 40% of the acid-polymerizable solvent is a vinyl ether compound represented by the following general formula (1): R 13 —R 14 —(R 13 ) p (1) (Wherein R 13 (s) is a group selected from the group consisting of a vinyl ether group, a group having a vinyl ether skeleton, an alkoxy group, substituted hydroxyl group and hydroxyl group wherein at least one of R 13 (s) is vinyl ether group or a group having a vinyl ether skeleton, R 14 is a group comprising a substituted or unsubstituted cyclic skeleton and having a valence of (p+1), and p is a positive integer including zero).
• METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, ACID ETCHING RESISTANCE MATERIAL AND COPOLYMER
  申请人：Asakawa Koji

  公开号：US20070142592A1

  公开（公告）日：2007-06-21

  Disclosed is an acid etching resistance material comprising a compound having a repeating unit represented by the following general formula (1): (in the general formula (1), R 1 is a hydrogen atom or methyl group; R 3 is a cyclic group selected from an alicyclic group and an aromatic group; R 4 is a polar group; R 2 is a group represented by the following general formula (2); and j is 0 or 1): (in the general formula (2), R 5 is a hydrogen atom or methyl group).
• Ink jet recording apparatus
  申请人：Hiroki Masashi

  公开号：US20080273066A1

  公开（公告）日：2008-11-06

  An ink jet recording apparatus comprising a color ink container having a capacity V1 accommodating therein a solvent polymerizable in the presence of an acid and a colorant, a reaction liquid container having a capacity V2 (V2
• PHOTOSENSITIVE COMPOSITION
  申请人：HATTORI Shigeki

  公开号：US20090208866A1

  公开（公告）日：2009-08-20

  A photosensitive composition is provided, which includes a compound expressed by the formula T3 and a photo-acid generator which generates an acid by an action of actinic radiation. In the formula T3, R 3 s are hydrogen atoms and hydrophobic groups. The hydrophobic groups are selected from the group consisting of (AD-1), (AD-2), and (AD-3) shown below, and the hydrogen atoms are partially substituted with a hydrophilic group (LA) shown below.