copper benzotriazole | 56397-71-8

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并三唑类
• 英文名称: copper benzotriazole
• 英文别名: 2H-benzotriazole;copper
• CAS: 56397-71-8
• 化学式: C₆H₅N₃*Cu
• 分子量: 182.672
• InChiKey: HEUUBWQOIYCBCI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.96
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  41.6
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  T406石油添加剂 、 铜 以 neat (no solvent) 为溶剂， 生成 copper benzotriazole
  参考文献：
  名称：

  SERS, XPS, and electroanalytical studies of the chemisorption of benzotriazole on a freshly etched surface and an oxidized surface of copper

  摘要：

  Chemical reaction of benzotriazole on a freshly etched surface of metallic copper has been investigated by surface-enhanced Raman scattering (SERS), X-ray photoelectron spectroscopy (XPS), cyclic voltammetry, and other techniques. We found that the freshly etched copper surface could chemisorb benzotriazole (BTAH) from solution in 15 s forming a surface layer of Cu(0)BTAH. As the system was exposed to air, the surface species easily reacted with the coadsorbed oxygen in 2 min, resulting in a polymeric film of Cu+BTA-. The reaction of benzotriazole with the cleaned surface is faster than with the oxidized surface of copper. SERS study also indicates that the thin complex film formed on a freshly etched copper possesses better anticorrosion properties.

  DOI：

  10.1021/j100172a050

文献信息

• Electrically conductive polymer gel and the method for manufacturing the same and an organism-use electrode with the use thereof
  申请人：SEKISUI KASEIHIN KOGYO KABUSHIKI KAISHA

  公开号：EP0588238A2

  公开（公告）日：1994-03-23

  An electrically conductive polymer gel is composed a crosslinked polyacrylamide polymer including electrolytic salt, water and polyhydric alcohol uniformly dissolved therein, the water and the polyhydric alcohol being major components of said polymer gel. The polyacrylamide series polymer in the gel has properties of hydrophilic and nonelectrolyte. Therefore, a desirable connection between the gel and the electrode can be achieved with low impedance. Moreover, the polyhydric alcohol reduces the drying speed of the electrically conductive polymer gel, thereby preventing an increase in the impedance due to the dryout of the gel. Therefore, the electrically conductive polymer gel of the present invention permits an accurate measurement of an electrical phenomenon in the organism for long periods of time.

  一种导电聚合物凝胶由交联聚丙烯酰胺聚合物（包括均匀溶解在其中的电解盐、水和多元醇）组成，水和多元醇是所述聚合物凝胶的主要成分。凝胶中的聚丙烯酰胺系列聚合物具有亲水性和非电解质的特性。因此，凝胶与电极之间可以实现低阻抗的理想连接。此外，多元醇还能降低导电聚合物凝胶的干燥速度，从而防止因凝胶干燥而导致阻抗增加。因此，本发明的导电聚合物凝胶可以长时间精确测量生物体内的电现象。
• Lubricant for refrigerant heat transfer fluids
  申请人：HENKEL CORPORATION

  公开号：EP0711820A2

  公开（公告）日：1996-05-15

  Esters and mixtures of esters of polyhydric alcohols, e.g., of pentaerythritol, in which at least 22 number percent of the acyl groups in the esters are either branched or contain no more than six carbon atoms, are effective lubricants and/or lubricant base stocks for chlorine-free fluorocarbon refrigerant heat transfer fluids, particularly for chlorine-free heat transfer fluids such as Refrigerant 134a (1,1,1,2-tetrafluoroethane).

  多元醇（如季戊四醇）的酯类和酯类混合物，其中酯类中至少 22% 的酰基为支链或含有不超过六个碳原子，是无氯碳氟化合物制冷剂传热流体，特别是制冷剂 134a（1,1,1,2-四氟乙烷）等无氯传热流体的有效润滑剂和/或润滑剂基础油。
• Lubricant for regrigerant heat transfer fluids
  申请人：HENKEL CORPORATION

  公开号：EP0708173A1

  公开（公告）日：1996-04-24

  Esters and mixtures of esters of polyhydric alcohols, e.g., of pentaerythritol, in which at least 22 number percent of the acyl groups in the esters are either branched or contain no more than six carbon atoms, are effective lubricants and/or lubricant base stocks for chlorine-free fluorocarbon refrigerant heat transfer fluids, particularly for chlorine-free heat transfer fluids such as Refrigerant 134a (1,1,1,2-tetrafluoroethane).

  多元醇（如季戊四醇）的酯类和酯类混合物，其中酯类中至少 22% 的酰基为支链或含有不超过六个碳原子，是无氯碳氟化合物制冷剂传热流体，特别是制冷剂 134a（1,1,1,2-四氟乙烷）等无氯传热流体的有效润滑剂和/或润滑剂基础油。
• POLISHING COMPOSITION
  申请人：SHOWA DENKO K.K.

