2,8,14,20-Tetrakis(4-phenylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,5,6,10,11,12,16,17,18,22,23,24-dodecol | 406215-64-3

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 2,8,14,20-Tetrakis(4-phenylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,5,6,10,11,12,16,17,18,22,23,24-dodecol
• CAS: 406215-64-3
• 化学式: C₇₆H₅₆O₁₂
• 分子量: 1161.27
• InChiKey: ZLPFOJLMWPMFEF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  15.7
• 重原子数：
  88
• 可旋转键数：
  8
• 环数：
  13.0
• sp3杂化的碳原子比例：
  0.05
• 拓扑面积：
  243
• 氢给体数：
  12
• 氢受体数：
  12

文献信息

• CALIXARENE COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20130157195A1

  公开（公告）日：2013-06-20

  A molecular glass compound includes (A) a tetrameric reaction product of a specific aromatic compound having at least one hydroxy group, and a specific polycyclic or fused polycyclic aromatic aldehyde; and (B) an acid-removable protecting group as an adduct with the hydroxy group of the aromatic compound and/or a hydroxy group of the polycyclic or fused polycyclic aromatic aldehyde. A photoresist composition including the molecular glass compound, and a coated substrate including a layer of the photoresist composition are also disclosed.

  一种分子玻璃化合物，包括(A)一种特定芳香化合物的四聚反应产物，该芳香化合物至少具有一个羟基，以及一种特定的多环或融合多环芳香醛；和(B)一种酸可移除的保护基，作为与芳香化合物的羟基和/或多环或融合多环芳香醛的羟基的加合物。还公开了一种包括该分子玻璃化合物的光刻胶组合物，以及包括光刻胶组合物层的涂覆基板。
• RADIATION-SENSITIVE COMPOSITION
  申请人：Echigo Masatoshi

  公开号：US20100047709A1

  公开（公告）日：2010-02-25

  A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Still further described are a radiation-sensitive composition containing a solvent and a cyclic compound having a specific structure, for example, a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups (aldehyde compound (A1)) with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups (phenol compound (A2)), and a cyclic compound for use in the radiation-sensitive composition.
• US8110334B2
  申请人：——

  公开号：US8110334B2

  公开（公告）日：2012-02-07
• US8765356B2
  申请人：——

  公开号：US8765356B2

  公开（公告）日：2014-07-01
• US8846292B2
  申请人：——

  公开号：US8846292B2

  公开（公告）日：2014-09-30