triphenylsulfonium methoxycarbonyl difluoromethane sulfonate | 479628-17-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: triphenylsulfonium methoxycarbonyl difluoromethane sulfonate
• 英文别名: 1,1-Difluoro-2-methoxy-2-oxoethanesulfonate;triphenylsulfanium
• CAS: 479628-17-6
• 化学式: C₃H₃F₂O₅S*C₁₈H₁₅S
• 分子量: 452.5
• InChiKey: JESLZAVBCIOAPN-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  4.08
• 重原子数：
  30
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  92.9
• 氢给体数：
  0
• 氢受体数：
  7

反应信息

• 作为反应物：
  描述：

  triphenylsulfonium methoxycarbonyl difluoromethane sulfonate 在 盐酸 、 lithium amide 、 水 作用下， 以 甲醇 、 氯仿 为溶剂， 反应 23.5h， 生成 triphenylsulfonium 2-((5-carboxyadamantan-2-yl)oxy)-1,1-difluoro-2-oxoethane-1-sulfonate
  参考文献：
  名称：

  SALT AND PROCESS FOR PRODUCING ACID GENERATOR

  摘要：

  根据您提供的化学公式(I0)，其翻译成中文为： 其中Q1和Q2各自独立代表一个氟原子或一个C1-C6全氟烷基团，L1代表一个二价的C1-C17碳氢化合物基团，在该基团中，一个或多个—CH2—可以被—O—或—CO—所替换，m代表1或2，而Zm+代表m价有机或无机阳离子。

  公开号：

  US20110201823A1
• 作为产物：
  描述：

  difluorosulfonylacetic acid methyl ester sodium salt 、 氯化三苯基硫 以 氯仿 为溶剂， 反应 15.0h， 生成 triphenylsulfonium methoxycarbonyl difluoromethane sulfonate
  参考文献：
  名称：

  JP6079021

  摘要：

  公开号：

文献信息

• PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES
  申请人：FUJIWARA Masaki

  公开号：US20080108846A1

  公开（公告）日：2008-05-08

  A process for producing an alkoxycarbonylfluoroalkanesulfonate represented by the formula [1] is provided. This process includes the steps of (a) reacting a halofluoroalkanoate represented by the formula [2], with a sulfinating agent, thereby obtaining an alkoxycarbonylfluoroalkanesulfinate represented by the formula [3]; and (b) reacting the alkoxycarbonylfluoroalkanesulfinate with an oxidizing agent, thereby obtaining the target alkoxycarbonylfluoroalkanesulfonate. Furthermore, it is possible to react the obtained alkoxycarbonylfluoroalkanesulfonate with a monovalent onium salt to conduct a salt exchange, thereby obtaining a alkoxycarbonylfluoroalkanesulfonic acid onium salt represented by the formula [4].

  提供了一种制备由公式[1]表示的烷氧羰基氟代烷磺酸盐的方法。这个过程包括以下步骤：(a)使由公式[2]表示的卤氟代烷酸盐与亚磺化剂反应，从而获得由公式[3]表示的烷氧羰基氟代烷亚磺酸盐；以及(b)使烷氧羰基氟代烷亚磺酸盐与氧化剂反应，从而获得目标烷氧羰基氟代烷磺酸盐。此外，可以将获得的烷氧羰基氟代烷磺酸盐与单价阳离子盐进行反应，进行盐交换，从而获得由公式[4]表示的烷氧羰基氟代烷磺酸阳离子盐。
• Ammonium Fluoroalkanesulfonates and a Synthesis Method Therefor
  申请人：Nagamori Masashi

  公开号：US20120004447A1

  公开（公告）日：2012-01-05

  An ammonium hydroxyfluoroalkanesulfinate is obtained by using an organic base while sulfinating a bromofluoroalcohol with a sulfinating agent. An ammonium hydroxyfluoroalkanesulfonate is obtained by oxidizing the ammonium hydroxyfluoroalkanesulfinate. An onium fluoroalkanesulfonate is obtained by converting the ammonium hydroxyfluoroalkanesulfonate into an onium salt through esterification. This onium fluoroalkanesulfonate is useful as a photoacid generator in chemically amplified resists and the like.

  一种氢氧基氟烷磺酸铵是通过在磺化剂的作用下使用有机碱对溴氟醇进行磺化而获得的。将氢氧基氟烷磺酸铵氧化后得到一种氢氧基氟烷磺酸铵盐。通过酯化将氢氧基氟烷磺酸铵转化为一种离子氟烷磺酸盐。这种离子氟烷磺酸盐在化学增感抗蚀剂等中作为光酸发生剂是有用的。
• Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt
  申请人：Jodry Jonathan Joachim

  公开号：US20110015431A1

  公开（公告）日：2011-01-20

  Disclosed is a process for producing 2-bromo-2,2-difluoroethanol, which comprises reducing a bromodifluoroacetic acid derivative represented by the formula [1] by using an ate hydride complex as a reducing agent. 2-Bromo-2,2-difluoroethanol thus produced can be used as the starting material to carry out the esterification step, the sulfination step and the oxidation step in this order, thereby producing a 2-alkylcarbonyloxy-1,1-difluoroethanesulfonic acid salt, wherein A represents a substituted or unsubstituted linear, branched or cyclic alkoxy group having 1 to 20 carbon atoms, a substituted or unsubstituted aryloxy group having 6 to 15 carbon atoms, a heteroaryloxy group having 4 to 15 carbon atoms, or a halogen atom.

  揭示了一种生产2-溴-2,2-二氟乙醇的方法，包括使用醇盐氢化物复合物作为还原剂，通过还原由式[1]表示的溴二氟乙酸衍生物来实现。因此生产的2-溴-2,2-二氟乙醇可用作依次进行酯化步骤、磺化步骤和氧化步骤的起始物质，从而产生2-烷基羰氧基-1,1-二氟乙烷磺酸盐，其中A代表具有1至20个碳原子的取代或未取代的线性、支链或环烷氧基团，具有6至15个碳原子的取代或未取代的芳氧基团，具有4至15个碳原子的杂芳氧基团，或卤素原子。
• Resist composition and patterning process
  申请人：Watanabe Satoshi

  公开号：US20100009299A1

  公开（公告）日：2010-01-14

  The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F 2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.

  本发明涉及一种抗蚀组合物，例如用于在抗蚀物的基板侧边界面上提供优异图案轮廓的化学增感抗蚀组合物，除了在微细加工的光刻工艺中具有更高的分辨率外，特别是在采用KrF激光、ArF激光、F2激光、超短紫外光、电子束、X射线等作为曝光光源的光刻工艺中；以及利用该抗蚀组合物的图案化工艺。本发明提供一种化学增感抗蚀组合物，其包括一种或多种胺化合物或胺氧化合物（除了那些在芳香环的环结构中不含有胺或胺氧原子的氮原子的化合物），至少具有一个羧基，并且没有氢原子共价键结合到氮原子作为碱性中心。
• Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method
  申请人：Central Glass Company, Limited

  公开号：US20130130175A1

  公开（公告）日：2013-05-23

  A sulfonic acid onium salt represented by the following formula (1) useful as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt corresponding to the formula (1): in which R 1 represents a monovalent organic group, and Q + represents a sulfonium cation or iodonium cation.

  以下是用作优良的辐射敏感性酸发生剂的磺酸醋銨盐的化学式（1）。通过使用含有与化学式（1）对应的磺酸醋銨盐的抗蚀组合物，可以形成良好的图案： 其中R1代表一价有机基团，Q+代表磺銨阳离子或碘銨阳离子。