1,1-dimethylpropyl N-[4-[[4-(1,1-dimethylpropoxycarbonylamino)phenyl]methyl]phenyl]carbamate | 50607-39-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,1-dimethylpropyl N-[4-[[4-(1,1-dimethylpropoxycarbonylamino)phenyl]methyl]phenyl]carbamate
• 英文别名: N,N'-di-t-pentyloxycarbonyl-4,4'-diaminodiphenylmethane；N,N'-di(t-amyloxycarbonyl)-4,4'-diaminodiphenylmethane；2-methylbutan-2-yl N-[4-[[4-(2-methylbutan-2-yloxycarbonylamino)phenyl]methyl]phenyl]carbamate
• CAS: 50607-39-1
• 化学式: C₂₅H₃₄N₂O₄
• 分子量: 426.556
• InChiKey: LMUAJUMCRUWCBU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6
• 重原子数：
  31
• 可旋转键数：
  10
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.44
• 拓扑面积：
  76.7
• 氢给体数：
  2
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  2-甲基-2-丁醇 、 4,4'-二苯甲烷二异氰酸酯、2,4'-二苯甲烷二异氰酸酯和2,2'-二苯甲烷二异氰酸酯的混合物 在 copper(II) 2-ethylhexanoate 作用下， 以 苯 为溶剂， 生成 1,1-dimethylpropyl N-[4-[[4-(1,1-dimethylpropoxycarbonylamino)phenyl]methyl]phenyl]carbamate
  参考文献：
  名称：

  Francis,T.; Thorne,M.P., Canadian Journal of Chemistry, 1976, vol. 54, p. 24 - 30

  摘要：

  DOI：

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20130288179A1

  公开（公告）日：2013-10-31

  A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that includes a structural unit having an acid-labile group. R 1 and R 4 each independently represent a hydrogen atom, or the like. R 2 and R 3 each independently represent a hydrogen atom or the like. X 1 and X 2 each independently represent a hydrogen atom, or the like, or X 1 and X 2 taken together represent —S—, —O—, —SO 2 —, or the like. A represents an ethanediyl group, wherein at least one hydrogen atom included in X 1 , X 2 and A is substituted by —Y—SO 3 − M + . Y represents an alkanediyl group having 1 to 10 carbon atoms, or the like. M + represents a monovalent onium cation. In the case where —Y—SO 3 − M + is present in a plurality of number, a plurality of Ys are each identical or different and a plurality of M + s are each identical or different.

  一种辐射敏感的树脂组合物，包括由式（1）表示的化合物和包括具有酸敏感基团的结构单元的聚合物。其中，R1和R4各自独立地表示氢原子等。R2和R3各自独立地表示氢原子等。X1和X2各自独立地表示氢原子等，或X1和X2一起表示-S-、-O-、-SO2-等。A表示乙二酰基基团，其中X1、X2和A中包含的至少一个氢原子被-Y-SO3-M+取代。Y表示具有1到10个碳原子的脂肪二基基团等。M+表示一价的离子型阳离子。在-Y-SO3-M+存在多个的情况下，多个Y可以相同或不同，多个M+可以相同或不同。
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
  申请人：JSR Corporation

  公开号：US20130216951A1

  公开（公告）日：2013-08-22

  A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R 1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R 2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.

  一种辐射敏感的树脂组合物，包括聚合物、产生酸的剂和有机溶剂。聚合物包括从公式（1）表示的化合物衍生的第一结构单元和从公式（2）表示的化合物衍生的第二结构单元。R1代表具有价数为（a+2）的有机基团，该有机基团与构成内酯环的碳原子一起形成具有3到8个碳原子的环结构。R2代表氟原子、羟基、具有1到20个碳原子的有机基团或类似物。
• PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, ACID GENERATING AGENT, AND PHOTODEGRADABLE BASE
  申请人：JSR CORPORATION

  公开号：US20140363769A1

  公开（公告）日：2014-12-11

  A photoresist composition containing a polymer having a structural unit including an acid-labile group, and a compound represented by the formula (1). In the formula (1), R 1 represents a hydrogen atom or a monovalent acid-labile group. R 2 represents an alicyclic hydrocarbon group having 3 to 20 carbon atoms and a valency of (m+1). m is an integer of 2 to 5. R 3 and R 4 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. n is an integer of 0 to 5. At least two of a plurality of R 1 s optionally taken together represent a ring structure, together with a plurality of oxygen atoms bonding to R 1 and the carbon atom(s) constituting R 2 and bonding to these oxygen atoms. M + represents a monovalent radiation-degradable onium cation.

