2-羟基二癸二酸 | 127451-11-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 2-羟基二癸二酸
• 中文别名: 3-异丙基-2-甲基苯甲醛
• 英文名称: 2-Methyl-3-(propan-2-yl)benzaldehyde
• 英文别名: 2-methyl-3-propan-2-ylbenzaldehyde
• CAS: 127451-11-0
• 化学式: C₁₁H₁₄O
• 分子量: 162.23
• InChiKey: ZOJKUHSSLKZYIO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• THERAPEUTIC COMPOUNDS
  申请人：Booth Raymond G.

  公开号：US20120149693A1

  公开（公告）日：2012-06-14

  The invention relates to protein binding interacting/binding compounds and methods of identifying and using them. The invention further relates to pharmaceutical compositions and methods for treating 5-HT2C and/or RSK disorders, including diseases and disorders mediated by GPCRs and/or RSKs.

  本发明涉及蛋白质结合相互作用/结合化合物及其鉴定和使用方法。本发明还涉及制药组合物和治疗5-HT2C和/或RSK障碍的方法，包括由GPCR和/或RSK介导的疾病和障碍。
• COMPOUND, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
  申请人：Echigo Masatoshi

  公开号：US20130122423A1

  公开（公告）日：2013-05-16

  The object is to provide a compound having high dissolvability in a safe solvent and high sensitivity, and also capable of obtaining a good resist pattern shape, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition. For this purpose, a compound (B) obtained by reaction between a polyphenol based cyclic compound (A) and a compound (C) having a particular structure, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition are provided.

  本发明的目的是提供一种在安全溶剂中具有高溶解度和高灵敏度的化合物，同时还能获得良好的抗蚀图案形状，包含该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。为此，提供了通过多酚基环状化合物（A）和具有特定结构的化合物（C）反应得到的化合物（B），包含该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。
• CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2474565A1

  公开（公告）日：2012-07-11

  A cyclic compound represented by formula (1): wherein L, R1, R', and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

  式 (1) 所代表的环状化合物： 其中 L、R1、R'和 m 如说明书中所定义。式（1）的环状化合物对安全溶剂的溶解度高，灵敏度高，能形成具有良好轮廓的抗蚀图案。因此，该环状化合物可用作辐射敏感组合物的成分。
• COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2599814A1

  公开（公告）日：2013-06-05

  The object is to provide a compound having high dissolvability in a safe solvent and high sensitivity, and also capable of obtaining a good resist pattern shape, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition. The solving means are a compound (B) obtained by reaction between a polyphenol based cyclic compound (A) and a compound (C) having a particular structure, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition.

  本发明的目的是提供一种在安全溶剂中具有高溶解性和高灵敏度并能获得良好抗蚀剂图案形状的化合物、一种含有该化合物的辐射敏感组合物以及一种使用该组合物的抗蚀剂图案形成方法。 解决方法是由基于多酚的环状化合物（A）和具有特定结构的化合物（C）反应得到的化合物（B），含有该化合物的辐射敏感性组合物，以及使用该组合物的抗蚀剂图案形成方法。
• RADIATION-SENSITIVE COMPOSITION
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2080750B1

  公开（公告）日：2020-07-29