[EN] AMINOPYRAZINE COMPOUNDS AS HPK1 INHIBITOR AND THE USE THEREOF<br/>[FR] COMPOSÉS D'AMINOPYRAZINE UTILISÉS EN TANT QU'INHIBITEURS DE HPK1 ET LEUR UTILISATION
申请人:BEIGENE LTD
公开号:WO2021032148A1
公开(公告)日:2021-02-25
Disclosed herein is an aminopyrazine compound of Formula (I), or a stereoisomer thereof, or a pharmaceutically acceptable salt thereof, and pharmaceutical compositions comprising thereof. Also disclosed is a method of treating HPK1 related disorders or diseases by using the compound disclosed herein.
[EN] AMIDOXIME COMPOUNDS AS CHELATING AGENTS IN SEMICONDUCTOR PROCESSES<br/>[FR] COMPOSÉS AMIDOXIME UTILISÉS COMME AGENTS CHÉLATEURS DANS DES OPÉRATIONS DE TRAITEMENT DE SEMI-CONDUCTEURS
申请人:EKC TECHNOLOGY INC
公开号:WO2009058288A1
公开(公告)日:2009-05-07
The present invention is a composition and cleaning method for use in semiconductor processes wherein the compositions comprises at least one amidoxime compound.
[EN] COMPOSITION COMPRISING CHELATING AGENTS CONTAINING AMIDOXIME COMPOUNDS<br/>[FR] COMPOSITION COMPRENANT DES AGENTS CHÉLATEURS CONTENANT DES COMPOSÉS D'AMIDOXIME
申请人:EKC TECHNOLOGY INC
公开号:WO2009085072A1
公开(公告)日:2009-07-09
The present invention is a novel aqueous cleaning solution for use in semiconductor front end of the line (FEOL) manufacturing process wherein the cleaning solution comprises at least one amidoxime compound.
Sutherland, Ronald G.; Zhang, Chun-Hao; Piorko, Adam, Canadian Journal of Chemistry, 1989, vol. 67, p. 137 - 142
作者:Sutherland, Ronald G.、Zhang, Chun-Hao、Piorko, Adam、Lee, Choi Chuck