2,4,6,3',4',5'-hexhydroxybenzophenone | 112005-19-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,4,6,3',4',5'-hexhydroxybenzophenone
• 英文别名: (2,4,6-Trihydroxyphenyl)(3,4,5-trihydroxyphenyl)methanone；(2,4,6-trihydroxyphenyl)-(3,4,5-trihydroxyphenyl)methanone
• CAS: 112005-19-3
• 化学式: C₁₃H₁₀O₇
• 分子量: 278.218
• InChiKey: QWRVAXMLZCMVSL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  20
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  138
• 氢给体数：
  6
• 氢受体数：
  7

反应信息

• 作为反应物：
  描述：

  2,4,6,3',4',5'-hexhydroxybenzophenone 、 三甲基乙酰氯 以 吡啶 为溶剂， 以61%的产率得到2,4,3',4',5'-pentapivaloyloxy-6-hydroxy benzophenone
  参考文献：
  名称：

  Phenolic ester derivatives as elastase inhibitors

  摘要：

  通式I的酚酯##STR1##可用于预防、管理或缓解弹性蛋白酶介导的疾病或症状。

  公开号：

  US04683241A1

文献信息

• [EN] SULFONIUM SULFATES, THEIR PREPARATION AND USE<br/>[FR] SULFATES DE SULFONIUM, LEUR PRÉPARATION ET UTILISATION
  申请人：BASF SE

  公开号：WO2012113829A1

  公开（公告）日：2012-08-30

  The present invention relates to a heat-curable composition comprising (a) at least one compound which is capable of undergoing cationic polymerization; and (b) at least one sulfonium sulfate selected from compounds of the formulae Ia and Ib where Yn- is a monovalent or divalent anion selected from (1) where n, M, R1 to R10 are as defined in claim 1 and in the description. The present invention also relates to novel sulfonium sulfates of the formulae Ia and Ib, to a process for curing cationically polymerizable material and to the cured material obtained by said process.

  本发明涉及一种热固化组合物，包括（a）至少一种能够进行阳离子聚合的化合物；和（b）选择自式Ia和Ib的至少一种砜酸盐，其中Yn-是从（1）中选择的一价或二价阴离子，其中n、M、R1至R10如权利要求1和描述中所定义。本发明还涉及式Ia和Ib的新型砜酸盐，以及用于固化阳离子聚合材料的工艺和通过该工艺获得的固化材料。
• NOVOLAC RESIN AND RESIST FILM
  申请人：DIC Corporation

  公开号：US20180334523A1

  公开（公告）日：2018-11-22

  Provided are a novolac resin having developability, heat resistance, and dry etching resistance, and a photosensitive composition, a curable composition, and a resist film. A novolac resin including, as a repeating unit, a structural moiety represented by Structural Formula (1) or (2): (in the formula, Ar represents an arylene group, R 1 's each independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, m's each independently represent an integer of 1 to 3, and X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group) in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

  提供一种具有可开发性、耐热性和干法蚀刻抗性的新戊醛树脂，以及一种光敏组合物、可固化组合物和抗蚀膜。一种新戊醛树脂包括以下结构单元： （在公式中，Ar代表芳基，R 1 分别独立地代表氢原子、烷基、烷氧基和卤素原子中的任意一种，m分别独立地代表1至3的整数，X代表氢原子、三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种），树脂中至少有一个X是三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种。
• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2016124493A1

  公开（公告）日：2016-08-11

  Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

  化合物的化学式（I）和（IA），其中X为-O(CO)-；R1为C1-C12卤代烷基或C6-C10卤代芳基；R2位于香豆素环的第7位，为OR8；R2a、R2b和R2C彼此独立地为氢；R3为C1-C8卤代烷基或C1-C8卤代烷基；R4为氢；R8为C1-C6烷基，适用于作为感光酸给体，用于制备光刻胶组合物，例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器（LCD）的制备。
• [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS À BASE DE SELS DE SULFONIUM
  申请人：CIBA HOLDING INC

  公开号：WO2009047151A1

  公开（公告）日：2009-04-16

  Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5- C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2- C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and inter- rupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1- C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6- C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6- C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

