申请人:Narang Ram S.
公开号:US20080199810A1
公开(公告)日:2008-08-21
Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula
wherein x is an integer of 0 or 1, A is one of several specified groups, such as
B is one of several specified groups, such as
or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substitutents are allyl ether groups, epoxy groups, or mixtures thereof. Also disclosed is a process for preparing a thermal ink jet printhead containing the aforementioned polymers and processes for preparing the aforementioned polymers.
本发明涉及一种组合物,其包括至少含有一些具有光敏感基团的单体重复单元的聚合物,这些基团使得聚合物在暴露于光辐射下发生交联或链延伸,所述聚合物的化学式为其中x为0或1的整数,A是几个指定的基团之一,例如B是几个指定的基团之一,例如或其混合物,n代表重复单体单元的数量,其中所述的光敏感基团是烯丙基醚基团、环氧基团或其混合物。本发明还涉及一种制备含有上述聚合物的热喷墨头的方法,以及制备上述聚合物的方法。