perfluoro-3,5-dimethylbenzoic acid | 140455-13-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: perfluoro-3,5-dimethylbenzoic acid
• 英文别名: 2,4,6-Trifluoro-3,5-bis(trifluoromethyl)benzoic acid
• CAS: 140455-13-6
• 化学式: C₉HF₉O₂
• 分子量: 312.091
• InChiKey: AHJUJTBNSNXQLP-UHFFFAOYSA-N

物化性质

• 沸点：
  216.0±40.0 °C(Predicted)
• 密度：
  1.718±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  20
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.22
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  11

反应信息

• 作为产物：
  描述：

  全氟-(1,3,5-三甲基苯) 在 水 、 五氟化锑 、 silica gel 作用下， 生成 trifluorotrimesic acid 、 perfluoro-3-isophthalic acid 、 perfluoro-3,5-dimethylbenzoic acid
  参考文献：
  名称：

  Karpov, V. M.; Panteleev, I. V.; Platonov, V. E., Journal of Organic Chemistry USSR (English Translation), 1991, vol. 27, p. 1932 - 1938

  摘要：

  DOI：

文献信息

• ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210149301A1

  公开（公告）日：2021-05-20

  An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.

  提供具有公式（1）的醇铵盐，作为酸扩散抑制剂和化学增强型抗蚀剂组合物。当通过光刻加工时，该抗蚀剂组合物表现出溶解对比度，抑制酸扩散效果以及出色的光刻性能因素，例如CDU，LWR和灵敏度。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20200192220A1

  公开（公告）日：2020-06-18

  An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a repeating unit having a group in which a phenolic hydroxyl group is protected with an acid-leaving group; a first photoacid generator that generates an acid having a pKa of −2.00 to 2.00, in which in a case where the acid thus generated is a carboxylic acid, a pKa of the carboxylic acid is −2.00 or more and less than 1.00; and a second photoacid generator that generates a carboxylic acid having a pKa of 1.00 or more.