申请人:FUJISAWA PHARMACEUTICAL CO., LTD.
公开号:EP0192210A2
公开(公告)日:1986-08-27
1. A compound of the formula:
wherein R' is lower alkyl, lower alkanoyl, aryl, ar(lower)alkyl or a heterocyclic group, each of which may have suitable substituent(s),
R' is carboxy or protected carboxy,
R' is hydrogen, halogen, hydroxy, lower alkoxy, acyloxy, lower alkylthio, lower alkenyl, lower alkenytthio, lower alkynyl, heterocyclicthio or a heterocyclic group, in which lower alkylthio, lower alkenyl, lower alkenylthio, heterocylic- thio and a heterocyclic group may have suitable substituent-(s),
R4 and R5 are each hydrogen, halogen or arylthio,
A is lower alkylene, and
n is an integer of 0 or 1,
and a pharmaceutically acceptable salt thereof,
processes for preparation thereof and pharmaceutical composition comprising the same.
1.式中的化合物:
其中 R'是低级烷基、低级烷酰基、芳基、芳(低)烷基或杂环基团,每个基团可带有合适的取代基、
R' 是羧基或受保护的羧基、
R'是氢、卤素、羟基、低级烷氧基、酰氧基、低级烷硫基、低级烯基、低级炔基、杂环硫基或杂环基团,其中低级烷硫基、低级烯基、低级炔硫基、杂环硫基和杂环基团可具有合适的取代基、
R4 和 R5 分别为氢、卤素或芳硫基、
A 是低级亚烷基,以及
n 是 0 或 1 的整数、
及其药学上可接受的盐、
其制备工艺和包含这些物质的药物组合物。