1-butoxy-4-(prop-1-en-2-yl)benzene | 59609-24-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1-butoxy-4-(prop-1-en-2-yl)benzene
• 英文别名: 1-Butyloxy-4-isopropenyl-benzol；1-Butoxy-4-prop-1-en-2-ylbenzene
• CAS: 59609-24-4
• 化学式: C₁₃H₁₈O
• 分子量: 190.285
• InChiKey: MYQNOEJFNYZROX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  14
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.38
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  sodium salt of p-isopropenylphenol 、 1-碘丁烷 以58%的产率得到
  参考文献：
  名称：

  ALIEV S. M.; KULIEVA S. A., AZEHRB. KIMJA ZH. , 1975, HO 5, 64-68

  摘要：

  DOI：

文献信息

• Synthesis of 2-Substituted Propenes by Bidentate Phosphine-Assisted Methylenation of Acyl Fluorides and Acyl Chlorides with AlMe₃
  作者：Xiu Wang、Zhenhua Wang、Yuya Asanuma、Yasushi Nishihara

  DOI：10.1021/acs.orglett.9b01059

  日期：2019.5.17

  methylenation of acyl fluorides and acyl chlorides with substituted with aryl, alkenyl, and alkyl groups trimethylaluminum afforded an array of 2-substituted propene derivatives. The addition of a catalytic amount of DPPM increased an efficiency of the reactions. Trimethylaluminum as the methylenation reagent not only eliminates the presynthesis of methylene transfer reagent, but provides an efficient method for

  芳基，烯基和烷基三甲基铝取代的酰氟和酰氯的双膦膦化亚甲基化提供了一系列2取代的丙烯衍生物。催化量的DPPM的添加提高了反应效率。三甲基铝作为亚甲基化试剂，不仅消除了亚甲基转移试剂的预合成，而且为合成一系列2-取代的丙烯提供了一种有效的方法。
• Resin composition, prepreg, resin-added film, resin-added metal foil, metal-clad layered plate, and wiring plate
  申请人：PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

  公开号：US11242425B2

  公开（公告）日：2022-02-08

  A resin composition is provided and contains a compound (A) having at least one group represented by the following Formula (1) in a molecule, a crosslinking type curing agent (B), and an azo compound (C) that has an azo group in a molecule and has no heteroatom other than a nitrogen atom constituting the azo group. In Formula (1), n represents 0 to 10, Z represents an arylene group, and R1 to R3 each independently represent a hydrogen atom or an alkyl group.

  本发明提供了一种树脂组合物，其中包含分子中至少含有一个下式 (1) 所代表基团的化合物 (A)、交联型固化剂 (B) 以及分子中含有偶氮基团且除构成偶氮基团的氮原子外没有杂原子的偶氮化合物 (C)。 式（1）中，n 代表 0 至 10，Z 代表芳烯基，R1 至 R3 各自独立地代表氢原子或烷基。
• PYRROLOTRIAZINE KINASE INHIBITORS
  申请人：Bristol-Myers Squibb Company

  公开号：EP1948664B1

  公开（公告）日：2011-06-08
• Soluble polyfunctional vinyl aromatic polymer and method of producing the same
  申请人：Kawabe Masanao

  公开号：US20070155923A1

  公开（公告）日：2007-07-05

  The present invention relates to a soluble polyfunctional vinylaromatic copolymer improved in heat resistance, resistance to thermal decomposition, solvent solubility, and processability. The soluble polyfunctional vinylaromatic polymer is obtained by cationically polymerizing, at a temperature of 20 to 120° C., one or more monomer ingredients including 20 to 100 mol % divinylaromatic compound (a) in the presence of a donor ingredient, e.g., a quaternary ammonium salt, with the aid of a Lewis acid catalyst and an initiator represented by the following general formula (1) wherein R 1 represents hydrogen or a monovalent C 1-6 hydrocarbon group; R 2 represents an aromatic or aliphatic hydrocarbon group having a valence of p; Z represents halogen or C 1-6 alkoxy or acyloxy; and p is an integer of 1 to 6; provided that when two or more R 1 's and Z's are present per molecule, they may be identical to different from each other.
• SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170154766A1

  公开（公告）日：2017-06-01

  The present invention provides a silicon-containing condensate comprising one or more repeating units selected from a repeating unit shown by the following general formula (A1), a repeating unit shown by the following general formula (A2), and a repeating unit shown by the following general formula (A3), wherein R 1 represents a group shown by the following general formula (A-1) or (A-2); R 2 and R 3 each independently represent the same group as R 1 , a hydrogen atom, or a monovalent organic group having 1 to 30 carbon atoms other than R 1 . There can be provided a silicon-containing condensate to give a composition for forming a silicon-containing resist under layer film which can form a resist under layer film with good adhesiveness to any resist pattern, whether the pattern is formed by negative development or positive development.