Hydroxyphenyl methacrylate | 29925-70-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚酯
• 英文名称: Hydroxyphenyl methacrylate
• 英文别名: (2-hydroxyphenyl) 2-methylprop-2-enoate
• CAS: 29925-70-0
• 化学式: C₁₀H₁₀O₃
• 分子量: 178.18
• InChiKey: HZBSQYSUONRRMW-UHFFFAOYSA-N

物化性质

• 沸点：
  295.1±19.0 °C(Predicted)
• 密度：
  1.161±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  邻苯二酚 、 甲基丙烯酰氯 、 sodium hydroxide 以42%的产率得到
  参考文献：
  名称：

  KORSHUNOV, M. A.;KUZOVLEVA, R. G.;KARTASHOVA, N. N.;RODIONOVA, N. M., OSNOV. ORGAN. SINTEZ I NEFTEXIMIYA, YAROSLAVL, 1983, N 19, 60-64

  摘要：

  DOI：

文献信息

• RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170115566A1

  公开（公告）日：2017-04-27

  A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

  一种抗蚀组合物包括基树脂，其中包含含酸敏感基团的重复单元，最好包含含酸发生剂的重复单元，以及与烷基、烯基、炔基或芳基结合的α-氟磺酸的钠、镁、钾、钙、铷、锶、钇、铯、钡或铈盐，表现出高分辨率和灵敏度，并在曝光和显影后形成具有最小LWR的满意轮廓图案。
• [EN] SURFACE PRIMER COMPOSITIONS AND METHODS OF USE<br/>[FR] COMPOSITIONS DE COUCHE PRIMAIRE DE SURFACE ET PROCÉDÉ D'UTILISATION
  申请人：ACATECHOL INC

  公开号：WO2017132463A1

  公开（公告）日：2017-08-03

  In one embodiment, the present application discloses a surface binding compound of the Formula I or Formula II: wherein the variables EG, EG1, SP1, SP2, SP3, Ar and BG are as defined herein. In another embodiment, the application discloses a method for forming a coating on a surface of a substrate using the surface binding compound of the Formula I or Formula II.

  在一个实施例中，本申请公开了一种Formula I或Formula II的表面结合化合物，其中变量EG、EG1、SP1、SP2、SP3、Ar和BG的定义如本文所述。在另一个实施例中，该申请公开了一种利用Formula I或Formula II的表面结合化合物在基板表面形成涂层的方法。
• MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20110294070A1

  公开（公告）日：2011-12-01

  A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.

  一种聚合物是由一种具有酸敏感基团的羟基苯甲酸甲酯单体合成得到的。该聚合物作为基础树脂的正性光阻组合物具有极高的曝光前后碱溶解速率对比度、高分辨率、曝光后图案的良好轮廓和极小的线边粗糙度、缓慢的酸扩散速率和良好的蚀刻抗性。
• [EN] HYDROGEN-BONDING COMPOUNDS, COMPOSITIONS COMPRISING THE SAME, AND METHODS OF PREPARING AND USING THE SAME<br/>[FR] COMPOSÉS À LIAISON HYDROGÈNE, COMPOSITION LES COMPRENANT ET PROCÉDÉS DE PRÉPARATION ET D'UTILISATION ASSOCIÉS
  申请人：UNIV WAKE FOREST HEALTH SCIENCES

  公开号：WO2018081425A1

  公开（公告）日：2018-05-03

  Described herein are compounds having a hydrogen-bonding group and optionally a functional group for binding (e.g., covalently binding) the compound to another compound (e.g., hyaluronic acid and/or gelatin). A compound of the present invention may have a structure represented by and/or comprising Formula I, Formula II, Formula III, Formula IV, Formula IV', Formula V, Formula V', Formula VI, Formula VII, and/or Formula VIII as described herein. Compositions including compounds of the present invention along with methods of preparing and using the same are also described herein.

  本文描述了具有氢键结合基团和可选择的功能基团的化合物，用于将该化合物与另一化合物（例如透明质酸和/或明胶）结合（例如共价结合）。本发明的化合物可以具有如下公式I、公式II、公式III、公式IV、公式IV'、公式V、公式V'、公式VI、公式VII和/或公式VIII所示的结构。本文还描述了包括本发明化合物的组合物以及制备和使用这些组合物的方法。
• MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170008982A1

  公开（公告）日：2017-01-12

  A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.

  一种聚合物，包含由可聚合单体衍生的重复单元，该单体具有两种羟基苯甲酸甲酯结构，羟基上取代有酸不稳定基团，作为正性光刻胶组成中的基础树脂，尤其是化学放大正性光刻胶组成中。该光刻胶组成形成一种光刻胶膜，通过光刻技术加工成具有高分辨率、最小边缘粗糙度和蚀刻抗性的良好轮廓图案。