A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1),
1
wherein R
1
groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R
2
represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.
揭示了一种作为辐射敏感
树脂组合物添加剂有用的新型
蒽衍
生物。该
蒽衍
生物具有以下
化学式(1),其中R1基分别表示一个羟基或具有1-20个碳原子的一价有机基团,n是0-9的整数,X是一个单键或具有1-12个碳原子的二价有机基团,R2表示一价酸可解离基团。辐射敏感
树脂组合物包括
化学式(1)的
蒽衍
生物,一种在碱性条件下不溶或几乎不溶但在存在酸时变为碱溶的
树脂,以及光酸发生剂。该组合物可用作
化学放大光刻胶,用于利用KrF准分子激光和ArF准分子激光等深紫外线进行微加工。