12-bromododecyl 4-hydroxybenzoate | 1134354-53-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 12-bromododecyl 4-hydroxybenzoate
• CAS: 1134354-53-2
• 化学式: C₁₉H₂₉BrO₃
• 分子量: 385.341
• InChiKey: QZJCIDUNGKMXHC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.4
• 重原子数：
  23
• 可旋转键数：
  14
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.63
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  1,12-二溴十二烷 、 1,8-二氮杂双环[5.4.0]十一碳-7-烯 、 对羟基苯甲酸 以 N-甲基吡咯烷酮 、 氮气 、 乙酸乙酯 为溶剂， 生成 12-bromododecyl 4-hydroxybenzoate
  参考文献：
  名称：

  PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION

  摘要：

  一种感光组合物包括：（A）含有与下式（I）所表示的化合物对应的重复单元的树脂；该树脂能够在受到光敏射线或辐射照射后产生酸基团：Z-A-X—B—R   （I）其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团；A代表一个烷基基团；X代表一个单键或含杂原子的二价连接基团；B代表一个单键、一个氧原子或—N（Rx）-；Rx代表一个氢原子或一个一价有机基团；R代表一个通过Y取代的一价有机基团；当B代表—N（Rx）-时，R和Rx可以结合在一起形成一个环；Y代表一个可聚合的基团。

  公开号：

  US20100233617A1

文献信息

• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
  申请人：Takahashi Hidenori

  公开号：US20120156618A1

  公开（公告）日：2012-06-21

  According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.)

  根据一种实施例，一种感光射线或辐射敏感的树脂组合物包括树脂（P），该树脂不仅包含至少一个重复单元（A），当暴露于感光射线或辐射时，分解从而产生酸，并由下列任一通式（I）至（III）表示，而且还包括一个重复单元（B），其中至少包含一个芳香环基团，前提是重复单元（B）不包括通式（I）至（III）中的任何一个。（通式（I）至（III）中使用的字符在描述中有所提及。）
• Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition
  申请人：Wada Kenji

  公开号：US09051403B2

  公开（公告）日：2015-06-09

  A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X-B-R  (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  一种光敏感组合物包括：（A）树脂，其含有与以下式（I）所代表的化合物相对应的重复单元；该树脂能够在被光致辐射后产生酸基：Z-A-X-B-R  （I），其中Z代表能够在被光致辐射后脱离阳离子而产生酸基的基团；A代表一个烷基链；X代表单键或含有杂原子的双价连接基团；B代表单键、氧原子或—N（Rx）-；Rx代表氢原子或单价有机基团；R代表被Y取代的单价有机基团；当B代表—N（Rx）-时，R和Rx可以结合形成环；而Y代表可聚合基团。
• PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION, AND COMPOUND USED IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Fujifilm Corporation

  公开号：EP2192134A1

  公开（公告）日：2010-06-02

  A photosensitive composition ensuring good performance in terms of pattern profile and line edge roughness in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the photosensitive composition, and a compound for use in the photosensitive composition are provided. A photosensitive composition comprising: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X-B-R wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or -N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents -N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  本发明提供了一种在正常曝光（干法曝光）、浸泡曝光和双重曝光中均能确保图案轮廓和线边粗糙度性能良好的感光组合物，一种使用该感光组合物的图案形成方法，以及一种用于该感光组合物的化合物。 一种光敏组合物，包括：(A) 一种树脂，其中含有与下式（I）所代表的化合物相对应的重复单元；该树脂在接受辐照时能产生酸基：Z-A-X-B-R 其中，Z 代表能成为酸性基团的基团，该酸性基团是阳离子在接受放 射线或辐射照射时离开阳离子而形成的；A 代表亚烷基；X 代表单键或含杂原子的二价连接基团；B代表单键、氧原子或-N(Rx)-；Rx代表氢原子或一价有机基团；R代表被Y取代的一价有机基团；当B代表-N(Rx)-时，R和Rx可相互结合形成环；Y代表可聚合基团。
• US9051403B2
  申请人：——

  公开号：US9051403B2

  公开（公告）日：2015-06-09
• PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100233617A1

  公开（公告）日：2010-09-16

  A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  一种感光组合物包括：（A）含有与下式（I）所表示的化合物对应的重复单元的树脂；该树脂能够在受到光敏射线或辐射照射后产生酸基团：Z-A-X—B—R   （I）其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团；A代表一个烷基基团；X代表一个单键或含杂原子的二价连接基团；B代表一个单键、一个氧原子或—N（Rx）-；Rx代表一个氢原子或一个一价有机基团；R代表一个通过Y取代的一价有机基团；当B代表—N（Rx）-时，R和Rx可以结合在一起形成一个环；Y代表一个可聚合的基团。