triphenylsulfonium 1,1,3,3,3-pentafluoro-2-(3-methacryloyloxy-adamantane-1-carbonyloxy)-propane-1-sulfonate | 1213754-78-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: triphenylsulfonium 1,1,3,3,3-pentafluoro-2-(3-methacryloyloxy-adamantane-1-carbonyloxy)-propane-1-sulfonate
• 英文别名: Triphenylsulfonium 1,1,3,3,3-pentafluoro-2-(3-methacryloyloxy-adamantane-1-carbonyloxy)-propane-1-sulfonate；1,1,3,3,3-pentafluoro-2-[3-(2-methylprop-2-enoyloxy)adamantane-1-carbonyl]oxypropane-1-sulfonate;triphenylsulfanium
• CAS: 1213754-78-9
• 化学式: C₁₈H₁₅S*C₁₈H₂₀F₅O₇S
• 分子量: 738.794
• InChiKey: WGJCZDZZMRHZRA-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  7.84
• 重原子数：
  50
• 可旋转键数：
  10
• 环数：
  7.0
• sp3杂化的碳原子比例：
  0.39
• 拓扑面积：
  119
• 氢给体数：
  0
• 氢受体数：
  12

反应信息

• 作为产物：
  描述：

  triphenylsulfonium 1,1,3,3,3-pentafluoro-2-hydroxypropanesulfonate 、 草酰氯 、 1-羧基-3-甲基丙烯酰氧基金刚烷 、 4-甲基-2-戊酮 在 盐酸 、 三乙胺 作用下， 以 二氯甲烷 、 异丙醚 、 甲苯 为溶剂， 以92%的产率得到triphenylsulfonium 1,1,3,3,3-pentafluoro-2-(3-methacryloyloxy-adamantane-1-carbonyloxy)-propane-1-sulfonate
  参考文献：
  名称：

  POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

  摘要：

  提供具有式（1）的可聚合含阴离子的亚砜盐，其中R1为H、F、甲基或三氟甲基，R2、R3和R4为C1-C10烷基、烯基或氧代烷基或C6-C18芳基、芳基烷基或芳氧代烷基，或R2、R3和R4中的两个可以结合在一起形成与S的环，A为C1-C10有机基团，n为0或1。该亚砜盐在暴露于高能辐射时生成非常强的磺酸。还提供了包含从该亚砜盐衍生的聚合物的抗蚀组合物。

  公开号：

  US20100055608A1

文献信息

• RESIST COMPOSITION, PATTERNING PROCESS, MONOMER, AND COPOLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20130309606A1

  公开（公告）日：2013-11-21

  A polymer is obtained from copolymerization of a recurring unit having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and a recurring unit having formula (1) wherein R 1 is methyl, ethyl, propyl, methoxy, ethoxy or propoxy, R 2 is H or CH 3 , and m is 1 to 4. The polymer is used as a base resin to formulate a resist composition, which is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure.

  一种聚合物是通过共聚反应获得的，其中具有羧酸和/或酚羟基的重复单元被取代为酸易裂解基团，而具有公式（1）的重复单元的R1为甲基，乙基，丙基，甲氧基，乙氧基或丙氧基，R2为H或CH3，m为1到4。该聚合物用作基础树脂来制备抗蚀剂组合物，该组合物在曝光前后的碱溶解速率对比、酸扩散控制、分辨率以及曝光后图案的轮廓和边缘粗糙度方面得到改善。
• Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US08057985B2

  公开（公告）日：2011-11-15

  A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C20 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

  提供了一种具有公式（1）的可聚合阴离子含硫鎓盐，其中R1为H、F、甲基或三氟甲基，R2、R3和R4为C1-C10烷基、烯基或氧代烷基或C6-C18芳基、芳基烷基或芳基氧代烷基，或者R2、R3和R4中的两个可以结合在一起形成一个环，其中S，A为C1-C20有机基团，n为0或1。该硫鎓盐在高能辐射下产生非常强的磺酸。还提供了一种包含从硫鎓盐衍生的聚合物的抗蚀剂组合物。
• POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20130029269A1

  公开（公告）日：2013-01-31

  A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness. In formula (1), A is —(CR 2 2 ) m —, B is —(CR 5 2 ) n —, R 2 and R 5 are hydrogen or alkyl, m and n are 1 or 2, R 3 is alkyl, alkenyl, alkynyl or aryl, R 6 is alkyl, alkoxy, alkanoyl, alkoxycarbonyl, hydroxyl, nitro, aryl, halogen, or cyano, and p is 0 to 4.

  具有以下化学式（1）的酸敏聚合物，其羧基被酸敏基取代的正性光刻胶组合物，在曝光前后呈现高对比度的碱性溶解速率、高分辨率、良好的图案轮廓和最小的边缘粗糙度。在化学式（1）中，A为—（CR22）m—，B为—（CR52）n—，R2和R5为氢或烷基，m和n为1或2，R3为烷基、烯基、炔基或芳基，R6为烷基、烷氧基、烷酰基、烷氧羰基、羟基、硝基、芳基、卤素或氰基，p为0至4。
• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20120135349A1

  公开（公告）日：2012-05-31

  A polymer obtained from copolymerization of a recurring unit having a carboxyl group and/or phenolic hydroxyl group substituted with an acid labile group with a methacrylate having a phenolic hydroxyl-bearing pyridine is useful as a base resin in a positive resist composition. The resist composition comprising the polymer is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure.
• US8057985B2
  申请人：——

  公开号：US8057985B2

  公开（公告）日：2011-11-15