2-adamantylpropan-2-yl 3-(4-hydroxyphenylthio)propanoate | 941576-38-1

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫醚类
• 英文名称: 2-adamantylpropan-2-yl 3-(4-hydroxyphenylthio)propanoate
• 英文别名: 2-(1-Adamantyl)propan-2-yl 3-(4-hydroxyphenyl)sulfanylpropanoate
• CAS: 941576-38-1
• 化学式: C₂₂H₃₀O₃S
• 分子量: 374.544
• InChiKey: GXXFTAGYDRKQLD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.4
• 重原子数：
  26
• 可旋转键数：
  7
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.68
• 拓扑面积：
  71.8
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  2-adamantylpropan-2-yl acrylate 、 4-羟基苯硫酚 在 三乙胺 作用下， 以 甲醇 、 乙酸乙酯 为溶剂， 生成 2-adamantylpropan-2-yl 3-(4-hydroxyphenylthio)propanoate
  参考文献：
  名称：

  Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition

  摘要：

  一种光敏组合物，其中包含具有规范中所述特定结构的化合物，使用该光敏组合物和使用在光敏组合物中的具有特定结构的化合物的图案形成方法。

  公开号：

  US08426101B2

文献信息

• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN
  申请人：Yamaguchi Shuhei

  公开号：US20130115557A1

  公开（公告）日：2013-05-09

  Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.
• US8426101B2
  申请人：——

  公开号：US8426101B2

  公开（公告）日：2013-04-23
• US9034558B2
  申请人：——

  公开号：US9034558B2

  公开（公告）日：2015-05-19
• [EN] POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME<br/>[FR] COMPOSITION DE RÉSINE PHOTOSENSIBLE POSITIVE ET PROCÉDÉ DE FORMATION DE MOTIF UTILISANT CELLE-CI
  申请人：FUJIFILM CORP

  公开号：WO2009119894A1

  公开（公告）日：2009-10-01

  A positive resist composition and a pattern forming method using the resist composition are provided, the resist composition including: (A) a resin containing a repeating structural unit represented by formula (I) as defined in the specification and being capable of decomposing by an action of an acid to increase the solubility in an alkali developer; (B) an acid generator; and (C) a mixed solvent containing at least one solvent selected from the group consisting of the following Group (a) and at least one solvent selected from the group consisting of the following Groups (b) to (d): Group (a): an alkylene glycol monoalkyl ether, Group (b): an alkylene glycol monoalkyl ether carboxylate, Group (c): a linear ketone, a branched chain ketone, a cyclic ketone, a lactone and an alkylene carbonate, and Group (d): a lactic acid ester, an acetic acid ester and an alkoxypropionic acid ester.