  一种光刻胶组合物，包含具有酸敏感基团的结构单元的聚合物和由公式（1）表示的化合物。在公式（1）中，R1表示氢原子或一价酸敏感基团。R2表示具有3至20个碳原子和价态为（m+1）的脂环烃基团。m为2至5的整数。R3和R4分别独立地表示氢原子、氟原子、具有1至20个碳原子的一价碳氢基团或具有1至20个碳原子的一价氟碳基团。n为0至5的整数。至少两个可选的R1中的多个与与这些氧原子结合的R2所构成的碳原子形成环状结构。M+表示一价辐射降解的离子。
• RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP2325695A1

  公开（公告）日：2011-05-25

  A radiation-sensitive resin composition includes (A) a polymer, (B) a photoacid generator, (C) an acid diffusion controller, and (D) a solvent, the polymer (A) including a repeating unit (a-1) shown by the following general formula (a-1), and the acid diffusion controller (C) including at least one base selected from (C-1) a base shown by the following general formula (C-1) and (C-2) a photodegradable base. wherein R1 individually represent a hydrogen atom or the like, R represents a monovalent group shown by the above general formula (a'), R19 represents a chain-like hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain-like hydrocarbon group having 1 to 30 carbon atoms or the like, m and n are integers from 0 to 3 (m+n=1 to 3), and R2 and R3 individually represent a monovalent chain-like hydrocarbon group having 1 to 20 carbon atoms or the like, provided that the two R2 may bond to form a ring structure.

  一种辐射敏感树脂组合物包括（A）聚合物、（B）光酸发生器、（C）酸扩散控制器和（D）溶剂，聚合物（A）包括如下通式（a-1）所示的重复单元（a-1），酸扩散控制器（C）包括至少一种选自（C-1）如下通式（C-1）所示的碱和（C-2）可光降解碱的碱。 其中 R1 单独代表氢原子或类似物，R 代表上述通式（a'）所示的一价基团，R19 代表具有 1 至 5 个碳原子或类似物的链状烃基，A 代表具有 1 至 30 个碳原子或类似物的二价链状烃基，m 和 n 是 0 至 3 的整数（m+n=1 至 3），R2 和 R3 单独代表具有 1 至 20 个碳原子或类似物的一价链状烃基，条件是两个 R2 可以键合形成环状结构。
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND
  申请人：JSR Corporation

  公开号：EP2623558A1

  公开（公告）日：2013-08-07

  A radiation-sensitive resin composition includes: a polymer having a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2); an acid generator; and an organic solvent. In the formula (1), R1 represents a ring structure having 3 to 8 carbon atoms taken together with a carbon atom constituting a lactone ring; R2 represents a fluorine atom, a hydroxyl group or an organic group having 1 to 20 carbon atoms; and a is an integer of 0 to 6. In a case where a is 2 or greater, a plurality of R2s are identical or different, or represent a ring structure taken together with each other. At least one group of R1 and R2 has a hetero atom or a halogen atom.

  一种辐射敏感树脂组合物包括：一种聚合物，其第一结构单元由式（1）表示的化合物衍生而来，第二结构单元由式（2）表示的化合物衍生而来；一种酸发生器；以及一种有机溶剂。在式 (1) 中，R1 代表具有 3 至 8 个碳原子的环结构，与一个碳原子一起构成内酯环；R2 代表氟原子、羟基或具有 1 至 20 个碳原子的有机基团；a 为 0 至 6 的整数。在 a 为 2 或更大的情况下，多个 R2 相同或不同，或彼此代表一个环结构。R1 和 R2 中至少有一个基团具有杂原子或卤原子。