(Methylsulfonyl)methyl p-Tolyl Sulfone | 64399-25-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (Methylsulfonyl)methyl p-Tolyl Sulfone
• 英文别名: methanesulfonyl-(toluene-4-sulfonyl)-methane；Methansulfonyl-(toluol-4-sulfonyl)-methan；Methylsulfon-p-tolylsulfon-methan；Benzene, 1-methyl-4-[[(methylsulfonyl)methyl]sulfonyl]-；1-methyl-4-(methylsulfonylmethylsulfonyl)benzene
• CAS: 64399-25-3
• 化学式: C₉H₁₂O₄S₂
• 分子量: 248.324
• InChiKey: NHAPGXMXFCIWQP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  85
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  (Methylsulfonyl)methyl p-Tolyl Sulfone 在 氢氧化钾 作用下， 以 二氯甲烷 为溶剂， 反应 24.75h， 生成 2-methyl-3-phenyl-1-(p-tolylsulphonyl)indene
  参考文献：
  名称：

  苯基碘化双（芳基磺酰基）甲基化物对烯烃和炔烃的反应性：9-苯基磺酰基-1,2,3,4,4a，9a-六氢-1,4-甲基芴的晶体结构

  摘要：

  苯基碘鎓双（芳基磺酰基）甲基化物与烯烃的热或光化学反应通常会导致宝石-（芳基磺酰基）环丙烷。然而，降冰片烯和反式-二苯乙烯提供了1-（苯基磺酰基）茚满衍生物。标题化合物的晶体结构中{ - [R = 0.038 3层468米独特观察到的反射[我/σ（我）3.0]}证实了与降冰片烯的产物的身份。二芳基乙炔生成1-（芳基磺酰基）茚。滑移物的热分解涉及新的重排，形成芳基芳硫代磺酸盐。

  DOI：

  10.1039/p19880002839
• 作为产物：
  描述：

  甲巯基甲基对甲苯砜 在 双氧水 、 溶剂黄146 作用下， 生成 (Methylsulfonyl)methyl p-Tolyl Sulfone
  参考文献：
  名称：

  246.含硫原子的基团的迁移

  摘要：

  DOI：

  10.1039/jr9320001819

文献信息

• Radiation sensitive composition
  申请人：Clariant International Ltd.

  公开号：EP0838727A1

  公开（公告）日：1998-04-29

  A radiation sensitive composition containing resist materials such as quinonediazido photo active compound and alkali soluble resin, and a mixed solvent comprising (A) 1 to 25% by weight of propylene glycol derivatives as represented by the formula:         R1-O-CH2CH(CH3)-O-R2    wherein R1 and R2 are hydrogen atom, alkyl group having 2 to 5 carbons and acetyl group, and total number of carbons in R1 and R2 is less than 8, both the R1 and R2 are not hydrogen atom at the same time, and (B)75 to 99% by weight of at least one kind of solvent selected from propylene glycol monomethyl ether acetate and ethyl lactate. The radiation sensitive composition is used for the manufacturing of semiconductor device and liquid crystal display element. The solvent is safe to human body and the amount of residual solvent in the resist film is small.

  一种辐射敏感性组合物，含有抗蚀剂材料（如醌噻嗪类光活性化合物和碱溶性树脂）和混合溶剂，混合溶剂包括（A）1-25%（按重量计）的丙二醇衍生物，如式所示： R1-o-CH2CH(CH3)-O-R2 其中 R1 和 R2 分别为氢原子、具有 2 至 5 个碳原子的烷基和乙酰基，且 R1 和 R2 中的碳原子总数小于 8，R1 和 R2 不同时为氢原子；以及 (B) 75% 至 99% （按重量计）的至少一种溶剂，选自丙二醇单甲醚醋酸酯和乳酸乙酯。辐射敏感组合物用于制造半导体器件和液晶显示元件。溶剂对人体安全，抗蚀剂薄膜中的残留溶剂量很少。
• RADIATION-SENSITIVE RESIST COMPOSITION WITH HIGH HEAT RESISTANCE
  申请人：Clariant International Ltd.

