4-hydroxycyclohexyl formate | 137174-94-8

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 4-hydroxycyclohexyl formate
• 英文别名: (4-Hydroxycyclohexyl) formate
• CAS: 137174-94-8
• 化学式: C₇H₁₂O₃
• 分子量: 144.17
• InChiKey: SDNMJLHZHBSFRW-UHFFFAOYSA-N

物化性质

• 沸点：
  229.2±29.0 °C(Predicted)
• 密度：
  1.12±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  1,4-环己二醇 、 甲酸乙酯 在 sodium hydrogen sulfate 、 silica gel 作用下， 以 正己烷 为溶剂， 反应 6.0h， 以11%的产率得到1,4-cyclohexanediyl diformate
  参考文献：
  名称：

  Highly selective monoacylation of symmetric diols catalyzed by metal sulfates supported on silica gel

  摘要：

  Several 1,n-diols, ranging from 1,2-ethanediol to 1,16-hexadecanediol, were monoacylated with high selectivity by reaction with esters in the presence of metal sulfates or hydrogen sulfates, like Ce(SO4)2 and NaHSO4, supported on silica gel. Symmetrical secondary diols were also selectively monoformylated, by reaction with ethyl formate. This method of selective esterification is simple and practical. The yield of monoester depends upon both the composition and the volume of the solvent (an ester/alkane mixture). Unsupported NaHSO4 also catalyzed monoacylation, but the selectivity was less than in monoacylations catalyzed by the supported reagent. The selectivity can be explained by the following reasons: (1) monoacylated products are formed selectively because the diol, but not the monoester, is preferentially adsorbed on the surface of the catalysts, where esterification then occurs, and (2) thin diol layers are formed on the surface of the catalysts due to limited solubility of the diols in the solvent.

  DOI：

  10.1021/jo00027a054

文献信息

• Coating composition
  申请人：FORD MOTOR COMPANY LIMITED

  公开号：EP0014808A1

  公开（公告）日：1980-09-03

  A high solids, thermosetting coating composition which, exclusive of pigments, solvents and other non-reactive components consists essentially of: (A) a hydroxy bearing oligoester having a number average molecular weight (Mn) of between about 150 and about 3000, bearing at least about 2 hydroxyl groups per molecule, and being formed by an esterification reaction between a carboxylic acid and an epoxide; and (B) a polyisocyanate crosslinking agent having an average of at least two reactive isocyanate groups per molecule and being included in said composition in an amount sufficient to provide between about .5 and about 1.6 isocyanate groups per hydroxyl group present in the composition.

  一种高固体分的热固性涂料组合物，不含颜料、溶剂和其他非反应性成分，主要由以下成分组成： (A) 含羟基的低聚酯，其平均分子量（Mn）在约 150 到约 3000 之间，每个分子至少含有约 2 个羟基，由羧酸和环氧化物之间的酯化反应形成；以及 (B) 多异氰酸酯交联剂，其平均每个分子至少含有两个活性异氰酸酯基团，其在所述组合物中的含量足以使组合物中每个羟基含有约 0.5 至约 1.6 个异氰酸酯基团。
• PHOTORESIST COMPOSITION
  申请人：KAMABUCHI Akira

  公开号：US20110059400A1

  公开（公告）日：2011-03-10

  The present invention provides a photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I′): wherein R 51 , R 52 , R 53 and R 54 independently each represent a C1-C8 alkyl group, and A 11 represents a C3-C36 divalent saturated cyclic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents or a C6-C20 divalent aromatic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents.
• RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：TAKEMOTO Ichiki

  公开号：US20110236827A1

  公开（公告）日：2011-09-29

  The present invention provides a resin obtained by reacting a compound represented by the formula (I): wherein R 1 represents a hydrogen atom or a C1-C6 alkyl group, R 2 , R 3 and R 4 each independently represents a C1-C6 alkyl group and R 1 , R 2 , R 3 , R 4 and A 1 are bonded to form a ring, A 1 represents a C1-C20 saturated hydrocarbon group in which one or more —CH 2 — can be replaced by —O—, B 1 and B 2 each independently represent a C1-C6 alkylene group, L 1 and L 2 each independently represent a halogen atom, —O—CH═CH 2 , —O—CH═CH(CH 3 ) or —O—SO 2 —R′ in which R′ represents a C1-C6 alkyl group or a C6-C20 aryl group, with a polyhydric phenol compound.
• COMPOUND, RESIN AND PHOTORESIST COMPOSITION
  申请人：YAMASHITA Yuko

  公开号：US20110318690A1

  公开（公告）日：2011-12-29

  The present invention provides a compound represented by the formula (I): wherein R 1 represents a hydrogen atom or a methyl group, A 1 represents a single bond or *—(CH 2 ) m —CO—O— in which m represents an integer of 1 to 4 and * represents a binding position to —O—, B 1 represents —O— or —S—, B 2 represents —CH 2 —, —O— or —S— and W 1 represents an optionally substituted aromatic ring, a resin comprising a structural unit derived from the compound and a photoresist composition comprising the resin.
• SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
  申请人：YOSHIDA Isao

  公开号：US20120052440A1

  公开（公告）日：2012-03-01

  The present invention provides a salt represented by the formula (I): wherein Q 1 and Q 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L 1 and L 2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH 2 — can be replaced by —O— or —CO—, ring W 1 and ring W 2 independently each represent a C3-C36 aliphatic ring, R 2 is independently in each occurrence a C1-C6 alkyl group, R 4 is independently in each occurrence a C1-C6 alkyl group, R 3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z + represents an organic counter ion.