The medium dependence of the rates of base cleavage of carbon—silicon and—tin bonds
作者:Colin Eaborn、John R. Jones、Giancarlo Seconi
DOI:10.1016/s0022-328x(00)87198-3
日期:1976.8
Rates of cleavage of Me3MR compounds (M = Si, R = m-ClC6H4CH2, p-NO2C6H4CH2, Ph2CH, 9-fluorenyl, and 2-benzothienyl; M = Sn, R = m-ClC6H4CH2, Ph2CH, 2-benzothienyl) have been measured in Me2SO/MeOH/MeONa, Me2SO/EtOH/EtONa, and Me2SO/H2O/HONMe4 media containing varying amounts of the hydroxylic component. The variations in the slopes of the log krel H plots are consistent with the view that a water
我的裂解率3种MR化合物(M =硅,R =米-ClC 6 ħ 4 CH 2,P-NO 2 C ^ 6 ħ 4 CH 2中,Ph 2 CH,9-芴基,和2-苯并噻吩基; M =的Sn,R =米-ClC 6 ħ 4 CH 2中,Ph 2 CH,2-苯并噻吩基)已经被在我测量2 SO /甲醇/的MeONa中,Me 2 SO /乙醇/ EtONa,和Me 2 SO / H 2 O / HONMe 4含有不同媒体的羟基组分的量。在日志的斜率变化ķ相对ħ地块是与水或醇分子提供为锡化合物的速率决定步骤,其中R =电援助的观点一致米-ClC 6 ħ 4 CH 2和2 -benzothienyl,而对于硅化合物,以及可能用于与R = PH中的锡化合物2 CH,碳负离子被在速率决定步骤中解放出来。