Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
申请人:Kobayashi Katsuhiro
公开号:US20070099112A1
公开(公告)日:2007-05-03
Sulfonate salts have the formula:
R
1
SO
3
—CH(Rf)-CF
2
SO
3
−
M
+
wherein R
1
is alkyl or aryl, Rf is H or trifluoromethyl, and M
+
is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.