  公开号：EP0922998A1

  公开（公告）日：1999-06-16

  A radiation sensitive resist composition with high sensitivity, capable of forming a highly heat-resistant resist pattern. The radiation-sensitive resist composition contains, together with a resist material, a polymer which is obtained by reacting (a) a xylylene compound, (b) salicylic acid and (c) 9,9'-bis(hydroxyphenyl)fluorene derivatives or diol compounds of 3,3,3',3'-tetramethyl-2,3,2',3'-tetrahydro-(1,1')-spirobiindene, and which has a weight average molecular weight of 1,000 to 5,000 and Tg of 100 to 150 °C . Examples of (c) include 9,9'-bis(4-hydroxyphenyl)fluorene and 3,3,3',3'-tetramathyl-2,3,2',3'-tetrahydro-(1,1')-spirobiindene-6,6'-diol. As the resist material, any of positive- and negative-working resists may be used, with that comprising an alkali-soluble resin and a quinonediazide photo-sensitizer being preferably used.

  一种具有高灵敏度的辐射敏感抗蚀剂组合物，能够形成高度耐热的抗蚀图案。辐照敏感抗蚀剂组合物与抗蚀剂材料一起含有一种聚合物，这种聚合物是通过(a)二甲苯化合物、(b)水杨酸和(c)9,9'-双（羟基苯基）芴衍生物或 3,3,3',3'-四甲基-2,3,2',3'-四氢-(1,1')-螺双茚的二元醇化合物反应得到的，其重量平均分子量为 1,000 至 5,000，Tg 为 100 至 150 °C。(c)的例子包括 9,9'-双（4-羟基苯基）芴和 3,3,3',3'-四甲基-2,3,2',3'-四氢-(1,1')-螺生物茚-6,6'-二醇。作为抗蚀剂材料，可使用任何正作和负作抗蚀剂，最好使用由碱溶性树脂和醌噻嗪类光敏剂组成的抗蚀剂。
• NOVEL PROCESS FOR PREPARING RESISTS
  申请人：Clariant International Ltd.

  公开号：EP0942329A1

  公开（公告）日：1999-09-15

  A resist composition is prepared by reacting an alkali-soluble polymer having a phenolic hydroxyl or carboxyl groups with a vinyl ether compound in an aprotic solvent, such as propylene glycol monomethyl ether acetate, in the presence of an acid catalyst, suspending the reaction by the addition of a base, and directly adding a photoacid generator to the reaction solution. When a dialkyl dicarbonate is used in stead of the vinyl ether compound, a resist composition is prepared by carrying out the reaction in the presence of a basic catalyst and adding a photoacid generator directly to the reaction. Thus resist compositions can be prepared without isolating or purifying an alkali-soluble polymer which has been substituted by a catalytic reaction.

  在酸催化剂存在下，将具有酚羟基或羧基的碱溶性聚合物与乙烯基醚化合物在非沸腾溶剂（如丙二醇单甲醚醋酸酯）中反应，通过添加碱使反应暂停，并直接向反应溶液中添加光酸发生器，从而制备抗蚀剂组合物。当使用二烷基二碳酸酯代替乙烯基醚化合物时，在碱性催化剂存在下进行反应，并在反应中直接加入光酸发生器，即可制备抗蚀剂组合物。因此，在制备抗蚀剂组合物时，无需分离或提纯已被催化反应取代的碱溶性聚合物。
• HIGH-PURITY 1,3-PROPANEDIOL DERIVATIVE SOLVENT, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF
  申请人：DAICEL CHEMICAL INDUSTRIES, Ltd.

