申请人:SCHERING CORPORATION
公开号:EP0058317A1
公开(公告)日:1982-08-25
in which R1 is hydrogen, lower alkyl, acylamino,
wherein R4 is hydrogen, lower alkyl, aryl or heteroaryl, R5 is hydrogen or an hydroxy protecting group, and R8 is halogen, , -SR9 (wherein R9 is lower alkyl, hydrogen or an -S protecting group), or the group
in which one of R10 and R11 is an -N protecting group and the other is chosen from hydrogen, lower alkyl, aryl, aralkyl and acyl, or R10 and R11 are independently chosen from hydrogen, lower alkyl, aralkyl, aryl and acyl with the proviso that when one is hydrogen the other is acyl,
R2 is lower alkyl, aryl, aralkyl, aminoalkyl, N-protected amino alkyl, hydroxyalkyl, O-protected hydroxyalkyl, thioalkyl, thioaryl, thioheteroaryl, an optionally esterfied a-amino acid residue, an optionally esterfied a-(N protected) amino acid residue or an optionally esterfied alkylcarboxy group;
R3 is nitrile, tetrazolyl, or -COOR6 wherein R6 is hydrogen, the radical C(Hal)3 -Alk in which Hal is halogen and Alk represents an alkylene radical, lower alkyl, aryl, an allylic group, a metabolisable ester group, or a carboxy protecting group;
X and Z are independently sulfur, oxygen, the radical =NR7 in which R7 is hydrogen, acyl, lower alkyl; aryl, or an N-protecting group, or -(CH2)n- in which n is 1 or 2; subject to the following provisos:
(i) Z and X cannot simultaneously be(̵CH2)̵n in which n is 1 or 2;
(ii) when X is S, Z is O or =NR7;
(iii) when X is O, Z is O, S or =NR7;
(iv) when X is -CH2-, Z is =NR7; except that when R7 is H or lower alkyl and R2 is lower alkyl then R1 cannot be acylamino;
(v) when X is (̵CH2)̵2, Z is =NR7;
and the pharmaceutically acceptable salts. Compounds of formula 1 are antibacterial agents which can be incorporated into pharmaceutical compositions or used as intermediates in the preparation of such agents.
其中 R1 是氢、低级烷基、酰氨基、
其中 R4 是氢、低级烷基、芳基或杂芳基,R5 是氢或羟基保护基团,R8 是卤素、-SR9(其中 R9 是低级烷基、氢或-S 保护基团),或基团
其中 R10 和 R11 中的一个是-N 保护基团,另一个选自氢、低级烷基、芳基、烷基和酰基,或 R10 和 R11 独立选自氢、低级烷基、烷基、芳基和酰基,但其中一个为氢时,另一个为酰基、
R2 是低级烷基、芳基、芳烷基、氨基烷基、N 保护氨基烷基、羟基烷基、O 保护羟基烷基、硫代烷基、硫代芳基、硫代杂芳基、任选酯化的 a-氨基酸残基、任选酯化的 a-(N 保护)氨基酸残基或任选酯化的烷基羧基;
R3 是腈、四唑基或-COOR6,其中 R6 是氢、自由基 C(Hal)3 -Alk (其中 Hal 是卤素,Alk 代表亚烷基、低级烷基、芳基、烯丙基、可代谢酯基或羧基保护基);
X 和 Z 独立地是硫、氧、自由基 =NR7(其中 R7 是氢、酰基、低级烷基、芳基或 N 保护基团)或-(CH2)n-(其中 n 是 1 或 2);但书如下:
(i) Z 和 X 不能同时为(̵CH2)̵n,其中 n 为 1 或 2;
(ii) 当 X 为 S 时,Z 为 O 或 =NR7
(iii) 当 X 为 O 时,Z 为 O、S 或 =NR7
(iv) 当 X 为-CH2-时,Z 为 =NR7;但当 R7 为 H 或低级烷基且 R2 为低级烷基时,R1 不能为酰氨基;
(v) 当 X 为 (̵CH2)̵2 时,Z 为 =NR7;
以及药学上可接受的盐类。式 1 的化合物是抗菌剂,可掺入药物组合物中或用作制备此类药物的中间体。