申请人:Fuji Photo Film Co., Ltd.
公开号:US05324618A1
公开(公告)日:1994-06-28
Disclosed is a positive type photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a compound represented by the following general formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 which may be the same or different and in which four groups for each group may be different from each other at the same time, each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, a nitro group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group, an arylcarbonyl group, an acyloxy group, an acyl group, an aryloxy group or an aralkoxy group; a, b, d and e each represents 0 or an integer 1 to 3; and c represents 0 or 1, with the proviso that a, b, c, d and e satisfy the relationship (a+b+c+d+e.gtoreq.2), at least one of a and d is 1 or more and at least one of b and e is 1 or more.
本发明公开了一种正型光阻组合物,包括碱溶性
树脂、醌二
亚胺化合物和由以下通式(I)表示的化合物:##STR1## 其中,R1、R2、R3和R4可以相同也可以不同,每个组内的四个基团可以同时彼此不同,每个基团代表氢原子、羟基、卤素原子、烷基、烷氧基、硝基、烯丙基、芳基、芳基烷基、烷氧羰基、芳基羰基、酰氧基、酰基、芳氧基或芳基烷氧基;a、b、d和e分别表示0或整数1至3;c表示0或1,但要求a、b、c、d和e满足关系式(a+b+c+d+e≥2),其中至少有一个a和d为1或更多,至少有一个b和e为1或更多。