A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.
一种聚合物是从具有酸敏感基团的羟基
苯甲酸甲酯单体中获得的。以该聚合物为基础
树脂的正性光刻胶组合物具有极高的暴露前后碱溶解速率对比度、高分辨率、良好的曝光后图案剖面和最小的线边粗糙度、缓慢的酸扩散速率和良好的蚀刻抗性。