[3,3-Difluoro-2-(trifluoromethyl)-2-bicyclo[2.2.1]hept-5-enyl] benzoate | 849803-65-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: [3,3-Difluoro-2-(trifluoromethyl)-2-bicyclo[2.2.1]hept-5-enyl] benzoate
• CAS: 849803-65-2
• 化学式: C₁₅H₁₁F₅O₂
• 分子量: 318.243
• InChiKey: GFQRKRJVSQHLJN-UHFFFAOYSA-N

物化性质

• 沸点：
  300.5±42.0 °C(Predicted)
• 密度：
  1.41±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  22
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  7

反应信息

• 作为产物：
  描述：

  2-(五氟丙基)苯甲酸 、 环戊二烯 反应 48.0h， 以74.7%的产率得到[3,3-Difluoro-2-(trifluoromethyl)-2-bicyclo[2.2.1]hept-5-enyl] benzoate
  参考文献：
  名称：

  Polymerizable compound, polymer, positive-resist composition, and patterning process using the same

  摘要：

  本发明提供了一种聚合物，其中至少具有一个或多个由下列通式（1a）表示的重复单元、一个由下列通式（2a）表示的重复单元、一个由下列通式（3b）表示的重复单元和一个由下列通式（1c）表示的重复单元，以及一种含有该聚合物作为基础树脂的正性光刻胶组合物。因此，可以提供一种在高能束照射下具有高灵敏度和高分辨率的正性光刻胶组合物，由于开发时膨胀被抑制，因此线边粗糙度小，开发后残留物少。

  公开号：

  US07332616B2

文献信息

• NOVEL POLYMERIZABLE COMPOUND, POLYMER, POSITIVE-RESIST COMPOSITION, AND PATTERNING PROCESS USING THE SAME
  申请人：Hatakeyama Jun

  公开号：US20070185226A1

  公开（公告）日：2007-08-09

  The present invention provides a polymer which has at least one or more of a repeating unit represented by a following general formula (1 a ), a repeating unit represented by a following general formula (2 a ) and a repeating unit represented by a following general formula (3 b ), and a repeating unit represented by a following general formula (1 c ), and a positive resist composition which contains as a base resin the polymer. Thereby, there can be provided a positive-resist composition having high sensitivity and high resolution in exposure with a high energy beam, wherein line edge roughness is small since swelling at the time of development is suppressed, and the residue after development is few.
• US7232641B2
  申请人：——

  公开号：US7232641B2

  公开（公告）日：2007-06-19
• US7332616B2
  申请人：——

  公开号：US7332616B2

  公开（公告）日：2008-02-19
• Polymerizable compound, polymer, positive-resist composition, and patterning process using the same
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US07332616B2

  公开（公告）日：2008-02-19

  The present invention provides a polymer which has at least one or more of a repeating unit represented by a following general formula (1a), a repeating unit represented by a following general formula (2a) and a repeating unit represented by a following general formula (3b), and a repeating unit represented by a following general formula (1c), and a positive resist composition which contains as a base resin the polymer. Thereby, there can be provided a positive-resist composition having high sensitivity and high resolution in exposure with a high energy beam, wherein line edge roughness is small since swelling at the time of development is suppressed, and the residue after development is few.

  本发明提供了一种聚合物，其中至少具有一个或多个由下列通式（1a）表示的重复单元、一个由下列通式（2a）表示的重复单元、一个由下列通式（3b）表示的重复单元和一个由下列通式（1c）表示的重复单元，以及一种含有该聚合物作为基础树脂的正性光刻胶组合物。因此，可以提供一种在高能束照射下具有高灵敏度和高分辨率的正性光刻胶组合物，由于开发时膨胀被抑制，因此线边粗糙度小，开发后残留物少。