t-Butyl-(p-tolyloxy)-acetat | 36304-21-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: t-Butyl-(p-tolyloxy)-acetat
• 英文别名: t-Butyl (p-tolyloxy)acetat；Tert-butyl 2-(4-methylphenoxy)acetate
• CAS: 36304-21-9
• 化学式: C₁₃H₁₈O₃
• mdl: MFCD22575890
• 分子量: 222.284
• InChiKey: JNTSILOEXUZGOR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  16
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.461
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  对甲酚 、 氯乙酸叔丁酯 在 potassium carbonate 作用下， 以 丙酮 为溶剂， 生成 t-Butyl-(p-tolyloxy)-acetat
  参考文献：
  名称：

  GB1176339

  摘要：

  公开号：

文献信息

• THIOXOTHIAZOLIDINE DERIVATIVE HAVING RAS FUNCTION INHIBITORY EFFECT
  申请人：Kataoka Tohru

  公开号：US20140194412A1

  公开（公告）日：2014-07-10

  The present invention provides an anticancer drug having a Ras function inhibitory action. The present invention provides a Ras function inhibitor comprising a compound represented by the formula (I′): wherein each symbol is as defined in the present specification, or a salt thereof.

  本发明提供一种具有Ras功能抑制作用的抗癌药物。 本发明提供一种包括由式(I′)表示的化合物的Ras功能抑制剂： 其中每个符号如本说明书中所定义，或其盐。
• TETRAHYDROCARBOLINE DERIVATIVE
  申请人：ONO PHARMACEUTICAL CO., LTD.

  公开号：US20160031884A1

  公开（公告）日：2016-02-04

  An object of the present invention is to provide a drug having the inhibitory activity on ENPP2 which is a different target from that of the existing drug, as a medicament useful in a urinary excretion disorder patient for whom the existing drug has the insufficient effect. The present invention provides a compound represented by the general formula (I): (wherein definition of each group is as defined in the description) having the ENPP2 inhibitory activity, a salt thereof or a solvate thereof or a prodrug thereof, and an agent for preventing or treating urinary excretion disorder and/or improving symptoms thereof, containing them as an active ingredient.

  本发明的目的是提供一种药物，具有对ENPP2的抑制活性，该活性与现有药物的靶点不同，作为一种药物，可用于存在现有药物效果不足的尿排泄障碍患者。本发明提供了一种由通式（I）表示的化合物：（其中每个基团的定义如描述中所定义），具有ENPP2抑制活性，其盐或溶剂或前药，以及作为活性成分的预防或治疗尿排泄障碍和/或改善其症状的药剂。
• BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1449833A1

  公开（公告）日：2004-08-25

  The present invention relates to a novel bisimide compound useful as an acid generator for a chemically amplified resist composition used in manufacturing of semiconductor element and the like or a raw material for synthesizing heat resistant polymers, an acid generator and a resist composition using said compound and a method for pattern formation using said composition, and further relates to a synthetic n intermediate for a bisimide compound and a bis(N-hydroxy)phthalimide compound useful as an intermediate for a functional compound such as a heat resistant polymer or photosensitive material, and provides a bisimide compound shown by the general formula [1]: (wherein R and A1 are as defined in claim 1.)

  本发明涉及一种新型双酰亚胺化合物，可用作用于制造半导体元件等的化学放大抗蚀剂组合物的酸发生器或合成耐热聚合物的原料，还涉及使用所述化合物的酸发生器和抗蚀剂组合物以及使用所述组合物的图案形成方法、并进一步涉及一种双亚胺化合物的合成 n 中间体和一种双（N-羟基）邻苯二甲酰亚胺化合物，可用作耐热聚合物或感光材料等功能化合物的中间体，并提供了通式[1]所示的双亚胺化合物： (其中 R 和 A1 如权利要求 1 所定义）。
• Sulfonium salt and its manufacturing method
  申请人：Korea Kumho Petrochemical Co. Ltd.

  公开号：EP0972761B1

  公开（公告）日：2001-12-12
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION
  申请人：TAKAHASHI Toshiya

  公开号：US20130045445A1

  公开（公告）日：2013-02-21

  Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) comprising a repeating unit (A) containing a group that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) containing a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and any of compounds (Q) of general formula (1) below.