  化合物的式子（I），其中X是单键，CRaRb O，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如是氢，R1或COT; T表示T1或O-T2; T1和T2例如是氢，C1-C20烷基，C3-C12环烷基，C2-C20烯基，C5-C12环烯基，C6-C14芳基，C3-C12杂芳基，被一个或多个D取代的C1-C20烷基，被一个或多个E中断的C2-C20烷基，被一个或多个D取代并被一个或多个E或Q中断的C2-C20烷基; R1，R2，R3，R4，Ra，Rb和Rc是T1; D例如是R5，OR5，SR5或Q1; E例如是O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q例如是C6-C12双环烷基，C6-C12双环烯基或C6-C12三环烷基; Q1例如是C6-C14芳基或C3-C12杂芳基; Q2例如是C6-C14芳撑基或C3-C12杂芳撑基; Y是阴离子; M是阳离子; 前提是L，L1，L2，L3，L4，L5，L6，L7和L8中至少有一个不是氢; 并且前提是（i）至少有一个T1或T2是Q组; 或（ii）至少有一个D是Q1组; 或（iii）至少有一个E是Q2组; 适用于光潜催化剂。
• SULFONIUM COMPOUNDS, THEIR PREPARATION AND USE
  申请人：BASF SE

  公开号：US20150044509A1

  公开（公告）日：2015-02-12

  Compounds of the formula (I), (Ia) or (Ib) wherein A 1 , and A − is for example (II) is 1 or 2; X is C 1 -C 4 alkylene or CO; Y is for example O, O(CO), O(CO)O, R 1 is for example hydrogen, d-dsalkyl, C 3 -C 30 cycloalkyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or C 3 -C 20 heteroaryl, all of which optionally are substituted; R 2 and R 3 for example are C 1 -C 10 haloalkylene which is optionally substituted, or R 2 and R 3 are phenylene, which optionally is substituted; R 4 is a group (A) or a group (B); R 5 and R 6 for example are C 1 -C 20 alkyl; or R 4 and R 5 or R 4 and R 6 together form a straight-chain C 2 -C 6 alkylene, R 5 and R 6 together form a straight-chain C 2 -C 6 alkylene; R 7 , R 8 , R 9 and R 10 ifor example are C 1 -C 20 alkyl; M for example is C 1 -C 20 alkylene, C 2 -C 20 alkenylene, C 2 -C 20 alkynylene; R 25 and R 26 are for example hydrogen, C 1 -C 20 alkyl; R 27 , R 28 , R 29 , R 30 and R 31 are for example hydrogen, C 1 -C 20 alkyl, C 2 -C 20 alkenyl, C 3 -C 20 cycloalkyl, or two radicals R 27 and R 28 , R 28 and R 29 , R 29 and R 30 and/or R 30 and R 31 together form a straight-chain C 2 -C 6 alkylene, or R 25 and R 27 together form 1,2-phenylene, R 33 and R 34 for example are hydrogen, C 1 -C 20 alkyl; R 35 , R 36 and R 37 for example are hydrogen, C 1 -C 20 alkyl; are suitable as thermo-acid generators.

  化合物的公式(I)、(Ia)或(Ib)，其中A1和A-例如(II)为1或2；X为C1-C4烷基或CO；Y例如为O、O(CO)、O(CO)O、R1例如为氢、d-ds烷基、C3-C30环烷基、苯基、萘基、蒽基、菲基、联苯基、芴基或C3-C20杂环芳基，全部可选地被取代；R2和R3例如为可选地被取代的C1-C10卤代烷基，或R2和R3为苯基，可选地被取代；R4为(A)基团或(B)基团；R5和R6例如为C1-C20烷基；或R4和R5或R4和R6一起形成直链C2-C6烷基，R5和R6一起形成直链C2-C6烷基；R7、R8、R9和R10例如为C1-C20烷基；M例如为C1-C20烷基、C2-C20烯基、C2-C20炔基；R25和R26例如为氢、C1-C20烷基；R27、R28、R29、R30和R31例如为氢、C1-C20烷基、C2-C20烯基、C3-C20环烷基，或两个基团R27和R28、R28和R29、R29和R30和/或R30和R31一起形成直链C2-C6烷基，或R25和R27一起形成1,2-苯基，R33和R34例如为氢、C1-C20烷基；R35、R36和R37例如为氢、C1-C20烷基；适用于热酸发生器。