There is provided a photosensitive composition which possesses excellent storage stability and can yield an interlayer insulation film with an improved film thickness limit. The photosensitive composition is characterized by comprising: a modified polysilsesquiazane having a weight average molecular weight of 500 to 200,000 comprising basic constitutional units represented by formula —[SiR
1
(NR
2
)
1.5
]— wherein R
1
's each independently represent an alkyl group having 1 to 3 carbon atoms or a substituted or unsubstituted phenyl group; R
2
's each independently represent hydrogen, an alkyl group having 1 to 3 carbon atoms, or a substituted or unsubstituted phenyl group, up to 50% by mole of the basic constitutional units having been replaced by a linking group other than the silazane bond; and a photoacid generating agent.
本发明提供了一种光敏组合物,该组合物具有优异的储存稳定性,并能生成具有改进的膜厚度极限的层间绝缘膜。该光敏组合物的特征在于:包含由式-[SiR]表示的基本构型单元的改性聚
硅氧烷,其重量平均分子量为 500 至 200,000
1
(NR
2
)
1.5
其中 R
1
各自独立地代表具有 1 至 3 个碳原子的烷基或取代或未取代的苯基;R
2
各自独立地代表氢、具有 1 至 3 个碳原子的烷基或取代或未取代的苯基,最多 50%(摩尔)的基本结构单元被
硅烷键以外的连接基团取代;以及一种光酸生成剂。