bis-vinyl ether | 193687-66-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: bis-vinyl ether
• 英文别名: 1,4-Bis(ethenoxymethyl)benzene
• CAS: 193687-66-0
• 化学式: C₁₂H₁₄O₂
• 分子量: 190.242
• InChiKey: IYDMLQIUOVVNOP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  14
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.17
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  乙烯基正丁醚 、 对苯二甲醇 在 mercury(II) diacetate 作用下， 反应 0.5h， 以33%的产率得到(4-vinyloxymethyl-phenyl)-methanol
  参考文献：
  名称：

  Dihydropyrancarboxamides and uses thereof

  摘要：

  本发明提供了式（I）的新颖二氢吡喃羧酰胺化合物： 1 以及这些化合物的集合，并提供了合成这些化合物的方法；其中R 1 -R 6 如本文所定义。此外，本发明提供了用于治疗增殖性疾病和癌症等疾病的药物组合物和方法。

  公开号：

  US20040059138A1

文献信息

• FUMARIC ACID DIESTER-CINNAMIC ACID ESTER-BASED COPOLYMER, PRODUCTION METHOD THEREOF AND FILM USING THE SAME
  申请人：TOSOH CORPORATION

  公开号：US20150291751A1

  公开（公告）日：2015-10-15

  To provide a novel fumaric acid diester-cinnamic acid ester-based copolymer having a high molecular weight, which is expected to maintain excellent strength or ensures excellent toughness even when formed into a film, a method for efficiently producing the copolymer, and a film using the same. The fumaric acid diester-cinnamic acid ester-based copolymer contains a fumaric acid diester residue unit, a cinnamic acid ester residue unit having an alkyl group with a carbon number of 1 to 6, and a residue unit of a polyfunctional monomer having two or more radical polymerizable functional groups.

  提供一种具有高分子量的新型顺丁烯二酸二酯-肉桂酸酯共聚物，预计即使形成薄膜也能保持优异的强度或确保出色的韧性，以及一种高效生产该共聚物的方法和使用该共聚物的薄膜。该顺丁烯二酸二酯-肉桂酸酯共聚物包含顺丁烯二酸二酯残基单元、具有碳数为1至6的烷基的肉桂酸酯残基单元和具有两个或更多自由基聚合官能团的多官能单体残基单元。
• CURABLE EPOXY RESIN COMPOSITION AND CURED PRODUCT THEREOF, DIOLEFIN COMPOUND AND PRODUCTION METHOD THEREFOR, AND PRODUCTION METHOD FOR DIEPOXY COMPOUND
  申请人：DAICEL CORPORATION

  公开号：US20160122466A1

  公开（公告）日：2016-05-05

  An object of the present invention is to provide a curable epoxy resin composition, which is cured to provide a cured product having a high glass-transition temperature and particularly having excellent balance between heat resistance and transparency. The present invention relates to a curable epoxy resin composition comprising an alicyclic epoxy compound (A) represented by the following formula (1) and a curing agent (B), or a curable epoxy resin composition comprising an alicyclic epoxy compound (A) represented by the following formula (1) and a curing catalyst (C). wherein R 1 to R 22 , which may be the same or different, each represent a hydrogen atom, a methyl group or an ethyl group; and m and n, which may be the same or different, each represent an integer of 1 to 4.

  本发明的目的是提供一种可固化的环氧树脂组合物，其固化后形成具有高玻璃转变温度和特别具有热稳定性和透明度之间优异平衡的固化产物。本发明涉及一种可固化的环氧树脂组合物，包括由以下式（1）表示的脂环族环氧化合物（A）和固化剂（B），或包括由以下式（1）表示的脂环族环氧化合物（A）和固化催化剂（C）的可固化环氧树脂组合物。其中，R1到R22，可以相同也可以不同，分别表示氢原子、甲基基团或乙基基团；m和n，可以相同也可以不同，分别表示1到4的整数。
• COMPOUND, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
  申请人：Echigo Masatoshi

  公开号：US20130122423A1

  公开（公告）日：2013-05-16

  The object is to provide a compound having high dissolvability in a safe solvent and high sensitivity, and also capable of obtaining a good resist pattern shape, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition. For this purpose, a compound (B) obtained by reaction between a polyphenol based cyclic compound (A) and a compound (C) having a particular structure, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition are provided.

