trimethylammonium 4-toluenesulfonate | 2840-23-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: trimethylammonium 4-toluenesulfonate
• 英文别名: trimethylammonium p-toluenesulfonate；toluene-4-sulfonic acid ; compound with trimethylamine；Toluol-4-sulfonsaeure; Verbindung mit Trimethylamin；Toluol-4-sulfonsaeure; Salz des Trimethylamins；trimethylamine tosylate；N,N-dimethylmethanamine;4-methylbenzenesulfonic acid
• CAS: 2840-23-5
• 化学式: C₃H₉N*C₇H₈O₃S
• 分子量: 231.316
• InChiKey: CRSMROBXMKUTAY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.34
• 重原子数：
  15
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  70
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  三甲胺盐酸盐 在 对甲苯磺酸甲酯 作用下， 以 乙腈 为溶剂， 以86%的产率得到trimethylammonium 4-toluenesulfonate
  参考文献：
  名称：

  Kukhar', V. P.; Pasternak, V. I.; Shevchenko, I. V., Journal of Organic Chemistry USSR (English Translation), 1981, p. 161 - 166

  摘要：

  DOI：
• 作为试剂：
  描述：

  Langlois reagent 、 5-氨基-3-氰基-1-(2,6-二氯-4-三氟甲基苯基)吡唑 在 trimethylammonium 4-toluenesulfonate 氯化亚砜 作用下， 以 甲苯 为溶剂， 反应 6.58h， 以73%的产率得到氟虫腈
  参考文献：
  名称：

  WO2008/55877

  摘要：

  公开号：

文献信息

• Quaternary ammonium salts as charge-control agents for toners and
  申请人：Eastman Kodak Company

  公开号：US05516616A1

  公开（公告）日：1996-05-14

  New electrostatographic toners and developers are provided containing charge-control agents comprising certain quaternary ammonium salts having good thermal stability and good charging characteristics. The quaternary ammonium salts are: N-[(3,5-di-tert-alkyl-4-hydroxybenzoyloxy)alkyl]ammonium salt or a quaternary N-[(3,5-di-tert-alkyl-4-hydroxybenzoyloxy)aryl]ammonium salt having the structure: ##STR1## wherein the substituents are as defined herein.

  提供了含有电荷控制剂的新型静电印刷色调剂和显影剂，其中该电荷控制剂包含具有良好热稳定性和良好充电特性的某些季铵盐。该季铵盐为：N-[(3,5-二叔丁基-4-羟基苯甲酰氧)烷基]铵盐或具有以下结构的季铵N-[(3,5-二叔丁基-4-羟基苯甲酰氧)芳基]盐：##STR1## 其中取代基如本文所定义。
• Process for the Sulfinylation of a Pyrazole Derivative
  申请人：Sukopp Martin

  公开号：US20100137395A1

  公开（公告）日：2010-06-03

  The present invention relates to a process for the sulfinylation of a pyrazole derivative, characterized in that 5-amino-1-[2,6-dichloro-4-(trifluoromethyl)phenyl]-1H-pyrazole-3-carbonitrile (II) is reacted with a sulfinylating agent selected from trifluoromethylsulfinic acid, trifluoromethylsulfinic acid anhydride, and a trifluoromethylsulfinate alkaline or alkaline earth metal salt and mixtures of the acid and/or the salt(s), in the presence of at least one amine acid complex wherein the amine(s) are selected from tertiary amines and the acid(s) are selected from hydrofluoric, hydrochloric, hydrobromic and hydroiodic acid and sulfonic acid derivatives, and with the addition of a halogenating agent.

  本发明涉及一种嘧唑衍生物的磺酰基化方法，其特征在于将5-氨基-1-[2,6-二氯-4-(三氟甲基)苯基]-1H-嘧唑-3-羧腈（II）与磺酰化试剂反应，所述磺酰化试剂选自三氟甲基磺酸、三氟甲基磺酸酐和三氟甲基磺酸盐碱金属或碱土金属盐以及酸和/或盐的混合物，在至少一种胺酸复合物的存在下进行反应，其中胺是选自三级胺，酸是选自氢氟酸、氢氯酸、氢溴酸和氢碘酸以及磺酸衍生物，并加入卤代试剂。
• Coating composition
  申请人：NIPPON PAINT CO., LTD.

