It is an object of the invention to provide a composition for forming a polishing pad comprising substances having specific functional groups exhibiting excellent hydrophilic properties and the like, a crosslinked body for polishing pad as well as a polishing pad with excellent water resisting and durability which exhibits excellent polishing performance including a high removal rate and method for producing thereof. The composition for forming a polishing pad comprises a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups. And a water-soluble substance such as cyclodextrin may be contained. A polishing pad can be manufactured using the composition above or the crosslinked body for polishing pad, and porous polishing pads may also be obtained.
本发明的目的是提供一种用于形成抛光垫的组合物,该组合物由具有特定官能团的物质组成,这些官能团具有优异的亲
水性等特性,还提供一种用于抛光垫的交联体以及一种具有优异防
水性和耐久性的抛光垫,该抛光垫具有优异的抛光性能,包括高去除率及其生产方法。用于形成抛光垫的组合物包括不含羧基、
氨基、羟基、环氧基、
磺酸基和
磷酸基的可交联弹性体,以及至少具有一个选自羧基、
氨基、羟基、环氧基、
磺酸基和
磷酸基的官能团的
水不溶性物质。还可以含有
环糊精等
水溶性物质。使用上述组合物或用于抛光垫的交联体可以制造出抛光垫,还可以获得多孔抛光垫。