1,1,2,2-Tetraoxo-1-phenyl-2-[4-(propan-2-yl)phenyl]-1lambda~6~,2lambda~6~-disulfane | 124737-97-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,1,2,2-Tetraoxo-1-phenyl-2-[4-(propan-2-yl)phenyl]-1lambda~6~,2lambda~6~-disulfane
• 英文别名: 1-(benzenesulfonylsulfonyl)-4-propan-2-ylbenzene
• CAS: 124737-97-9
• 化学式: C₁₅H₁₆O₄S₂
• 分子量: 324.422
• InChiKey: SBLBXZBAXCXCEH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  21
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  85
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  N'-(benzenesulfonyl)-4-propan-2-ylbenzenesulfonohydrazide 在 硝酸 作用下， 反应 4.0h， 以44%的产率得到1,1,2,2-Tetraoxo-1-phenyl-2-[4-(propan-2-yl)phenyl]-1lambda~6~,2lambda~6~-disulfane
  参考文献：
  名称：

  Eine einfache und allgemeine Methode zur Herstellung von α-Disulfonen (R¹SO₂SO₂R²)

  摘要：

  一种简便通用的α-二砜制备方法 α-二砜（R1SO2SO2R2）的二烷基、二芳基及烷基芳基二砜可以通过硝酸氧化N,N′-二磺酰肼来轻松制备。该方法适用于硫原子上多种取代基（R1，R2）。

  DOI：

  10.1055/s-1993-25891

文献信息

• Positive resist composition and pattern forming method using the same
  申请人：Shirakawa Koji

  公开号：US20050277060A1

  公开（公告）日：2005-12-15

  A positive resist composition satisfying high sensitivity, high resolution, good pattern profile and good in-vacuum PED property at the same time, and a pattern forming method using the composition, are provided, which is a positive resist composition comprising: (A) a resin which is insoluble or sparingly soluble in an alkali developer and becomes soluble in an alkali developer under the action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) an organic basic compound, wherein (A1) a resin containing a repeating unit having a specific structure and (A2) a resin other than the resin (A1) are contained as the resin of the component (A); and a pattern forming method using the composition.

  提供了一种满足高灵敏度、高分辨率、良好的图案轮廓和良好的真空PED特性的正性光阻组合物及其图案形成方法，其中该正性光阻组合物包括：（A）一种树脂，在碱性显影剂中不溶或难溶，在酸的作用下变为可溶于碱性显影剂；（B）一种能够在受到光致辐射时产生酸的化合物；（C）一种有机碱性化合物，其中作为组分（A）的树脂包含具有特定结构的重复单元的树脂（A1）和不包含树脂（A1）的其他树脂（A2）；以及使用该组合物的图案形成方法。
• Positive photosensitive composition
  申请人：Kodama Kunihiko

  公开号：US20070003871A1

  公开（公告）日：2007-01-04

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

  一种正性光敏组合物包括一种化合物，该化合物能够在接受活性光线或辐射照射后产生一种指定的磺酸，并且（B）一种树脂，该树脂在酸作用下分解以增加在碱性显影剂中的溶解度。
• Bartmann Ekkehard A., Synthesis, (1993) N 5, S 490- 496
  作者：Bartmann Ekkehard A.

  DOI：——

  日期：——
• Near Infrared Ray Activation Type Positive Resin Composition
  申请人：Imai Genji

  公开号：US20070259279A1

  公开（公告）日：2007-11-08

  A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.
• Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same
  申请人：Imai Genji

  公开号：US20090045552A1

  公开（公告）日：2009-02-19

  Provided are a positive resist composition for recording medium master showing excellent plating resistance and adhesion to a base plate such as glass or the like characterized by containing a vinyl polymer which has a monomer unit having an alkali-soluble group blocked by an alkyl vinyl ether, and a method of producing a recording medium master or stamper using this positive resist composition.