  公开号：EP1085003A1

  公开（公告）日：2001-03-21

  The present invention No. I is to obtain a high purity 3-alkoxy-1-propanol having the content of alcoholic impurities of not more than 0.3% by weight by allowing to react acrolein with a linear or branched alcohol having a carbon number of 1-4 using acrolein having the content of propionaldehyde of not more than 1% by weight as a raw material, a 3-alkoxy-1-propanol is produced by a hydrogenation reaction using hydrogen of a reaction mass under the presence of a catalyst, followed by recovering through a distillation of the 3-alkoxy-1-propanol having the content of alcoholic impurities of not more than 0.3% by weight from a crude solution in the hydrogenation reaction. The present invention No. II is a cleaning agent for a lithography which is a solvent (a) alone which includes a 1,3-propanediol alkylether, a 1,3-propanediol alkylether acetate, or a mixture thereof and, further, in which there are employed together the alcohols (b) having a carbon number of 1-4 and propylene glycol methylether acetate. The present invention No. III is a rinsing liquid for lithography which comprises a homogeneous solution containing the solvent (a) and water. The present invention No. IV is to employ the solvent (a) as a solvent for a resist composition, and it is a resist composition composed of the solvent for a resist composition and a component for a resist. The present invention No. V is composed of the solvent (a), and a modified copolymer in which an epoxy group-contained unsaturated compound having an aliphatic structure is added to carboxylic groups in a copolymer of a copolymerizable unsaturated carboxylic acid with an unsaturated compound other than the unsaturated carboxylic acid.

  本发明第 I 号是以丙醛含量不超过 1%（重量百分比）的丙烯醛为原料，使丙烯醛与碳原子数为 1-4 的直链或支链醇反应，得到酒精杂质含量不超过 0.3%（重量百分比）的高纯度 3-烷氧基-1-丙醇。以丙醛含量不超过 1%（按重量计）的丙烯醛为原料，使丙烯醛与碳原子数为 1-4 的直链或支链醇反应，在催化剂存在下利用反应物的氢进行氢化反应生成 3-烷氧基-1-丙醇，然后通过蒸馏从氢化反应的粗溶液中回收酒精杂质含量不超过 0.3%（按重量计）的 3-烷氧基-1-丙醇。 本发明 II 是一种用于平版印刷的清洗剂，它是一种单独的溶剂（a），其中包括 1，3-丙二醇烷基醚、1，3-丙二醇烷基醚乙酸酯或它们的混合物，此外，其中还同时使用了碳原子数为 1-4 的醇类（b）和丙二醇甲醚乙酸酯。 本发明 III 是一种用于光刻的漂洗液，它由含有溶剂（a）和水的均质溶液组成。 本发明 IV 是将溶剂（a）用作抗蚀剂组合物的溶剂，它是由抗蚀剂组合物溶剂和抗蚀剂组分组成的抗蚀剂组合物。 本发明 V 由溶剂（a）和一种改性共聚物组成，其中在可共聚的不饱和羧酸与不饱和羧酸以外的不饱和化合物的共聚物中的羧基上添加了具有脂肪族结构的含环氧基团的不饱和化合物。
• Novel process for preparing resists
  申请人：——

  公开号：US20010024765A1

  公开（公告）日：2001-09-27

  A resist composition is prepared by reacting an alkali-soluble polymer having a phenolic hydroxyl or carboxyl groups with a vinyl ether compound in an aprotic solvent, such as propylene glycol monomethyl ether acetate, in the presence of an acid catalyst, suspending the reaction by the addition of a base, and directly adding a photoacid generator to the reaction solution. When a dialkyl dicarbonate is used in stead of the vinyl ether compound, a resist composition is prepared by carrying out the reaction in the presence of a basic catalyst and adding a photoacid generator directly to the reaction. Thus resist compositions can be prepared without isolating or purifying an alkali-soluble polymer which has been substituted by a catalytic reaction.

  在酸催化剂存在下，将具有酚羟基或羧基的碱溶性聚合物与乙烯基醚化合物在非沸腾溶剂（如丙二醇单甲醚醋酸酯）中反应，通过添加碱使反应暂停，并直接向反应溶液中添加光酸发生器，从而制备抗蚀剂组合物。当使用二烷基二碳酸酯代替乙烯基醚化合物时，在碱性催化剂存在下进行反应，并在反应中直接加入光酸发生器，即可制备抗蚀剂组合物。因此，在制备抗蚀剂组合物时，无需分离或提纯已被催化反应取代的碱溶性聚合物。