2,8,14,20-Tetrakis(4-propylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol | 1021604-61-4

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 2,8,14,20-Tetrakis(4-propylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol
• CAS: 1021604-61-4
• 化学式: C₆₄H₆₄O₈
• 分子量: 961.207
• InChiKey: AUGXDIVLKCKNPE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  16
• 重原子数：
  72
• 可旋转键数：
  12
• 环数：
  9.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  162
• 氢给体数：
  8
• 氢受体数：
  8

文献信息

• RESIST COMPOSITION
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3007004A1

  公开（公告）日：2016-04-13

  The resist composition according to the present invention is a resist composition comprising a solid component comprising a resist base material, and a solvent. In the resist composition according to the present invention, the resist composition contains 1 to 80% by mass of the solid component and 20 to 99% by mass of the solvent, the resist base material comprises a compound (ctt form) represented by a predetermined formula (1) and a compound represented by a predetermined formula (3), the proportion of the compound (ctt form) represented by the predetermined formula (1) to the resist base material is from 65 to 99% by mass, and the mass ratio of the compound represented by the predetermined formula (3) to the compound (ctt form) represented by the predetermined formula (1) is from 0.01 to 0.53.

  根据本发明的抗蚀剂组合物是一种抗蚀剂组合物，包括由抗蚀剂基材组成的固体成分和溶剂。在根据本发明的抗蚀剂组合物中，抗蚀剂组合物含有 1% 至 80% （按质量计）的固体成分和 20% 至 99% （按质量计）的溶剂，抗蚀剂基础材料包括由预定式（1）表示的化合物（ctt 形式）和由预定式（3）表示的化合物、预定式（1）所代表的化合物（ctt 形式）占抗蚀剂基础材料的质量比例为 65% 至 99%，预定式（3）所代表的化合物与预定式（1）所代表的化合物（ctt 形式）的质量比为 0.01 至 0.53。
• RADIATION-SENSITIVE COMPOSITION
  申请人：Echigo Masatoshi

  公开号：US20100047709A1

  公开（公告）日：2010-02-25

  A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Still further described are a radiation-sensitive composition containing a solvent and a cyclic compound having a specific structure, for example, a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups (aldehyde compound (A1)) with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups (phenol compound (A2)), and a cyclic compound for use in the radiation-sensitive composition.
• PURIFICATION METHOD FOR CYCLIC COMPOUND
  申请人：Okada Yu

  公开号：US20130150627A1

  公开（公告）日：2013-06-13

  An industrially advantageous purification method for a cyclic compound with a particular structure is provided. A purification method for a cyclic compound, including a step of contacting a solution containing a cyclic compound with a particular structure and an organic solvent with water or an acidic aqueous solution.
• US8110334B2
  申请人：——

  公开号：US8110334B2

  公开（公告）日：2012-02-07
• US8846292B2
  申请人：——

  公开号：US8846292B2

  公开（公告）日：2014-09-30