  本发明的目的是提供一种在安全溶剂中具有高溶解度和高灵敏度的化合物，同时还能获得良好的抗蚀图案形状，包含该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。为此，提供了通过多酚基环状化合物（A）和具有特定结构的化合物（C）反应得到的化合物（B），包含该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。
• SULFONIUM SALT COMPOUND AND POLYMERIZATION INITIATOR
  申请人：NIPPON SODA CO., LTD.

  公开号：EP0751124A1

  公开（公告）日：1997-01-02

  The present invention is directed to sulfonium salt-containing compounds represented by a following general formula; wherein R1 is alkyl containing from 1 to 18 carbon atoms, hydroxy, alkoxy containing from 1 to 18 carbon atoms, alkylcarbonyloxy containing from 1 to 18 carbon atoms or halogen, n is any of 0, 1, 2 or 3, however, each of R1 may be different from the others when n is 2 or more, R2 is alkyl containing from 1 to 6 carbon atoms, R3 and R4 are each independently hydrogen or alkyl containing from 1 to 6 carbon atoms, R5 and R6 are each independently hydrogen, alkyl containing from 1 to 6 carbon atoms, hydroxy, alkoxy containing from 1 to 6 carbon atoms, alkylcarbonyloxy containing from 1 to 18 carbon atoms or aromatic carbonyloxy, and R7 is alkyl containing from 4 to 20 carbon atoms or a group represented by a following formula; wherein R8 is alkyl containing from 1 to 18 carbon atoms, hydroxy, alkoxy containing from 1 to 18 carbon atoms, alkylcarbonyloxy containing from 1 to 18 carbon atoms, aromatic carbonyloxy or halogen, m is any of 0, 1, 2 or 3, however, each of R8 may be different from the others if m is 2 or more, and X is non-nucleophilic anion residue, and hardening compositions comprising said sulfonium salt-containing compounds. In particular, a hardening composition comprising the sulfonium salt-containing compound represented by the general formula [I] shown above, a sensitizer and a cationic polymerizable compound can harden in a short time under either heating or irradiation of light or the like, and therefore, said hardening composition can be suitably used for coating materials, adhesives, photoresists, etc.

  本发明涉及由以下通式表示的含锍盐化合物； 其中 R1 是含 1 至 18 个碳原子的烷基、羟基、含 1 至 18 个碳原子的烷氧基、含 1 至 18 个碳原子的烷基羰氧基或卤素，n 是 0、1、2 或 3 中的任一个，然而，当 n 为 2 或更多时，每个 R1 可与其它的不同，R2 是含 1 至 6 个碳原子的烷基、R3 和 R4 各自独立地为氢或含 1 至 6 个碳原子的烷基，R5 和 R6 各自独立地为氢、含 1 至 6 个碳原子的烷基、羟基、含 1 至 6 个碳原子的烷氧基、含 1 至 18 个碳原子的烷基羰氧基或芳香族羰氧基，以及 R7 为含 4 至 20 个碳原子的烷基或下式所代表的基团； 其中 R8 是含 1 至 18 个碳原子的烷基、羟基、含 1 至 18 个碳原子的烷氧基、含 1 至 18 个碳原子的烷基羰氧基、芳香族羰氧基或卤素，m 是 0、1、2 或 3 中的任一个，但是，如果 m 是 2 或更多，则每个 R8 可与其它的不同，X 是非亲核阴离子残基，以及包含所述含锍盐化合物的硬化组合物。 特别是，由上述通式[I]表示的含锍盐化合物、敏化剂和阳离子可聚合化合物组成的硬化组合物在加热或光照射等条件下可在短时间内硬化，因此，所述硬化组合物可适用于涂层材料、粘合剂、光刻胶等。
• COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2599814A1

  公开（公告）日：2013-06-05

  The object is to provide a compound having high dissolvability in a safe solvent and high sensitivity, and also capable of obtaining a good resist pattern shape, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition. The solving means are a compound (B) obtained by reaction between a polyphenol based cyclic compound (A) and a compound (C) having a particular structure, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition.

  本发明的目的是提供一种在安全溶剂中具有高溶解性和高灵敏度并能获得良好抗蚀剂图案形状的化合物、一种含有该化合物的辐射敏感组合物以及一种使用该组合物的抗蚀剂图案形成方法。 解决方法是由基于多酚的环状化合物（A）和具有特定结构的化合物（C）反应得到的化合物（B），含有该化合物的辐射敏感性组合物，以及使用该组合物的抗蚀剂图案形成方法。