Iodonium, [4-(1,1-dimethylethyl)phenyl]phenyl- | 94590-80-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Iodonium, [4-(1,1-dimethylethyl)phenyl]phenyl-
• 英文别名: (4-tert-butylphenyl)-phenyliodanium
• CAS: 94590-80-4
• 化学式: C16H18I+
• 分子量: 337.22
• InChiKey: RGXLDQDGZYZGEE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.5
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

文献信息

• CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL AND PHOTORESIST COMPOSITION
  申请人：Shibata Mitsuru

  公开号：US20100190107A1

  公开（公告）日：2010-07-29

  A cyclic compound shown by the following formula (I):

  一个由以下公式（I）所示的环状化合物：
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT
  申请人：MATSUDA Yasuhiko

  公开号：US20130065186A1

  公开（公告）日：2013-03-14

  A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R 2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R 1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO 3 or SO 2 . R 2 represents a cyclic hydrocarbon group. R 3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R 1 —X—R 2 —(R 3 ) n (I) —R 31 -G-R 13 (x)

  一种辐射敏感树脂组合物包括酸发生剂，通过放射性射线照射生成有机酸。该有机酸具有环烃基和有机基，包括可被酸或碱裂解以产生极性基团的键。有机酸最好由以下式（I）表示。其中，Z代表有机酸基团。R2代表脂肪二元基，其中R1代表脂肪二元基中的一部分或全部氢原子可选地被氟原子取代。X代表单键，O，OCO，COO，CO，SO3或SO2。R2代表环烃基。R3代表具有以下式（x）所表示的官能团的一价有机基。n为1到3的整数。Z-R1-X-R2-(R3)n（I）-R31-G-R13（x）。
• Latent acids and their use
  申请人：Yamato Hitoshi

  公开号：US20110217654A1

  公开（公告）日：2011-09-08

  The invention pertains to a compound generating an acid of the formula I or II, for instance corresponding sulfonium and iodonium salts, as well as corresponding sulfonyloximes wherein X is CH 2 or CO; Y is O, NR 4 , S, O(CO), O(CO)O, O(CO)NR 4 , OSO 2 , O(CS), or O(CS)NR 4 ; R 1 is for example C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl, C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, interrupted C 2 -C 18 alkyl, interrupted C 3 -C 30 cycloalkyl, interrupted C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, interrupted C 4 -C 30 cycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or heteroaryl, all unsubstituted or are substituted; or R 1 is NR 12 R 13 ; R 2 and R 3 are for example C 3 -C 30 cycloalkylene, C 3 -C 30 cycloalkyl-C 1 -C 18 alkylene, C 1 -C 18 alkylene, C 1 -C 10 haloalkylene, C 2 -C 12 alkenylene, C 4 -C 30 cycloalkenylene, phenylene, naphthylene, anthracylene, phenanthrylene, biphenylene or heteroarylene; all unsubstituted or substituted; R 4 is for example C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl; R 12 and R 13 are for example C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl, Ar, (CO)R 15 , (CO)OR 15 or SO 2 R 15 ; and Ar is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl or heteroaryl, all unsubstituted or substituted.

  本发明涉及一种生成公式I或II的酸的化合物，例如对应的磺鎓盐和碘鎓盐，以及对应的磺酰氧肟，其中X为CH2或CO；Y为O、NR4、S、O（CO）、O（CO）O、O（CO）NR4、OSO2、O（CS）或O（CS）NR4；R1例如为C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基、C3-C30环烷基、C3-C30环烷基-C1-C18烷基、中断的C2-C18烷基、中断的C3-C30环烷基、中断的C3-C30环烷基-C1-C18烷基、中断的C4-C30环烯基、苯基、萘基、蒽基、菲基、苯并二氢呋喃基或杂环基，全部未取代或被取代；或R1为NR12R13；R2和R3例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基、萘基、蒽基、菲基、苯并二氢呋喃基或杂环基，全部未取代或被取代；R4例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基；R12和R13例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基、Ar、（CO）R15、（CO）OR15或SO2R15；Ar为苯基、苯并二氢呋喃基、菲基、萘基、蒽基、苯并蒽基或杂环基，全部未取代或被取代。
• Camphorquinone Derivative Having Acylphosphine Oxide Group, Photopolymerization Catalyst And Photo/Chemical Polymerization Catalyst Containing The Same And Hardenable Composition Contaning The Same
  申请人：Ikemura Kunio

  公开号：US20090105361A1

  公开（公告）日：2009-04-23

  A compound that exhibits excellent color tone stability and physical properties as well as excellent photopolymerization activity over a wide region from near-ultraviolet to visible region, permitting relaxed operation under ambient light, so that wide application can be found in the dental field and photopolymerization industry; and a relevant photopolymerization initiator and hardenable composition. In particular, there is provided a novel camphorquinone derivative having an acylphosphine oxide group [—(C═O)—(P═O)<] in each molecule. Further, there is provided a photopolymerization initiator comprising the camphorquinone derivative having an acrylphosphine oxide group [—(C═O)—(P═O)<] in each molecule as an indispensable component, loaded with at least one member selected from among a polymerization accelerator, a photoacid generator, a photosensitizer and a (bis)acylphosphine oxide, and provided a hardenable composition comprising the initiator. The thus provided photopolymerization initiator and hardenable composition exhibit excellent color tone stability and physical properties as well as excellent photopolymeritzaion activity over an ultraviolet and visible wide wavelength region, permitting relaxed operation under ambient light, so that wide application can be found in the dental field and photopolymerization industry.

  提供了一种化合物，其具有出色的色调稳定性和物理性能，以及在近紫外到可见光区域内具有优异的光聚合活性，使得在环境光线下可以放松操作，因此在牙科领域和光聚合工业中可以找到广泛的应用；以及相关的光聚合引发剂和可硬化组合物。特别地，提供了一种新型的萜烯酮衍生物，其每个分子中都具有一个酰基膦氧化物基团[—(C═O)—(P═O)<]。此外，还提供了一种光聚合引发剂，其中包含具有丙烯酰膦氧化物基团[—(C═O)—(P═O)<]的萜烯酮衍生物作为不可或缺的组分，装载有至少一种从聚合促进剂、光酸发生剂、光敏剂和(双)酰基膦氧化物中选择的成员，并提供了一种包含引发剂的可硬化组合物。因此，所提供的光聚合引发剂和可硬化组合物在紫外和可见光宽波长区域内表现出优异的色调稳定性和物理性能，以及优异的光聚合活性，使得在环境光线下可以放松操作，因此在牙科领域和光聚合工业中可以找到广泛的应用。
• Chemically Amplified Positive Resist Composition and Resist Pattern Forming Process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20180180992A1

  公开（公告）日：2018-06-28

  A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of formula (A) has a high resolution. When the resist composition is processed by lithography, a pattern with minimal LER can be formed.

  一种正性光刻胶组合物，包括一种聚合物，该聚合物适于在酸的作用下分解，以增加其在碱性显影剂中的溶解度，以及一种化学式（A）的磺化物化合物，具有高分辨率。当使用光刻技术处理光刻胶组合物时，可以形成最小LER的图案。