  公开号：EP0331266A1

  公开（公告）日：1989-09-06

  The invention provide a coating composition comprising (a) a film-forming polymer having a functional group which is reactive with the under-mentioned crosslinking agent, (b) an organic liquid diluent ,and (c) a crosslinking agent , which is characterized by that said film-forming polymer is an acrylic homo - or co-polymer having at least one side chain of the formula: in which n is a positive number of 3 - 50. contains metallic or non-metallic pigment ,and also a coating composition comprising the abovementioned (a),(b),(c) and (d) crosslinked polymer microparticles obtained by an emulsion polymerization of two or more ethylenically unsaturated monomers in the presence of a resin having in its molecule a group of the formula: in which R is a substituted or unsubstituted alkylene having 1 to 6 carbon atoms or phenylene and Y is -COOH or -S03H. These compositions are specifically useful as a top coat for automobile body, appliances or the like.

  本发明提供了一种涂料组合物，包括 (a) 具有与上述交联剂反应的官能团的成膜聚合物、 (b) 有机液体稀释剂，和 (c) 一种交联剂，其特征在于所述成膜聚合物是一种丙烯酸均聚物或共聚物，具有至少一条式中的侧链： 含有金属或非金属颜料，以及包含上述成分的涂料组合物。 (a)、(b)、(c)和(d) 交联聚合物微粒，这些微粒是由两种或两种以上的乙烯基不饱和单体在分子中含有式中基团的树脂存在下进行乳液聚合而得到的： 其中 R 是具有 1 至 6 个碳原子的取代或未取代的亚烷基或亚苯基，Y 是 -COOH 或 -S03H。 这些组合物特别可用作汽车车身、电器或类似产品的面漆。
• METHOD FOR PREPARING HALOGENATED 3-OXOCARBOXYLATES CARRYING A 2-ALKOXYMETHYLIDENE OR A 2-DIALKYLAMINOMETHYLIDENE GROUP
  申请人：BASF SE

  公开号：EP3178813A1

  公开（公告）日：2017-06-14

  The present invention relates to a process for preparing compounds of the formula I, wherein R1 and R2 are each independently from one another selected from hydrogen, fluorine, bromine, chlorine and trifluoromethyl, R3 is selected from fluorine chlorine and trifluoromethyl, R4 is selected from C1-C4-alkyl, and X is either -OR5 or -NR6R7, wherein R5 is selected from C1-C4-alkyl, and R6 and R7 are each independently from one another selected from C1-C4-alkyl, which comprises the reaction of a compound of the formula II with a reagent of the formula III, wherein the variables R1, R2, R3, R4, R5 and X given in formulae II and III have the above defined meanings, in the presence of a catalyst selected from Brønsted acids, ammonium salts of Brønsted acids and Lewis acids; wherein the reaction is performed essentially in the absence of a carboxylic acid anhydride.

  本发明涉及一种制备式 I 化合物的工艺、 其中 R1 和 R2 各自独立地选自氢、氟、溴、氯和三氟甲基、 R3 选自氟、氯和三氟甲基、 R4 选自 C1-C4- 烷基，以及 X 是-OR5 或-NR6R7，其中 R5 选自 C1-C4-烷基，R6 和 R7 各自独立地选自 C1-C4-烷基、 其中 R5 选自 C1-C4-烷基，R6 和 R7 各自独立地选自 C1-C4-烷基。 与式 III 的试剂反应、 式 II 和式 III 中的变量 R1、R2、R3、R4、R5 和 X 具有上述定义的含义、 在选自布伦斯特酸、布伦斯特酸的铵盐和路易斯酸的催化剂存在下； 其中，反应基本上在没有羧酸酐的情况下进行。
• COMPOSITION FOR TITANIUM NITRIDE HARD MASK REMOVAL AND ETCH RESIDUE CLEANING
  申请人：Versum Materials US, LLC

  公开号：EP3599634A1

  公开（公告）日：2020-01-29

  Composition, method and system for TiN hard mask removal from electronic circuitry devices, such as advanced pattern wafers have been disclosed. The cleaning compositions preferably comprise an etchant agent (also referred to as a base), an oxidizing agent, an oxidizing stabilizer (also referred to as a chelating agent), an ammonium salt, a corrosion inhibitor, and a solvent. Other optional additives could be provided. It is preferable that the pH of the cleaning composition be greater than 5.5. The cleaning composition is preferably free from dimethyl sulfoxide and tetramethylammonium hydroxide.

  已公开了用于从电子电路设备（如高级图案晶片）上去除 TiN 硬掩膜的组合物、方法和系统。清洗组合物最好包括蚀刻剂（也称为碱）、氧化剂、氧化稳定剂（也称为螯合剂）、铵盐、腐蚀抑制剂和溶剂。还可以提供其他可选添加剂。清洗组合物的 pH 值最好大于 5.5。清洗组合物最好不含二甲亚砜和四甲基氢氧化铵。