Tris[(3-ethyloxetan-3-yl)methyl] benzene-1,3,5-tricarboxylate | 874108-45-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Tris[(3-ethyloxetan-3-yl)methyl] benzene-1,3,5-tricarboxylate
• CAS: 874108-45-9
• 化学式: C₂₇H₃₆O₉
• 分子量: 504.577
• InChiKey: LDHWSNYSYAPQKW-UHFFFAOYSA-N

物化性质

• 沸点：
  595.7±30.0 °C(Predicted)
• 密度：
  1.186±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  36
• 可旋转键数：
  15
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  107
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  3-乙基-3-氧杂丁环甲醇 、 1,3,5-苯三甲酰氯 在 4-二甲氨基吡啶 、 三乙胺 作用下， 以 二氯甲烷 为溶剂， 反应 24.0h， 生成 Tris[(3-ethyloxetan-3-yl)methyl] benzene-1,3,5-tricarboxylate
  参考文献：
  名称：

  Compositions containing oxetane compounds for use in semiconductor packaging

  摘要：

  公开号：

  EP1621534B1

文献信息

• [EN] CATIONICALLY CURABLE COMPOSITIONS WITH LATENT REDUCING AGENT DEMONSTRATING LOW CURE TEMPERATURE<br/>[FR] COMPOSITIONS DURCISSABLES CATIONIQUEMENT AVEC UN AGENT DE RÉDUCTION LATENT PRÉSENTANT UNE BASSE TEMPÉRATURE DE DURCISSEMENT
  申请人：HENKEL IP & HOLDING GMBH

  公开号：WO2020006159A1

  公开（公告）日：2020-01-02

  Cationically curable compositions with latent reducing agents that demonstrate low cure temperature and improved work life are provided.

  提供了具有潜在还原剂的阳离子可固化组合物，表现出低固化温度和改善的工作寿命。
• OXETANE-CONTAINING COMPOUNDS AND COMPOSITIONS THEREOF
  申请人：HENKEL IP & HOLDING GMBH

  公开号：US20140209951A1

  公开（公告）日：2014-07-31

  Oxetane-containing compounds, and compositions of oxetane-containing compounds together with carboxylic acids, latent carboxylic acids, and/or compounds having carboxylic acid and latent carboxylic acid functionality are provided. The oxetane-containing compounds and compositions thereof are useful as adhesives, sealants and encapsulants, particularly for components, and in the assembly, of LED devices.

  提供含有氧杂环丙烷化合物、含有羧酸、潜隐羧酸和/或具有羧酸和潜隐羧酸功能的化合物的组合物。这些含氧杂环丙烷化合物及其组成物在LED器件的组件和组装中特别有用，可用作粘合剂、密封剂和封装剂。
• NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD USING THE SAME
  申请人：Hoshino Wataru

  公开号：US20100203445A1

  公开（公告）日：2010-08-12

  An object of the present invention is to solve the technical task of enhancing the performance in micro-photofabrication using far ultraviolet light, particularly ArF excimer laser at a wavelength of 193 nm, and more specifically, provide a negative resist composition hardly allowing occurrence of pattern collapse and exhibiting good resolution even in the formation of a fine pattern, and a resist pattern forming method using the composition, which are a negative resist composition comprising (A) an alkali-soluble resin, (B) a compound that contains a low molecular compound having a molecular weight of 2,000 or less and having an oxetane structure, and (C) a cationic photopolymerization initiator, and a resist pattern forming method using the composition.
• SELECTIVE COATING OF EXPOSED COPPER ON SILVER-PLATED COPPER
  申请人：HENKEL IP & HOLDING GMBH

  公开号：US20140295200A1

  公开（公告）日：2014-10-02

  Silver-plated copper particles in which any exposed copper not plated with silver are coated with a polymer or with a chelating compound capable of preventing oxidation of the exposed copper. A method for preventing oxidation of any exposed copper on silver-plated copper particles and for improving the conductivity of silver-plated copper particles comprises coating a polymer or a copper-chelating compound onto the exposed copper on the silver-plated copper particles.
• US20140264165A1
  申请人：——

  公开号：US20140264165A1

  公开（公告）日：2014-09-18