3,3'-carbonylbis(5,7-dimethoxycoumarin) | 64267-16-9

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 香豆素及其衍生物
• 英文名称: 3,3'-carbonylbis(5,7-dimethoxycoumarin)
• 英文别名: 5,7-dimethoxy-3-[(5,7-dimethoxy-2-oxochromen-3-yl)carbonyl]chromen-2-one；3,3'-Carbonylbis(5,7-dimethoxy-2H-1-benzopyran-2-one)；3-(5,7-dimethoxy-2-oxochromene-3-carbonyl)-5,7-dimethoxychromen-2-one
• CAS: 64267-16-9
• 化学式: C₂₃H₁₈O₉
• 分子量: 438.391
• InChiKey: XTFHNDSRQORPMK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  32
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.17
• 拓扑面积：
  107
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  4,6-二甲氧基水杨醛 、 1,3-丙酮二羧酸二甲酯 在 哌啶 作用下， 生成 3,3'-carbonylbis(5,7-dimethoxycoumarin)
  参考文献：
  名称：

  酮香豆素：新型三重态敏化剂

  摘要：

  制备了3-酮香豆素的几种衍生物，并显示它们具有有效三重态敏化剂所需的许多光物理标准。这些化合物包括3-芳酰基香豆素（1）和3，3'-羰基双香豆素（2）。1中的芳基是苯基和取代的苯基衍生物或杂环基，例如噻吩基和苯并呋喃基。1和2中香豆素部分上的取代基（如果有）是烷氧基或二烷基氨基。这些化合物的最大吸收在330至450 nm之间，消光系数在10 4至几乎10 5的范围内。，这是对光敏抗蚀剂和光刻中使用的聚合物薄膜进行有效敏化的重要标准。几个导数的单重态-三重态系统间穿越（isc）效率接近统一。但是，在其他情况下，无辐射衰变过程则与isc竞争。衰减过程是在的不对称取代的衍生物特别优势2，但似乎在聚合物基质可以显着抑制。这些化合物的三线态能量的范围从CA。48至60 kcal / mol。这些酮香豆素中的一些显示出磷光光谱，表明存在“冷冻”旋转异构体。

  DOI：

  10.1016/0040-4020(82)85104-1

文献信息

• NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190169211A1

  公开（公告）日：2019-06-06

  The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).

  本发明是基于本文中的情况而作出的。本发明的目的是提供：一种四羧酸二酐，可导致聚酰亚胺，作为感光树脂组合物的基树脂，能够形成细微图案并获得高分辨率，同时不损害优异的特性，如机械强度和粘附性；通过使用该四羧酸二酐获得的聚酰亚胺树脂；以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式（1）所示。
• NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
  申请人：International Business Machines Corporation

  公开号：US20210317270A1

  公开（公告）日：2021-10-14

  Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1): wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X 1 to X 3 represent any of —CO 2 —, —CONR X1 —, —O—, —NR X1 —, —S—, —SO 2 —, —SO 3 — and —SO 2 NR X1 — and may be the same as or different from each other, provided that R X1 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L 1 and L 2 independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.

  提供的是一种可以用作光敏树脂组合物的基树脂的化合物。这种光敏树脂可以形成精细图案，并且可以在不影响机械强度和溶解性的情况下实现高分辨率。该化合物由通式（1）表示：其中Z代表具有2到30个碳原子的线性、支链或环状二价碳氢基团；X1到X3代表任何一种—CO2—、—CONRX1—、—O—、—NRX1—、—S—、—SO2—、—SO3—和—SO2NRX1—中的一种，并且它们可以相同也可以不同，只要RX1是氢原子或具有1到30个碳原子的一价碳氢基团；Ar代表具有2到30个碳原子的二价芳香基团；L1和L2分别代表具有1到30个碳原子的二价碳氢基团；x和y分别独立地为0或1。
• Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator
  申请人：Nippon Kayaku Kabushiki Kaisha

  公开号：US20200392079A1

  公开（公告）日：2020-12-17

  This compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays, is represented by formula (1), where, in formula (1), R 1 , R 2 , R 3 , R 5 and R 6 represent a hydroxy group or an alkoxy group; the R 4 's independently represent an organic group containing a thioether bond; R 7 and R 9 independently represent a hydrogen atom or an alkyl group with 1 to 4 carbons; R 8 represents an alkylene group or an arylene group; and X represents an oxygen atom or a sulfur atom. A photopolymerization initiator can include said novel compound; and a photosensitive resin composition can include said photopolymerization initiator, from which a cured product can be obtained that has high sensitivity and no metal corrosion.

  这种化合物具有优异的溶剂溶解性和与树脂的兼容性，可以通过受到活性能量辐射而高效地产生碱基和自由基。该化合物由公式（1）表示，其中在公式（1）中，R1、R2、R3、R5和R6代表羟基或烷氧基；R4分别表示含硫醚键的有机基团；R7和R9分别代表氢原子或1至4个碳的烷基基团；R8代表烷基或芳基；X代表氧原子或硫原子。一种光聚合引发剂可以包括上述新化合物；一种光敏树脂组合物可以包括上述光聚合引发剂，从中可以得到高灵敏度且无金属腐蚀的固化产物。
• NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR
  申请人：TOKYO UNIVERSITY OF SCIENCE FOUNDATION

  公开号：US20180370908A1

  公开（公告）日：2018-12-27

  The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1): (wherein R 1 to R 6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).

  本发明的目的是提供一种新的化合物，该化合物可以在受到活性能量射线照射时产生碱和自由基；一种包含该新化合物的光聚合引发剂；以及一种含有光聚合引发剂的光敏树脂组合物，该组合物具有高灵敏度和良好的储存稳定性，并且可以形成不具有金属腐蚀性的固化物品。该新化合物由式（1）表示：（其中，R1至R6独立地表示氢原子、羟基、烷氧基、除上述取代基外的有机基团等；X表示从含有环结构的饱和碳氢化合物中去除n个氢原子后的结构残基；n表示1至6的整数）。
• TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20180120702A1

  公开（公告）日：2018-05-03

  The present invention provides a tetracarboxylic acid diester compound represented by the following general formula (1), wherein, X 1 represents a tetravalent organic group, and R 1 represents a group represented by the following general formula (2), wherein, the dotted line represents a bonding, Y 1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, “k” represents 1, 2 or 3, and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound which can lead a polymer of a polyimide precursor capable of using a base resin of a negative photosensitive resin composition which is capable of forming a fine pattern and giving high resolution, a polymer of a polyimide precursor obtained by using the tetracarboxylic acid diester compound and a method for producing the same.

  本发明提供了一种四羧酸二酯化合物，其表示为以下通式（1）：其中，X1表示四价有机基团，R1表示以下通式（2）所表示的基团：其中，虚线表示键合，Y1表示具有k+1价的有机基团，Rs表示含有至少一个硅原子的基团，“k”表示1、2或3，“n”表示0或1。可以提供一种四羧酸二酯化合物，该化合物能够引导聚合物的形成，该聚合物是由使用负光敏树脂组合物的基树脂制成的，该组合物能够形成细微图案并具有高分辨率，使用四羧酸二酯化合物制得的聚酰亚胺前体聚合物以及其制备方法。