  公开号：EP2075824A1

  公开（公告）日：2009-07-01

  A polishing composition which achieves surfaces with high planarity and the reduction of corrosions in the wiring metal surface at the same time is provided. Such compositions include (A) an oxidizing agent; (B) at least one acid selected from an amino acid, a carboxylic acid of no more than 8 carbon atoms, and an inorganic acid; (C) a sulfonic acid having a concentration of 0.01 % by mass or more and having an alkyl group of 8 or more carbon atoms; (D) a fatty acid having a concentration of 0.001 % by mass or more and having an alkyl group of 8 or more carbon atoms; and (E) at least one compound selected from a pyridine carbonyl compound, a nonionic water-soluble polymer, 2-pyrrolidone, N-methylpyrrolidone, 1,3-dimethyl-2-imidazolidinone, gramine, adenine, N,N'-diisopropylethylenediamine, N,N'-bis(2-hydroxyethyl)ethylenediamine, N,N'-dibenzylethylenediamine, and N,N'-diphenylethylenediamine.

  提供了一种抛光组合物，该组合物可实现表面的高平面度，同时减少接线金属表面的腐蚀。 这种组合物包括 (A) 氧化剂； (B) 至少一种选自氨基酸、不超过 8 个碳原子的羧酸和无机酸的酸； (C) 质量浓度为 0.01%或更高且具有 8 个或更多碳原子烷基的磺酸； (D) 脂肪酸，质量浓度为 0.001%或以上，具有 8 个或更多碳原子的烷基；以及 (E) 至少一种选自吡啶羰基化合物、非离子水溶性聚合物、2-吡咯烷酮、N-甲基吡咯烷酮、1,3-二甲基-2-咪唑烷酮的化合物、腺嘌呤、N,N'-二异丙基乙二胺、N,N'-双（2-羟乙基）乙二胺、N,N'-二苄基乙二胺和 N,N'-二苯基乙二胺。
• CLEANING AGENT FOR METAL WIRING SUBSTRATE, AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP2985783A1

  公开（公告）日：2016-02-17

  It is a subject of the present invention to provide a cleaning agent for a substrate having a metal wiring, and a cleaning method for a semiconductor substrate comprising that the cleaning agent is used, by which following effects (1) to (5) are obtained, in a cleaning process after chemical mechanical polishing (CMP) in a manufacturing process of a semiconductor device. (1) Residues of fine particles (polishing agents) used in the CMP process, fine particles (metal particles) derived from a polished metal, an anticorrosive, and the like, can be removed sufficiently. (2) A coating film (protective film: oxidation resistant film) on a surface of the metal wiring, containing a complex between an anticorrosive, such as benzotriazole or quinaldic acid, and a surface metal of the metal wiring, formed in the CMP process, can be removed (stripped) sufficiently. (3) An oxide film containing a metal oxide can be formed after removal (stripping) of the coating film. (4) A semiconductor substrate can be obtained stably for a long period of time, without impairing flatness of the surface of the metal wiring (the surface of the oxide film containing the metal oxide), even leaving a substrate after the cleaning process after the CMP. (5) It is hard to deteriorate even after using the cleaning agent for a long period of time. The present invention relates to a cleaning agent for a substrate having a metal wiring, comprising an aqueous solution containing (A) carboxylic acid having a nitrogen-containing heterocyclic ring and (B) alkylhydroxylamine, and having a pH of 10 or higher, as well as a cleaning method for a semiconductor substrate, comprising that the cleaning agent is used.

  本发明的目的是提供一种用于具有金属配线的基板的清洗剂，以及一种半导体基板的清洗方法，包括在半导体器件制造工艺中化学机械抛光（CMP）后的清洗工序中使用该清洗剂，从而获得以下效果（1）至（5）。(1) 可以充分去除 CMP 工序中使用的细颗粒（抛光剂）残留物、抛光金属产生的细颗粒（金属颗粒）、防腐剂等。(2) 可以充分去除（剥离）金属布线表面的涂膜（保护膜：抗氧化膜），该涂膜含有在 CMP 工艺中形成的防腐剂（如苯并三唑或喹啉二酸）与金属布线表面金属之间的络合物。(3) 在去除（剥离）涂膜后，可形成含有金属氧化物的氧化膜。(4) 即使在 CMP 后的清洗工序后离开基板，也能长期稳定地获得半导体基板，而不会影响金属布线表面（含有金属氧化物的氧化膜表面）的平整度。(5) 即使长期使用该清洗剂也不易变质。 本发明涉及一种用于具有金属配线的衬底的清洗剂，包括含有(A)具有含氮杂环的羧酸和(B)烷基羟胺且 pH 值为 10 或更高的水溶液，以及一种半导体衬底的清洗方法，其中包括使用该清洗剂。