摘要:
                                The p-(disilanylene)phenylene oligomers, Me3Si(Me2Si-C6H4-SiMe2)nSiMe3 with n = 2-4 (2, 3, and 4) were prepared and their photochemical behavior was investigated in a benzene solution. Photolysis of 2 in the presence of isobutene afforded 1-isobutyldi-methylsilyl-4-pentamethyldisilanyl-2-(dimethyl[4-(pentamethyldisilanyl)phenyl)silyl)benzene and its isomer in 58% and 5% yields, in addition to 4-dimethylsilyl-1-(pentamethyldisilanyl)benzene (6a) (1% yield) and 4-dimethylphenylsilyl-1-(pentamethyldisilanyl)benzene (7a) (2% yield). Irradiation of 2 in the absence of isobutene gave 6a and 7a in 2% and 5% yields. Irradiation of 3 in the presence of isobutene afforded 1-isobutyldimethylsilyl-2-dimethyl[4-(pentamethyldisilanyl)phenyl]silyl-4-{2-[4-(pentamethyldi-silanyl)phenyl]tetramethyidisilanyl}benzene (8) and 4-dimethyl[2-isobutyldimethylsilyl-5-(pentamethyldisilanyl)phenyl]silyl-1-{2-[4-(pentamethyldisilanyl)phenyl]tetramethyldisilanyl}benzene (9) in 4% and 2% yields, along with small amounts of 6a and 7a. Similar irradiation of 3 in the absence of isobutene produced 6a, 7a, and 4-pentamethyldisilanyl-1-{2-[4-(dimethylphenylsilyl)phenyl]tetra-methyldisilanyl}benzene (10) in 1%, 1%, and 2% yields. The photolysis of 4 under the same conditions gave 6a, 7a, 10, and 2-[4-(dimethylsilyl)phenyl]-1-[4-(pentamethyldisilanyl)phenyl]tetramethyldisilane (11) in 1%, 11%, 11%, and 1% yields.