pyrene-2-sulfonic acid | 64350-83-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 芘
• 英文名称: pyrene-2-sulfonic acid
• 英文别名: Pyren-2-sulfonsaeure
• CAS: 64350-83-0
• 化学式: C₁₆H₁₀O₃S
• 分子量: 282.32
• InChiKey: MWFQHJWUWDVFDS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  20
• 可旋转键数：
  1
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 在 盐酸 、 sodium nitrite 作用下， 生成 pyrene-2-sulfonic acid
  参考文献：
  名称：

  Vollmann et al., Justus Liebigs Annalen der Chemie, 1937, vol. 531, p. 1,141

  摘要：

  DOI：

文献信息

• Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions
  申请人：Miyamatsu Takashi

  公开号：US20060141383A1

  公开（公告）日：2006-06-29

  A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R 1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR 3 group, wherein R 3 is a monovalent alicyclic hydrocarbon group, R 2 represents a (substituted)-alkyl group or two or more R 2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X − indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

  一种亚砜盐化合物，在波长为220纳米或更短的深紫外线下具有优异的透明度，当用作光酸发生剂时，表现出良好的性能平衡，如灵敏度、分辨率、图案形态、LER和储存稳定性。该光酸发生剂包含亚砜盐化合物，且包含该光酸发生剂的正电调辐射敏感树脂组成物。该亚砜盐化合物由以下公式(I)表示，其中R1表示卤素原子、烷基、一价脂环烃基、烷氧基或-OR3基，其中R3为一价脂环烃基，R2表示(取代)-烷基或两个或更多的R2基形成环状结构，p为0-7，q为0-6，n为0-3，X-表示磺酸根离子。该正电调辐射敏感树脂组成物包括(A)亚砜盐化合物的光酸发生剂和(B)含酸可解离基团的树脂。
• Positive photosensitive composition
  申请人：Kodama Kunihiko

  公开号：US20070003871A1

  公开（公告）日：2007-01-04

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

  一种正性光敏组合物包括一种化合物，该化合物能够在接受活性光线或辐射照射后产生一种指定的磺酸，并且（B）一种树脂，该树脂在酸作用下分解以增加在碱性显影剂中的溶解度。
• SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS
  申请人：JSR Corporation

  公开号：EP1586570A1

  公开（公告）日：2005-10-19

  A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or -OR3 group, wherein R3 is a monovalent alicyclic hydrocarbon group, R2 represents a (substituted)-alkyl group or two or more R2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X- indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

  一种锍盐化合物，对波长 220 纳米以下的深紫外线具有优异的透明性，用作光酸发生器时，在灵敏度、分辨率、图案形状、LER 和储存稳定性等方面表现出均衡的优异性能；一种包含该锍盐化合物的光酸发生器；以及一种包含该光酸发生器的正色调辐射敏感树脂组合物。 锍盐化合物如下式（I）所示、 其中 R1 代表卤素原子、烷基、一价脂环烃基、烷氧基或 -OR3 基团，其中 R3 是一价脂环烃基，R2 代表（取代的）烷基或两个或多个 R2 基团形成环状结构，p 是 0-7，q 是 0-6，n 是 0-3，X- 表示磺酸阴离子。 正色调辐射敏感树脂组合物包括 (A) 锍盐化合物的光酸发生器和 (B) 含酸可分解基团的树脂。
• POSITIVE RESIN COMPOSITION OF NEAR-INFRARED-RAY ACTIVATION TYPE
  申请人：KANSAI PAINT CO., LTD.

  公开号：EP1788432A1

  公开（公告）日：2007-05-23

  A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.

  一种近红外射线活化型正抗蚀剂组合物，包括 (A) 乙烯基聚合物，其单体单元具有碱溶性基团，该基团被醚封住，醚氧旁边具有烯基、 (B) 通过近红外区域的光产生热量的光热转换物质、 (C) 通过热量产生酸的热酸发生器、 本发明可提供一种近红外射线活化型正抗蚀剂组合物，该组合物可在完全明亮的室内（如在白光等下）进行曝光处理，可获得所需的灵敏度和分辨率，其烘烤处理条件可放宽或省略烘烤处理，还可提供使用该组合物的图案形成方法。
• Near Infrared Ray Activation Type Positive Resin Composition
  申请人：Imai Genji

  公开号：US20070259279A1

  公开（公告）日：2007-11-08

  A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.