PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
申请人:Wada Kenji
公开号:US20100233617A1
公开(公告)日:2010-09-16
A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation:
Z-A-X—B—R (I)
wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.
一种感光组合物包括:(A)含有与下式(I)所表示的化合物对应的重复单元的树脂;该树脂能够在受到光敏射线或辐射照射后产生酸基团:Z-A-X—B—R (I)其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团;A代表一个烷基基团;X代表一个单键或含杂原子的二价连接基团;B代表一个单键、一个氧原子或—N(Rx)-;Rx代表一个氢原子或一个一价有机基团;R代表一个通过Y取代的一价有机基团;当B代表—N(Rx)-时,R和Rx可以结合在一起形成一个环;Y代表一个可聚合的基团。