4-nitrophenyl(phenyl)iodonium tosylate | 747-25-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-nitrophenyl(phenyl)iodonium tosylate
• 英文别名: 4-Methylbenzenesulfonate;(4-nitrophenyl)-phenyliodanium
• CAS: 747-25-1
• 化学式: C₇H₇O₃S*C₁₂H₉INO₂
• 分子量: 497.31
• InChiKey: CTACPUZWTWAQOV-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  0.62
• 重原子数：
  27
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.05
• 拓扑面积：
  111
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  3-苯基-1-丙胺 、 4-nitrophenyl(phenyl)iodonium tosylate 在 sodium carbonate 作用下， 以 甲苯 为溶剂， 反应 4.0h， 以77%的产率得到4-nitro-N-(3-phenylpropyl)aniline
  参考文献：
  名称：

  轻度和无金属反应条件下脂族胺的区域特异性N-芳基化

  摘要：

  本文介绍了伯胺和仲胺与二芳基碘鎓盐的无过渡金属N芳基化反应。无环和环状胺都具有良好的耐受性，可提供大量的N-烷基苯胺。在无金属方法中，胺的范围，转移吸电子和给电子芳基的能力以及资源的有效利用是无金属方法中前所未有的，因为不需要过量的底物或试剂。

  DOI：

  10.1002/anie.201807001

文献信息

• Transition Metal‐Free <i>N‐</i> Arylation of Amino Acid Esters with Diaryliodonium Salts
  作者：Gabriella Kervefors、Leonard Kersting、Berit Olofsson

  DOI：10.1002/chem.202005351

  日期：2021.3.26

  A transition metal‐free approach for the N‐arylation of amino acid derivatives has been developed. Key to this method is the use of unsymmetric diaryliodonium salts with anisyl ligands, which proved important to obtain high chemoselectivity and yields. The scope includes the transfer of both electron deficient, electron rich and sterically hindered aryl groups with a variety of different functional

  已经开发出一种用于氨基酸衍生物N芳基化的无过渡金属方法。该方法的关键是使用带有茴香基配体的不对称二芳基碘盐，这被证明对于获得高化学选择性和产率非常重要。范围包括缺电子、富电子和空间位阻芳基与各种不同官能团的转移。此外，环状二芳基碘鎓盐成功地用于芳基化。获得保留对映体过量的N-芳基化产物。
• Synthesis of Phenols and Aryl Silyl Ethers via Arylation of Complementary Hydroxide Surrogates
  作者：Marcus Reitti、Ramani Gurubrahamam、Melanie Walther、Erik Lindstedt、Berit Olofsson

  DOI：10.1021/acs.orglett.8b00287

  日期：2018.4.6

  Two transition-metal-free methods to access substituted phenols via the arylation of silanols or hydrogen peroxide with diaryliodonium salts are presented. The complementary reactivity of the two nucleophiles allows synthesis of a broad range of phenols without competing aryne formation, as illustrated by the synthesis of the anesthetic Propofol. Furthermore, silyl-protected phenols can easily be obtained

  提出了两种无过渡金属的方法，可通过硅烷醇或过氧化氢与二芳基碘鎓盐的芳基化来获得取代的苯酚。两种亲核试剂的互补反应性可合成多种酚，而不会形成竞争性的芳烃形成，如麻醉药异丙酚的合成所示。此外，可以容易地获得甲硅烷基保护的苯酚，其适合于进一步的转化。
• Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
  申请人：——

  公开号：US20020172885A1

  公开（公告）日：2002-11-21

  A carbazole derivative of the following formula (1), 1 wherein R 1 and R 2 individually represent a hydrogen atom or a monovalent organic group, or R 1 and R 2 form, together with the carbon atom to which R 1 and R 2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R 3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

  以下是该段文字的中文翻译： 一种具有以下式（1）的咔唑衍生物，其中R1和R2分别代表氢原子或一价有机基团，或者R1和R2与其结合的碳原子一起形成具有3-8个成员碳环结构或3-8个成员杂环结构的二价有机基团，R3代表氢原子或一价有机基团。该咔唑衍生物适用作为增加化学增感抗蚀性的添加剂。还公开了一种化学增感辐射敏感树脂组合物，该组合物用作化学增感抗蚀剂，包括该咔唑衍生物。
• Novel anthracene derivative and radiation-sensitive resin composition
  申请人：——

  公开号：US20030194634A1

  公开（公告）日：2003-10-16

  A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), 1 wherein R 1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R 2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

  揭示了一种作为辐射敏感树脂组合物添加剂有用的新型蒽衍生物。该蒽衍生物具有以下化学式（1），其中R1基分别表示一个羟基或具有1-20个碳原子的一价有机基团，n是0-9的整数，X是一个单键或具有1-12个碳原子的二价有机基团，R2表示一价酸可解离基团。辐射敏感树脂组合物包括化学式（1）的蒽衍生物，一种在碱性条件下不溶或几乎不溶但在存在酸时变为碱溶的树脂，以及光酸发生剂。该组合物可用作化学放大光刻胶，用于利用KrF准分子激光和ArF准分子激光等深紫外线进行微加工。
• Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition
  申请人：——

  公开号：US20030113658A1

  公开（公告）日：2003-06-19

  A novel photoacid generator containing a structure of the following formula (I), 1 wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z 1 and Z 2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

  提供一种新型光酸发生剂，其含有以下式(I)的结构，其中R是一种具有50重量％或以下氟含量，硝基，氰基或氢原子的一价有机基团，Z1和Z2分别是氟原子或具有1-10个碳原子的线性或支链全氟烷基团。当用于化学增感辐射敏感树脂组成物中时，该光酸发生剂表现出高透明度，相对高的可燃性和无生物积累，并产生具有高酸度，高沸点，适度短的扩散长度在抗蚀涂层中，并且对掩模图案密度的依赖性低的酸。